Provided are: a support frame for pellicle that has both low dust generation property and high light resistance, and further has an ion elution amount which is reduced to the utmost limit to an extent that haze is not generated even when a short wavelength laser is used for exposure light source, a pellicle using the support frame for pellicle, and a method for efficiently manufacturing the support frame for pellicle, support frame for pellicle which comprises a frame member comprising aluminum or aluminum alloy and an inorganic coating layer formed on the surface of the frame member, wherein the main chain of the inorganic coating layer is constituted by a —Si—O—Si—O— bond. An anodized film is preferably formed between the frame member and the inorganic coating layer.

Provided are: a support frame for pellicle that has both low dust generation property and high light resistance, and further has an ion elution amount which is reduced to the utmost limit to an extent that haze is not generated even when a short wavelength laser is used for exposure light source, a pellicle using the support frame for pellicle, and a method for efficiently manufacturing the support frame for pellicle, support frame for pellicle which comprises a frame member comprising aluminum or aluminum alloy and an inorganic coating layer formed on the surface of the frame member, wherein the main chain of the inorganic coating layer is constituted by a —Si—O—Si—O— bond. An anodized film is preferably formed between the frame member and the inorganic coating layer.

A pellicle intermediary body has a Si substrate, a Si oxide film formed on a surface of the Si substrate, and a Si layer formed on a surface of the Si oxide film. The Si layer includes a low COP (Crystal Originated Particle) portion which is a part where the number of COPs decreases as it approaches the surface of the Si layer and is formed in the part that constitutes the surface of the Si layer. A pellicle intermediary body, a pellicle, a method for manufacturing a pellicle intermediary body, and a pellicle manufacturing method that can improve the quality of the pellicle film are provided.

A pellicle intermediary body has a Si substrate, a Si oxide film formed on a surface of the Si substrate, and a Si layer formed on a surface of the Si oxide film. The Si layer includes a low COP (Crystal Originated Particle) portion which is a part where the number of COPs decreases as it approaches the surface of the Si layer and is formed in the part that constitutes the surface of the Si layer. A pellicle intermediary body, a pellicle, a method for manufacturing a pellicle intermediary body, and a pellicle manufacturing method that can improve the quality of the pellicle film are provided.

Task of the present invention is to provide a tackifier solution having high solution stability and also provide, by using such a tackifier solution, a pellicle having only few tackifier residues and exhibiting reduced outgas generation. Present invention is a pellicle comprising a pellicle frame, a pellicle membrane stretched over an end surface of one opening of the pellicle frame, and a tackifier layer provided on an end surface of the other opening of the pellicle frame, wherein the tackifier layer contains a (meth)acrylic tackifier which is a solidified resin composition comprising a polymer (A) and a radical polymerization initiator (B), the polymer (A) having a structural unit derived from a (meth)acrylate and a side chain consisting of a carbon-carbon multiple bond-containing group.

Task of the present invention is to provide a tackifier solution having high solution stability and also provide, by using such a tackifier solution, a pellicle having only few tackifier residues and exhibiting reduced outgas generation. Present invention is a pellicle comprising a pellicle frame, a pellicle membrane stretched over an end surface of one opening of the pellicle frame, and a tackifier layer provided on an end surface of the other opening of the pellicle frame, wherein the tackifier layer contains a (meth)acrylic tackifier which is a solidified resin composition comprising a polymer (A) and a radical polymerization initiator (B), the polymer (A) having a structural unit derived from a (meth)acrylate and a side chain consisting of a carbon-carbon multiple bond-containing group.

A pellicle suitable for use with a patterning device for a lithographic apparatus. The pellicle comprising at least one breakage region which is configured to preferentially break, during normal use in a lithographic apparatus, prior to breakage of remaining regions of the pellicle. At least one breakage region comprises a region of the pellicle which has a reduced thickness when compared to surrounding regions of the pellicle.

A pellicle suitable for use with a patterning device for a lithographic apparatus. The pellicle comprising at least one breakage region which is configured to preferentially break, during normal use in a lithographic apparatus, prior to breakage of remaining regions of the pellicle. At least one breakage region comprises a region of the pellicle which has a reduced thickness when compared to surrounding regions of the pellicle.

A photomask assembly includes: a transparent substrate; a first insulating layer on the transparent substrate and having hydrophilicity; a first metal layer on the first insulating layer and having a first opening; a second insulating layer on the first metal layer and having hydrophobicity; and a lens unit in the first opening.

A photomask assembly includes: a transparent substrate; a first insulating layer on the transparent substrate and having hydrophilicity; a first metal layer on the first insulating layer and having a first opening; a second insulating layer on the first metal layer and having hydrophobicity; and a lens unit in the first opening.