A display device provided with a display region including a plurality of pixels and a frame region surrounding the display region includes a thin film transistor layer, a light-emitting element layer including a plurality of light-emitting elements, each including a first electrode, a light emitting layer, and a second electrode, and each having a different luminescent color. In the light-emitting layer, an oxetane monomer, an epoxy monomer, and a radical polymerization initiator are used.

Provided is a high-sensitive photosensitive resin composition which contains a black colorant and by which development and pattern formation are possible even with a low exposure amount. A positive-type photosensitive resin composition according to one embodiment contains: a first resin (A) having a plurality of phenolic hydroxyl groups, at least some of which are protected with an acid-labile group; a second resin (B) having an epoxy group and a phenolic hydroxyl group; at least one colorant (C) selected from the group consisting of a black dye and a black pigment; and a photoacid generator (D).

Provided is a photosensitive coloring composition comprising a pigment, an amine compound having two or more cyclic amino groups in a molecule, a resin, and a photopolymerization initiator, in which a content of the pigment is 40% by mass or more with respect to a total solid content of the photosensitive coloring composition; a cured substance of the photosensitive coloring composition; a color filter including the cured substance; a solid-state imaging element; or an image display device.

The purpose of the present invention is to obviate patterning defects of electrodes in through-holes formed in an organic passivation film for connection between TFTs and pixel electrodes in an ultra-high definition display device. To achieve the foregoing, the present invention has a configuration such as the following. This display device, in which a TFT (thin-film transistor) is formed on a substrate, an organic passivation film is formed covering the TFT, and a first pixel electrode, a first common electrode, a second pixel electrode, and a second common electrode are formed on the organic passivation film, is characterized in that the first pixel electrode is connected to the TFT via a through-hole formed in the organic passivation film, the through-hole is filled with a filler, and an end of the second pixel electrode is present on the upper side of the filler.

A compound, a photosensitive resin composition including the same, a color filter manufactured using the photosensitive resin composition, and a CMOS image sensor including the color filter, the compound being represented by Chemical Formula 1:

A-L-B.  [Chemical Formula 1]

Provided is a composition with which a pattern having excellent adhesiveness can be formed. In addition, provided are a film, an infrared transmitting filter, a solid image pickup element, an image display device, and an infrared sensor. This composition includes a coloring material, a resin, a polymerizable compound, and a photopolymerization initiator. The polymerizable compound includes a compound A having an alkyleneoxy group and three ethylenically unsaturated groups, and a ratio A/B of a minimum value A of an absorbance of the composition in a wavelength range of 400 to 750 nm to a maximum value B of an absorbance of the composition in a wavelength range of 1100 to 1300 nm is 4.5 or higher.

The present disclosure provides a display substrate, a method for preparing the same, and a display device including the display substrate. The method includes: forming a conductive layer; forming a first photoresist pattern and a second photoresist pattern on the conductive layer, in which the adhesion between the first photoresist pattern and the conductive layer is less than the adhesion between the second photoresist pattern and the conductive layer; and etching the conductive layer by using the first photoresist pattern and the second photoresist pattern as masks to form a first conductive pattern and a second conductive pattern, respectively, in which a line width difference between the first conductive pattern and the first photoresist pattern is greater than a line width difference between the second conductive pattern and the second photoresist pattern.

Provided are a near-infrared absorbing photosensitive composition including at least one oxocarbon compound selected from a compound represented by Formula (SQ1) or a compound represented by Formula (CR1), a polymerizable compound, a photopolymerization initiator, and a solvent; a cured film formed of the near-infrared absorbing photosensitive composition; an optical filter; a method for forming a pattern; a laminate; a solid-state imaging element; an image display device; and an infrared sensor. In Formula (SQ1), Rs.sup.1 and Rs.sup.2 each independently represent a monovalent organic group. In Formula (CR1), Rc.sup.1 and Rc.sup.2 each independently represent a monovalent organic group. ##STR00001##

An object of the present invention is to provide a colored curable resin composition for forming an optical filter in which the occurrence of foreign matter is reduced. The present invention relates to a colored curable resin composition containing a colorant, a resin, a polymerizable compound, and a polymerization initiator, wherein the colorant is a colorant containing a compound represented by formula (I) or formula (II).

##STR00001##

A photographic film is formed by combining panchromatic black and white emulsion with a color filter array to produce a full color image using only black and white film and processing.