A method and apparatus for forming a magnetic layer having a pattern of magnetic properties on a substrate is described. The method includes using a metal nitride hardmask layer to pattern the magnetic layer by plasma exposure. The metal nitride layer is patterned using a nanoimprint patterning process with a silicon oxide pattern negative material. The pattern is developed in the metal nitride using a halogen and oxygen containing remote plasma, and is removed after plasma exposure using a caustic wet strip process. All processing is done at low temperatures to avoid thermal damage to magnetic materials.

Embodiments of the present disclosure provide a method for selective removal of atoms from a substrate. Such a method comprises forming a patterned mask over at least a portion of the surface of the substrate to form a masked portion and an unmasked portion of the surface. In an embodiment, the method comprises exposing the surface to low energy light ions. In a related embodiment the low energy light ions selectively remove atoms from the unmasked portion of the substrate. In some embodiments, the method further comprises removing the mask. In another embodiment, the present disclosure relates to a method of creating a plurality of magnetic domains on a magnetically susceptible substrate. In an embodiment, the present disclosure pertains to a method of forming a magnetic medium.

Embodiments of the present disclosure provide a method for selective removal of atoms from a substrate. Such a method comprises forming a patterned mask over at least a portion of the surface of the substrate to form a masked portion and an unmasked portion of the surface. In an embodiment, the method comprises exposing the surface to low energy light ions. In a related embodiment the low energy light ions selectively remove atoms from the unmasked portion of the substrate. In some embodiments, the method further comprises removing the mask. In another embodiment, the present disclosure relates to a method of creating a plurality of magnetic domains on a magnetically susceptible substrate. In an embodiment, the present disclosure pertains to a method of forming a magnetic medium.

A method and apparatus for forming magnetic media substrates is provided. A patterned resist layer is formed on a substrate having a magnetically susceptible layer. A conformal protective layer is formed over the patterned resist layer to prevent degradation of the pattern during subsequent processing. The substrate is subjected to an energy treatment wherein energetic species penetrate portions of the patterned resist and conformal protective layer according to the pattern formed in the patterned resist, impacting the magnetically susceptible layer and modifying a magnetic property thereof. The patterned resist and conformal protective layers are then removed, leaving a magnetic substrate having a pattern of magnetic properties with a topography that is substantially unchanged.

A method and apparatus for forming magnetic media substrates is provided. A patterned resist layer is formed on a substrate having a magnetically susceptible layer. A conformal protective layer is formed over the patterned resist layer to prevent degradation of the pattern during subsequent processing. The substrate is subjected to an energy treatment wherein energetic species penetrate portions of the patterned resist and conformal protective layer according to the pattern formed in the patterned resist, impacting the magnetically susceptible layer and modifying a magnetic property thereof. The patterned resist and conformal protective layers are then removed, leaving a magnetic substrate having a pattern of magnetic properties with a topography that is substantially unchanged.

Provided herein is a method, including creating a first pattern in a data region of a substrate, and creating a second pattern in a servo region of a substrate. A circumferential line pattern is created overlapping the first pattern to create rectangle-shaped protrusions in the data region of the substrate. A chevron pattern is created overlapping the second pattern to create chevron-derived protrusions in the servo region of the substrate.

The embodiments disclose a method including depositing a resist layer using a mixture of several different length polymer strings materials spanning a range of natural periodicity, and imprinting the mixture of several different length polymer strings using sheared guiding patterns to increase flexibility.

The embodiments disclose a method including depositing a resist layer using a mixture of several different length polymer strings materials spanning a range of natural periodicity, and imprinting the mixture of several different length polymer strings using sheared guiding patterns to increase flexibility.

According to embodiments of the present invention, a method of writing to an optical data storage medium is provided. The method includes receiving a plurality of data elements, each data element having one of a plurality of values, wherein each value of the plurality of values is associated with a wavelength, and forming, for each data element, a nanostructure arrangement on the optical data storage medium, the nanostructure arrangement configured to reflect light of the wavelength associated with the value of the data element in response to a light irradiated on the optical data storage medium. According to further embodiments of the present invention, a method of reading from an optical data storage medium and an optical data storage medium are also provided.

According to one embodiment, a magnetic recording medium includes a silicon oxide underlayer having a recess pattern having a plurality of recesses, a nonmagnetic underlayer having a first hole pattern having a plurality of holes corresponding to the recess pattern, and a magnetic recording layer having a second hole pattern having a plurality of holes connected with the first hole pattern. The silicon oxide underlayer, the nonmagnetic underlayer, and the magnetic recording layer are formed in order on the substrate.