An alternating copolymer including a structural unit (a0-1) represented by general formula (a0-1) and a structural unit (a0-2) represented by general formula (a0-2) in which Rp.sup.01 represents a hydrogen atom or the like; Vp.sup.01 represents a single bond or a divalent linking group; Rp.sup.02 and Rp.sup.03 each independently represents a hydrocarbon group which may have a substituent, or Rp.sup.02 and Rp.sup.03 are mutually bonded to form a ring; Rp.sup.04 represents a hydrogen atom, a C1-C5 alkyl group or a C1-C5 halogenated alkyl group; Rp.sup.05 represents an alkyl group, an alkoxy group, a halogen atom, a halogenated alkyl group, a cyano group or a hydroxy group; Rp.sup.06 represents a linear or branched aliphatic hydrocarbon group; and m represents an integer of 0 to 4 ##STR00001##

A flexible substrate includes a plastic film and an overcoat layer. The plastic film includes a main portion and plural fillers. The fillers are located in the main portion or on a surface of the main portion. The overcoat layer covers the plastic film and is in contact with the plastic film. A material of the overcoat layer includes polyimide (PI), polybenzoxazole (PBO), benzocyclobutene (BCB), acrylic resin, epoxy resin, siloxane polymer, or novolak resin.

A flexible substrate includes a plastic film and an overcoat layer. The plastic film includes a main portion and plural fillers. The fillers are located in the main portion or on a surface of the main portion. The overcoat layer covers the plastic film and is in contact with the plastic film. A material of the overcoat layer includes polyimide (PI), polybenzoxazole (PBO), benzocyclobutene (BCB), acrylic resin, epoxy resin, siloxane polymer, or novolak resin.

There are provided a light absorption filter containing a resin, a dye having a main absorption wavelength band in a wavelength range of 400 to 700 nm, and a compound that generates a radical upon ultraviolet irradiation, where the resin is composed of a polymer having both a high affinity part and a low affinity part with respect to the dye and the compound that generates a radical upon ultraviolet irradiation, or a light absorption filter containing a dye having a main absorption wavelength band in a wavelength range of 400 to 700 nm and a resin composed of a polymer including a partial structure that generates a radical upon ultraviolet irradiation, an optical filter, a self-luminous display device, an organic electroluminescent display device, and a liquid crystal display device, in which this light absorption filter is used, as well as a manufacturing method for an optical filter.

There are provided a light absorption filter containing a resin, a dye having a main absorption wavelength band in a wavelength range of 400 to 700 nm, and a compound that generates a radical upon ultraviolet irradiation, where the resin is composed of a polymer having both a high affinity part and a low affinity part with respect to the dye and the compound that generates a radical upon ultraviolet irradiation, or a light absorption filter containing a dye having a main absorption wavelength band in a wavelength range of 400 to 700 nm and a resin composed of a polymer including a partial structure that generates a radical upon ultraviolet irradiation, an optical filter, a self-luminous display device, an organic electroluminescent display device, and a liquid crystal display device, in which this light absorption filter is used, as well as a manufacturing method for an optical filter.

Provided is a photosensitive structural body including: a substrate having a hydroxy group on a first surface thereof; and a cured product of a negative photosensitive resin composition arranged on the substrate, wherein the negative photosensitive resin composition contains an epoxy compound (A), a photobase generator (B), and an aromatic compound (C), and the aromatic compound (C) is a compound represented by the following general formula (1):

##STR00001##

in the general formula (1), four of R.sub.1 to R.sub.6 each independently represent a hydrogen atom or an alkyl group, and remaining two thereof each independently represent a functional group selected from an unsubstituted amino group (—NH.sub.2), a hydroxy group (—OH), and a carboxyl group (—COOH), provided that the two functional groups each selected from an unsubstituted amino group, a hydroxy group, and a carboxyl group are functional groups different from each other.

A method according to the present disclosure includes providing a substrate, depositing an underlayer over the substrate, depositing a photoresist layer over the underlayer, exposing a portion of the photoresist layer and a portion of the underlayer to a radiation source according to a pattern, baking the photoresist layer and underlayer, and developing the exposed portion of the photoresist layer to transfer the pattern to the photoresist layer. The underlayer includes a polymer backbone, a polarity switchable group, a cross-linkable group bonded to the polymer backbone, and photoacid generator. The polarity switchable group includes a first end group bonded to the polymer backbone, a second end group including fluorine, and an acid labile group bonded between the first end group and the second end group. The exposing decomposes the photoacid generator to generate an acidity moiety that detaches the second end group from the polymer backbone during the baking.

lithographic printing plate precursor including on a substrate which has a hydrophilic surface or which is provided with a hydrophilic layer, a coating comprising a photopolymerisable layer including a polymerisable compound, a photoinitiator and adhesion promoting compound containing at least one thiol group and at least one group capable of adhering to the substrate.

lithographic printing plate precursor including on a substrate which has a hydrophilic surface or which is provided with a hydrophilic layer, a coating comprising a photopolymerisable layer including a polymerisable compound, a photoinitiator and adhesion promoting compound containing at least one thiol group and at least one group capable of adhering to the substrate.

Environmentally stable, chemically amplified (CA) positive resist compositions are described. These resist compositions are based on a blend of at least two types of polymer platforms. The first platform is a low activation energy, acetal blocked polyhydroxystyrene (PHS) based resin; the second platform is an acrylate based resin containing a high activation energy acid labile group [such as tertiary-butyl acrylate(t-BA)]. The resist composition also contains a photo-acid generator (PAG), a base quencher, a surfactant dissolved in a suitable solvent. Also described, is the use of these resist composition in a method for forming a photoresist relief image on a substrate.