A component with a reflective substrate, a photoresist layer disposed on the reflective substrate, and a light diffusing layer sandwiched between the reflective substrate and the photoresist layer is provided. The light diffusing layer includes an outer metal oxide layer with an outer rough surface configured to diffuse laser light during laser interference lithography of the photoresist layer. The outer metal oxide is also configured to be reduced to a conductive metallic layer during electroplating of the substrate. The outer metal oxide layer includes a plurality of elongated light diffusing elements extending in an outward direction from the substrate such that the outer rough surface diffuses at least 90% of laser light during the laser interference lithography of the photoresist layer.

A device and a method for regulating and controlling an incident angle of a light beam in a laser interference lithography process are disclosed. The device comprises: a beam splitter prism between a first lens and a second lens, a first position detector, a first decoupling lens between the first position detector and the beam splitter prism, a feedback control system connected to the first position detector and a first universal reflecting mirror. The beam splitter prism reflects first incident light passing through the first universal reflecting mirror, the first decoupling lens enables a first reflected light enter into the first position detector, the first position detector measures the light beam position, the feedback control system outputs a control command according to the measurement result to regulate a mirror base of the first universal reflecting mirror, thereby regulating and controlling an incident angle of an exposure light beam.

Cascaded metasurfaces can control the phase, amplitude and polarization of an electromagnetic beam, shaping it in three dimensional configuration not achievable with other methods. Each cascaded metasurface has dielectric or metallic scatterers arranged in a period array. The shape of the scatterers determines the three dimensional configuration of the output beam and is determined with iterative calculations through computational simulations.

A component with a reflective substrate, a photoresist layer disposed on the reflective substrate, and a light diffusing layer sandwiched between the reflective substrate and the photoresist layer is provided. The light diffusing layer includes an outer metal oxide layer with an outer rough surface configured to diffuse laser light during laser interference lithography of the photoresist layer. The outer metal oxide is also configured to be reduced to a conductive metallic layer during electroplating of the substrate. The outer metal oxide layer includes a plurality of elongated light diffusing elements extending in an outward direction from the substrate such that the outer rough surface diffuses at least 90% of laser light during the laser interference lithography of the photoresist layer.

According to examples, a phase plate may include a transparent substrate and a photopolymer layer attached to the transparent substrate. The photopolymer layer may adjust a backlight via a phase adjustment and focusing. The phase plate may focus a plurality of red, green, and blue components of the backlight onto respective red, green, and blue subpixels of a thin-film-transistor (TFT) layer deposited thereon. A distance between the photopolymer layer of the phase plate and the plurality of red, green, and blue subpixels of the thin-film-transistor (TFT) layer may be in a range from about 200 μm to about 500 μm. In some examples, the phase plate may be part of a liquid crystal display (LCD) apparatus along with a red, green, blue (RGB) laser to provide backlight; a grating light guide to transmit the backlight; and a liquid crystal display (LCD) layer on the thin-film-transistor (TFT) layer.

Embodiments described herein provide a method of large area lithography to decrease widths of portions written into photoresists. One embodiment of the method includes projecting an initial light beam of a plurality of light beams at a minimum wavelength to a mask in a propagation direction of the plurality of light beams. The mask has a plurality of dispersive elements. A wavelength of each light beam of the plurality of light beams is increased until a final light beam of the plurality of light beams is projected at a maximum wavelength. The plurality of dispersive elements of the mask diffract the plurality of light beams into order mode beams to produce an intensity pattern in a medium between the mask and a substrate having a photoresist layer disposed thereon. The intensity pattern having a plurality of intensity peaks writes a plurality of portions in the photoresist layer.

A particle detection method detects presence and location of particles on a target using measured signals from a plurality of structured illumination patterns. The particle detection method uses measured signals obtained by illuminating the target with structured illumination patterns to detect particles. Specifically, the degree of variation in these measured signals in raw images is calculated to determine whether a particle is present on the target at a particular area of interest.

Cascaded metasurfaces can control the phase, amplitude and polarization of an electromagnetic beam, shaping it in three dimensional configuration not achievable with other methods. Each cascaded metasurface has dielectric or metallic scatterers arranged in a period array. The shape of the scatterers determines the three dimensional configuration of the output beam and is determined with iterative calculations through computational simulations.

A method for printing a periodic pattern of linear features into a photosensitive layer which includes providing a mask bearing a pattern of linear features, arranging the substrate parallel to the mask, generating an elongated beam for illuminating the mask with a range of angles of incidence in a plane parallel to the linear features and with a uniform power per incremental distance along the length of the beam except at its ends where the power per incremental distance falls to zero according to first and second profiles over a fall-off distance, and scanning the beam in first and second sub-exposures to print first and second parts of the desired pattern such that the first and second parts overlap by the fall-off distance. The first and second profiles are selected so that their summation across the fall-off distance produces a uniform power per incremental distance.

A dynamic interference lithography (DIL) device is provided. The device includes a laser source configured for providing a laser beam, a substrate stage configured for mounting a substrate, an at least partially convex curved mirror, and a spatial filter configured to divide the laser beam into a first beam portion directed towards the at least partially convex curved mirror and a second beam portion directed towards the substrate. The first beam portion is reflected by the at least partially convex curved mirror towards the substrate to form an interference pattern on the substrate.