To address the needs in the art, a method of fabricating a meta-surface antireflective coating that includes forming on a substrate or in a film on the substrate, using a patterning method, a pattern of nanostructures, where the nanostructures include a pattern of nanowires or a pattern of nanoparticles, or the pattern nanowires and the pattern of nanoparticles, where the nanostructures are arranged to form a metasurface AR coating, where the metasurface AR coating reflects incident light in a double-dip reflectance according to a doubly-resonant arrangement of the metasurface AR coating, where the metasurface AR coating comprises a structure for a direct light pathway and a resonant light pathway.

A radiation-sensitive resin composition includes: an onium salt compound represented by formula (1′); a resin including a structural unit having an acid-dissociable group; and a solvent. E.sup.A is a substituted or unsubstituted (α+β)-valent organic group having 1 to 40 carbon atoms; Z.sup.+ is a monovalent radiation-sensitive onium cation; and α and β are each independently 1 or 2.

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An optical device is fabricated with a higher resolution of features in a patterned lattice. A photoresist is applied to a device layer for the optical device. Several photomasks offset from one another are used in different exposure steps to expose the photoresist with features. The features in each exposure can have different characteristic dimensions, such as different diameters for posts or holes to be produced in the device layer. Once the exposures are complete, the patterned lattice of the features are produced in the device layer. For example, the photoresist is developed, and reactive ion etching is used to produce the features in the device layer.

A process for transferring a component from a release layer by exposing the release layer to light and heat from different sources is described. The process includes providing an assembly comprising a substrate, a release layer and a component, heating the release layer and exposing the release layer to an actinic wavelength of light, wherein the heating source and the actinic irradiation source are different sources.

A system for performing biological reactions is provided. The system includes a chip including a substrate and a plurality of reaction sites. The plurality of reaction sites are each configured to include a liquid sample of at most one nanoliter. Further, the system includes a control system configured to initiate biological reactions within the liquid samples. The system further includes a detection system configured to detect biological reactions on the chip. According to various embodiments, the chip includes at least 20000 reaction sites. In other embodiments, the chip includes at least 30000 reaction sites.

An optical component includes at least one micro-opto-electro-mechanical system (MOEMS) with a front side and a rear side. The optical component also includes at least one printed circuit board arranged on the rear side of the at least one MOEMS. The at least one printed circuit board has lateral contacts. The at least one printed circuit board may be equipped with electronic parts and cooling elements. The at least one MOEMS projects laterally beyond the at least one printed circuit board.

In a method of manufacturing a photo mask for lithography, circuit pattern data are acquired. A pattern density, which is a total pattern area per predetermined area, is calculated from the circuit pattern data. Dummy pattern data for areas having pattern density less than a threshold density are generated. Mask drawing data is generated from the circuit pattern data and the dummy pattern data. By using an electron beam from an electron beam lithography apparatus, patterns are drawn according to the mask drawing data on a resist layer formed on a mask blank substrate. The drawn resist layer is developed using a developing solution. Dummy patterns included in the dummy pattern data are not printed as a photo mask pattern when the resist layer is exposed with the electron beam and is developed.

This manufacturing method of a metal component enables precision processing of a corner portion, and the radius of curvature of a cog tip of a gear and the like can be made smaller than before. The manufacturing method of a metal component includes: (a) forming a mask film having, in plan view, a first side, a second side, and an extension portion that extends from a region between the first side and the second side on a metal film; and (b) forming a corner portion having, in plan view, a third side and a fourth side by etching the metal film.

Described is a resinous structure derived from fluorine-containing polymers useful as a mold having excellent dimensional stability.

Embodiments regard fabrication of air gap regions in multicomponent lens systems. An embodiment of an apparatus includes a first lens, the first lens including a pattern of photoresist material; a second lens bonded with the first lens by the photoresist material; and an air gap region between the first lens and the second lens. The photoresist pattern defines the air gap region between the first lens and the second lens.