A circuit pattern is quickly created or changed by exposing the circuit pattern on a board without using a photo mask on which the circuit pattern is formed. There is provided a circuit pattern manufacturing apparatus including a forming unit that forms a circuit pattern by irradiating, with a light beam, a circuit pattern forming sheet including an insulating sheet base material layer and a mixture layer made of a mixture containing a conductive material and a photo-curing resin. The forming unit includes, as an optical engine, a housing, a laser diode, a prism mirror, an inclined mirror, a bottom mirror, and a driving mirror.

Substrate processing techniques to alleviate missing contact holes, scummed contact holes and scummed caused bridging are disclosed. In one embodiment, electromagnetic radiation (EMR) absorbing molecules are utilized in a process that uses an initial patterned exposure followed by a flood exposure. In one embodiment, a Photo-Sensitized Chemically-Amplified Resist (PSCAR) resist process is utilized to form contact holes in which an initial exposure and develop process is performed followed by a flood exposure and a second develop process. In another embodiment, a process is utilized in which precursors of EMR absorbing molecules are incorporated into a layer underlying the resist layer. Thus, enhanced formation of EMR absorbing molecules will result at the interface of the resist layer and the underlying layer.

The present invention provides a system for conservation and efficient use of energy through controlling and monitoring of devices. At least one processing controller connected to a sensor and a device, the processing controller configured to receive the ambient data from the sensor and operating parameters from the device; a user module configured to IO receive input parameters from a plurality of users; a central processing module, connected to the structure, the user module, and the admin module through wired and/or wireless connection, the central processing module configured to process the data received from the processing controller adapted in the zone of the structure and generate the optimum parameters for operating the device adapted in the zone to the structure.

In one embodiment, a blanking aperture array system includes a blanking aperture array substrate provided blankers corresponding to each beam of a multi beam, a first radiation shield, and a second radiation shield. A circuit section applying a voltage to the blankers is disposed closer to a peripheral edge than a cell section including the blankers. The first radiation shield includes a first plate covering over the circuit section, disposed on an upper surface of the blanking aperture array substrate, and extending from a peripheral edge of a first opening for passage of the multi beam. The second radiation shield covers under the circuit section, and includes a lower peripheral wall section that hangs down from a lower surface of the blanking aperture array substrate and surrounds the cell section, and a lower plate extending from a peripheral edge of a lower opening for passage of the multi beam.

A stretchable transparency-adjusting film includes an inner elastic part having a three-dimensional network shape and including a first elastomer, an inorganic thin film surrounding the inner elastic part, and an outer elastic part surrounding the inorganic thin film and including a second elastomer. A scattering unit defined by the inner elastic part, the inorganic thin film and the outer elastic part in a cross-section is orientated in an inclined direction to a vertical direction and a horizontal direction.

A touch sensor member includes a substrate sectioned into a display region and a design region; a conductive pattern formed on the display region and having a line width of 2 to 6 m; and a conductive pattern formed on the design region and having a line width of 7 to 100 m, wherein the conductive pattern having a line width of 2 to 6 m and the conductive pattern having a line width of 7 to 100 m have the same composition.

An exposure device is disclosed, including: a light source (1), an illumination module (2), a mask stage (5), a projection objective module, an imaging position adjustment module (4) and a wafer stage (6), disposed sequentially along a direction of light propagation, the imaging position adjustment module (4) including a plurality of adjustment elements (410) arranged individually, the projection objective module including a plurality of projection objectives (3) each having an FoV in positional correspondence with a respective one of the plurality of adjustment elements (410). The imaging position adjustment module (4) ensures satisfactory imaging quality and FoV stitching quality of the projection objectives (3) by performing translation, magnification, focal plane and other adjustments on an image formed by the projection objective module. The projection objective module is simpler as it does not contain any component or mechanism for imaging position adjustment.

The present invention provides a system for conservation and efficient use of energy through controlling and monitoring of devices. At least one processing controller connected to a sensor and a device, the processing controller configured to receive the ambient data from the sensor and operating parameters from the device; a user module configured to IO receive input parameters from a plurality of users; a central processing module, connected to the structure, the user module, and the admin module through wired and/or wireless connection, the central processing module configured to process the data received from the processing controller adapted in the zone of the structure and generate the optimum parameters for operating the device adapted in the zone to the structure.

An exposure device is disclosed, including: a light source (1), an illumination module (2), a mask stage (5), a projection objective module, an imaging position adjustment module (4) and a wafer stage (6), disposed sequentially along a direction of light propagation, the imaging position adjustment module (4) including a plurality of adjustment elements (410) arranged individually, the projection objective module including a plurality of projection objectives (3) each having an FoV in positional correspondence with a respective one of the plurality of adjustment elements (410). The imaging position adjustment module (4) ensures satisfactory imaging quality and FoV stitching quality of the projection objectives (3) by performing translation, magnification, focal plane and other adjustments on an image formed by the projection objective module. The projection objective module is simpler as it does not contain any component or mechanism for imaging position adjustment.

A circuit pattern is quickly created or changed by exposing the circuit pattern on a board without using a photo mask on which the circuit pattern is formed. There is provided a circuit pattern manufacturing apparatus including a forming unit that forms a circuit pattern by irradiating, with a light beam, a circuit pattern forming sheet including an insulating sheet base material layer and a mixture layer made of a mixture containing a conductive material and a photo-curing resin. The forming unit includes, as an optical engine, a housing, a laser diode, a prism mirror, an inclined mirror, a bottom mirror, and a driving mirror.