[Object] To provide a negative type photosensitive composition developable with a low concentration alkali developer and capable of forming a cured film excellent in transparency, in chemical resistance and in environmental durability; and further to provide a pattern-formation method employing the composition. [Means] The present invention provides a negative type photosensitive composition comprising: (I) an alkali-soluble resin, namely, a polymer comprising a carboxyl-containing polymerization unit and an alkoxysilyl-containing polymerization unit, (II) a polysiloxane, (III) a compound having two or more (meth)acryloyloxy groups, (IV) (i) a silicone derivative having a particular structure and/or (ii) a compound having two or more epoxy groups, (V) a polymerization initiator, and (VI) a solvent.

Provided is a composition with which a film that allows transmission of infrared light in a state where noise generated from visible light is small can be formed. In addition, provided are a film, a laminate, an infrared transmitting filter, a solid image pickup element, and an infrared sensor. This composition includes: a coloring material that allows transmission of infrared light and shields visible light; an infrared absorber; and a curable compound, in which the infrared absorber includes a material that shields light in a wavelength range of longer than 1000 nm and 1200 nm or shorter. In the composition, a ratio A/B of a minimum value A of an absorbance of the composition in a wavelength range of 400 to 1100 nm to a maximum value B of an absorbance of the composition in a wavelength range of 1400 to 1500 nm is 4.5 or higher.

A photoresist material, a method of fabricating the same, and a color filter substrate are described. The photoresist material has an oligomer segment having a chemical structural formula of: ##STR00001##
wherein a value of n is 1 to 2.

Provided are a resin composition including a coloring material, a resin, and a solvent, in which the resin includes a resin having a structure represented by Formula (1); a film formed of the resin composition; an optical filter; a solid-state imaging element; and an image display device. In Formula (1), Z.sup.1 represents an (m+n)-valent linking group, Y.sup.1 and Y.sup.2 each independently represent a single bond or a divalent linking group, A.sup.1 represents a group including a coloring material adsorption portion, P.sup.1 represents a polymer chain, n represents 1 to 20, m represents 1 to 20, and m+n represents 2 to 21, and in a case where m is 1, the polymer chain represented by P.sup.1 includes a repeating unit having an oxetane group, and in a case where m is 2 or more, at least one polymer chain of m pieces of polymer chains represented by P.sup.1 includes a repeating unit having an oxetane group.

[A.sup.1-Y.sup.1.sub.nZ.sup.1Y.sup.2-P.sup.1].sub.m  (1)

In a conductive film, a cured film formed of a photosensitive resin composition including at least one of monomers represented by Formulae (1) and (2), a clay mineral, and a photopolymerization initiator is provided as a protective layer of a lead-out wiring part of the conductive film that functions as a touch sensor.

A display substrate includes a substrate and a color filter layer disposed on the substrate. The color filter layer includes a plurality of filter units arranged in an array and a plurality of light-shielding units. Every two adjacent filter units are provided with a light-shielding unit of the plurality of light-shielding units therebetween. The light-shielding unit includes a filter pattern of a first color and a filter pattern of a second color that are stacked in a thickness direction of the substrate, the filter pattern of the first color is closer to the substrate than the filter pattern of the second color.

Provided is a pattern-forming composition, including: an infrared absorbing colorant; and at least one compound selected from the group consisting of a resin having a glass transition temperature of 150° C. to 300° C. and a precursor of a resin having a glass transition temperature of 150° C. to 300° C.

The invention relates to a composition comprising i) A colorant ii) A radical generating photoinitiator, iii) A polymer wherein at least 40 mol-% of the repeating units are units according to formula (I), [Formula should be inserted herm] wherein R.sup.1 independently of each occurrence is H or CH.sub.3, R.sup.2 is a group of formula (II), [Formula should be inserted here] wherein L is a linking group, n is 0 or 1, and X independently of each occurrence is O or CH.sub.2, R.sup.3 independently of each occurrence is selected from H, COOH, and a group of formula (II), iv) 0.0 to 10.0% by weight, calculated on the on the weight of the polymer iii), of one or ethylenically unsaturated polymerizable monomers having a molecular weight of less than 1500 g/mol.

##STR00001##

The present invention relates to a structure for a quantum dot barrier rib and a process for preparing the same. The structure for a quantum dot barrier rib of the present invention comprises a cured film having a uniform film thickness and an appropriate range of film thickness. Here, the reflectance R.sub.SCI measured by the SCI (specular component included) method and the reflectance R.sub.SCE measured by the SCE (specular component excluded) method are reduced, and the ratio between them (R.sub.SCE/R.sub.SCI) is appropriately adjusted, so that it is possible to satisfy such characteristics as high light-shielding property and low reflectance at the same time while the resolution and pattern characteristics are maintained to be excellent. In addition, when the structure for a quantum dot barrier rib is prepared, it is possible to form a multilayer pattern having a uniform film thickness suitable for the quantum dot barrier ribs in a single development process. Thus, it can be advantageously used for a quantum dot display.

An electrophoretic display (100) comprises an electrophoretic medium (114) having electrically charged particles disposed in a fluid and capable of moving through the fluid on application of an electric field. An electrode (104, 120) is disposed adjacent the electrophoretic medium and arranged to apply an electric field thereto. A dielectric layer (106, 118) is disposed between the electrophoretic medium (114) and the electrode (104, 120) and has at least one aperture (107, 119) extending therethrough. The provision of the apertures (107, 119) in the dielectric layers enables the dielectric layers (106, 118) to protect the electrodes (104, 120) while reducing electro-optical kickback. When multiple electrodes (104, 120) are present adjacent the electrophoretic medium (114), more than one or all of the electrodes (104, 120) may be provided with apertured dielectric layers (106, 118).