A method for forming a 3D pattern structure on a 3D substrate and a device having color resist pattern is disclosed. The disclosure uses the fitting aids to apply pressure on the thin-film mask to paste on the 3D substrate. After the template device had formed, send the template device to the exposure machine, and then the high resolution photo-resist pattern is made on the 3D substrate. After a Lift-off procedure, the thin-film pattern is formed and the photo-resist is removed.

A method for forming a 3D pattern structure on a 3D substrate and a device having color resist pattern is disclosed. The disclosure uses the fitting aids to apply pressure on the thin-film mask to paste on the 3D substrate. After the template device had formed, send the template device to the exposure machine, and then the high resolution photo-resist pattern is made on the 3D substrate. After a Lift-off procedure, the thin-film pattern is formed and the photo-resist is removed.

A method for fabricating metal decorations on a domed dial made of insulating material, wherein the method includes the steps of forming a photosensitive resin mould by a UV LIGA type process, and electrodepositing a layer of at least one metal starting from the conductive layer to form a block, which substantially reaches the upper surface of the photosensitive resin.

A system and method are provided for depositing a uniform layer of a dampening solution using a vapor deposition/condensation process or technique on a reimageable surface in an image forming device using a proposed variable data digital lithographic image forming architecture that transfers ink at an efficiency rate in excess of 95 percent. A reimageable surface is configured of a low surface energy surface component that directly accepts a vaporized dampening solution having a lower surface energy than the surface energy of the reimageable surface. A uniformity in the layer of condensed dampening solution on the reimageable surface is a product of the relative difference in the low surface energy of the reimageable surface and the lower surface energy of the dampening solution.

A system and method are provided for depositing a uniform layer of a dampening solution using a vapor deposition/condensation process or technique on a reimageable surface in an image forming device using a proposed variable data digital lithographic image forming architecture that transfers ink at an efficiency rate in excess of 95 percent. A reimageable surface is configured of a low surface energy surface component that directly accepts a vaporized dampening solution having a lower surface energy than the surface energy of the reimageable surface. A uniformity in the layer of condensed dampening solution on the reimageable surface is a product of the relative difference in the low surface energy of the reimageable surface and the lower surface energy of the dampening solution.

A coating apparatus configured to coat a peripheral surface of an endless member with a coating liquid, includes: a holding member configured to hold the endless member; an impregnation member configured to be impregnated with the coating liquid and configured to coat the endless member with the coating liquid in contact with the endless member; a nozzle member configured to eject the coating liquid onto the endless member; a rotating mechanism configured to rotate the holding member relative to the impregnation member and the nozzle member; and a moving mechanism configured to move the holding member relative to the impregnation member and the nozzle member so that the coating liquid is ejected from the nozzle member onto the endless member in a region where the coating liquid is already coated by the impregnation member.

A method for forming a 3D pattern structure on a 3D substrate and a device having color resist pattern is disclosed. The disclosure uses the fitting aids to apply pressure on the thin-film mask to paste on the 3D substrate. After the template device had formed, send the template device to the exposure machine, and then the high resolution photo-resist pattern is made on the 3D substrate. After a Lift-off procedure, the thin-film pattern is formed and the photo-resist is removed.

Laminate comprising a) a photopolymerizable relief-forming layer, at least containing an elastomeric binder, ethylenically unsaturated monomers and a photoinitiator and optionally further additives, b) an optionally photopolymerizable elastomeric substrate layer, at least containing an elastomeric binder, optionally ethylenically unsaturated monomers and a photoinitiator and optionally further additives,
the relief-forming layer a) having a hardness of 30 to 70 Shore A and the elastomeric substrate layer b) having a hardness of 75 Shore A to 70 Shore D in each case in the photopolymerized state, and the layer b) having a hardness of at least 5 Shore A greater than the layer a).

Laminate comprising a) a photopolymerizable relief-forming layer, at least containing an elastomeric binder, ethylenically unsaturated monomers and a photoinitiator and optionally further additives, b) an optionally photopolymerizable elastomeric substrate layer, at least containing an elastomeric binder, optionally ethylenically unsaturated monomers and a photoinitiator and optionally further additives,
the relief-forming layer a) having a hardness of 30 to 70 Shore A and the elastomeric substrate layer b) having a hardness of 75 Shore A to 70 Shore D in each case in the photopolymerized state, and the layer b) having a hardness of at least 5 Shore A greater than the layer a).

The disclosure illustrates a curve-shaped mask, a curved device having color resist pattern and method for manufacturing the same. The curved device includes a curved substrate and at least two color resist layers. The at least two color resist layers are formed on the curved substrate, and construct a visible pattern together.