Embodiments of the present disclosure generally provide improved photolithography systems and methods using a digital micromirror device (DMD). The DMD comprises columns and rows of micromirrors disposed opposite a substrate. Light beams reflect off the micromirrors onto the substrate, resulting in a patterned substrate. Certain subsets of the columns and rows of micromirrors may be positioned to the off position, such that they dump light, in order to correct for uniformity errors, i.e., features larger than desired, in the patterned substrate. Similarly, certain subsets of the columns and rows of micromirrors may be defaulted to the off position and selectively allowed to return to their programmed position in order to correct for uniformity errors, i.e., features smaller than desired, in the patterned substrate.

This invention relates to the field of 3D printing used to make a dental aligner for the purpose of straightening teeth or a mouthguard for the purpose of protecting teeth. The appliance is a hard polymer layer that encases the upper, lower or both sets of teeth to exert correcting forces on the teeth to realign their position, optionally these clear aligners can also incorporate a wire for more rapid treatment. This invention describes a method of directly 3D printing the aligner or mouthguard from liquid photopolymer rather than as it is currently manufactured by thermoforming plastic over a custom model and then trimming it to the desired size.

Embodiments described herein provide a system, a software application, and a method of a lithography process, to write full tone portions and grey tone portions in a single pass. One embodiment includes a controller configured to provide mask pattern data to a lithography system. The controller is configured to divide a plurality of spatial light modulator pixels spatially by at least a grey tone group and a full tone group of spatial light modulator pixels. When divided by the controller, the grey tone group of spatial light modulator pixels is operable to project a first number of the multiplicity of shots to the plurality of full tone exposure polygons and the plurality of grey tone exposure polygons, and the full tone group of spatial light modulator pixels is operable to project a second number of the multiplicity of shots to the plurality of full tone exposure polygons.

A super-resolution system for nano-patterning is disclosed, comprising an exposure head that enables a super-resolution patterning exposures. The super-resolution exposures are carried out using electromagnetic radiation and plasmonic structures, and in some embodiments, plasmonic structures having specially designed super-resolution apertures, of which the bow-tie and C-aperture are examples. These apertures create small but bright images in the near-field transmission pattern. A writing head comprising one or more of these apertures is held in close proximity to a medium for patterning. In some embodiments, a data processing system is provided to re-interpret the data to be patterned into a set of modulation signals used to drive the multiple individual channels and multiple exposures, and a detection means is provided to verify the data as written.

An image exposure device (10) includes an image display device (20) having a pixel (21), a photosensitive recording medium support portion that supports a photosensitive recording medium (40) in which an image of the image display device (20) is recorded in a state in which an exposure surface (40A) of the photosensitive recording medium (40) faces the image display device (20), a collimation portion (50) that is provided between the image display device (20) and the photosensitive recording medium (40) and makes light from the pixel (21) into parallel light, and an absorption layer (60) that is provided between the image display device (20) and the photosensitive recording medium (40) and has a light transmittance for the light from the pixel (21) of 50% or less.

The invention relates to a method for exposing at least one stored image (21) on a light-sensitive recording medium (14), with an exposure device (11), which picks up at least one recording medium (14) on a support (12), with at least one exposure head (16, 17), which is moved above the support (12) along a guiding axis (18) in the X direction and the guiding axis (18) and/or the support (12) are moved in the Y direction, with a control system, by which a traversing movement of the at least one exposure head (16, 17) is operated for exposing the at least one image (21) of the recording medium (14) and/or the recording medium (14), wherein the position of the recording medium (14) and/or the position of the at least one image (21) on the recording medium (14) are detected with at least one linear image acquisition device (25), which extends at least partially in the X direction.

A novel digital projection system, used to build multi-dimensional structures by the process of photolithography, is presented herein. An exemplary embodiment of the digital projection system describes a process by which multi-dimensional structures are constructed using a layer or series of layers of polymerized light sensitive material. Attributes of this digital projection system offer several enhancements over traditional approaches. The use of the digitally projected images and light sensitive material both eliminates the need for single-use masks and moves the process outside of traditional fabrication environment. Further, through the use of various optic systems, digitally projected images can be scaled to accommodate the construction of multi-dimensional structures spanning the spatial ranges of devices employing the photolithography process and permits for numerous application specific embodiments of the digital projection system described herein.

An image exposure device includes an image display device having pixels, a photosensitive recording medium support portion that supports a photosensitive recording medium for recording an image of the image display device in a state in which an exposure surface of the photosensitive recording medium faces the image display device, a louver film that is provided between the image display device and the photosensitive recording medium support portion, and in which light transmitting portions that transmit light and light shielding portions that block light are alternately arranged in a first direction, and light transmitting portions that transmit light and light shielding portions that block light are alternately arranged in a second direction, and a protective layer that is provided on the louver film on a side of the photosensitive recording medium support portion.

The present disclosure provides a method for manufacturing an array substrate and a method for manufacturing a liquid crystal antenna, and relates to the technical field of liquid crystal antennas and array substrates. The method for manufacturing an array substrate includes: sequentially depositing a metal material layer and a photoresist material layer on a substrate to form a plurality of metal patterns and a plurality of photoresist patterns on the plurality of metal patterns; and forming a light-shielding material between at least two adjacent metal patterns such that the light-shielding material and the plurality of photoresist patterns have opposite hydrophobicity-hydrophilicity; curing the light-shielding material to form at least one light-shielding pattern such that a thickness of the at least one light-shielding pattern is the same as a thickness of the plurality of metal patterns; and removing the plurality of photoresist patterns.

Embodiments of the present disclosure generally provide improved photolithography systems and methods using a digital micromirror device (DMD). The DMD comprises columns and rows of micromirrors disposed opposite a substrate. Light beams reflect off the micromirrors onto the substrate, resulting in a patterned substrate. Certain subsets of the columns and rows of micromirrors may be positioned to the off position, such that they dump light, in order to correct for uniformity errors, i.e., features larger than desired, in the patterned substrate. Similarly, certain subsets of the columns and rows of micromirrors may be defaulted to the off position and selectively allowed to return to their programmed position in order to correct for uniformity errors, i.e., features smaller than desired, in the patterned substrate.