G11B5/855

Imprint pattern guided self-assembly of lamellar block copolymer for BPM

The embodiments disclose a method of using a trimmed imprinted resist and chemical contrast pattern to guide a directed self-assembly (DSA) of a predetermined lamellar block copolymer (BCP), creating chromium (Cr) lamellar guiding lines using the BCP and DSA in a dry Cr lift-off process and etching the Cr lamellar guiding line patterns into a substrate to fabricate the imprint template.

Imprint pattern guided self-assembly of lamellar block copolymer for BPM

The embodiments disclose a method of using a trimmed imprinted resist and chemical contrast pattern to guide a directed self-assembly (DSA) of a predetermined lamellar block copolymer (BCP), creating chromium (Cr) lamellar guiding lines using the BCP and DSA in a dry Cr lift-off process and etching the Cr lamellar guiding line patterns into a substrate to fabricate the imprint template.

Systems and methods for locally reducing oxides

In the systems and methods for synthesizing a thin film with desired properties (e.g. magnetic, conductivity, photocatalyst, etc.), a metal oxide film may be deposited on a substrate. The metal oxide film may be achieved utilizing any suitable method. A reducing agent may be deposited before, after or both before and after the metal oxide layer. Oxygen may be removed or liberated from the deposited metal oxide film by low temperature local or global annealing. As a result of the annealing to remove oxygen, one or more portions of the metal oxide may be transformed into materials with desired properties. As a nonlimiting example, a metal oxide film may be treated to provide a magnetic multilayer film that is suitable for bit patterned media.

Systems and methods for locally reducing oxides

In the systems and methods for synthesizing a thin film with desired properties (e.g. magnetic, conductivity, photocatalyst, etc.), a metal oxide film may be deposited on a substrate. The metal oxide film may be achieved utilizing any suitable method. A reducing agent may be deposited before, after or both before and after the metal oxide layer. Oxygen may be removed or liberated from the deposited metal oxide film by low temperature local or global annealing. As a result of the annealing to remove oxygen, one or more portions of the metal oxide may be transformed into materials with desired properties. As a nonlimiting example, a metal oxide film may be treated to provide a magnetic multilayer film that is suitable for bit patterned media.

Method of patterning a stack

The embodiments disclose a method of fabricating a stack, including replacing a metal layer of a stack imprint structure with an oxide layer, patterning the oxide layer stack using chemical etch processes to transfer the pattern image and cleaning etch residue from the stack imprint structure to substantially prevent contamination of the metal layers.

Method of patterning a stack

The embodiments disclose a method of fabricating a stack, including replacing a metal layer of a stack imprint structure with an oxide layer, patterning the oxide layer stack using chemical etch processes to transfer the pattern image and cleaning etch residue from the stack imprint structure to substantially prevent contamination of the metal layers.

Planarization methodology for topographically challenged media surface
09761262 · 2017-09-12 · ·

The present invention relates to a device for magnetic recording that includes a storage medium having a media surface. The media surface has a plurality of lands and recesses between the lands. A polymer layer fills the recesses so that the media surface is substantially planar.

Planarization methodology for topographically challenged media surface
09761262 · 2017-09-12 · ·

The present invention relates to a device for magnetic recording that includes a storage medium having a media surface. The media surface has a plurality of lands and recesses between the lands. A polymer layer fills the recesses so that the media surface is substantially planar.

METHODS OF MANUFACTURING AT LEAST A PORTION OF A MAGNETIC LAYER OF A MAGNETIC RECORDING DISK, AND RELATED MAGNETIC RECORDING DISKS

The present disclosure relates to methods of manufacturing at least a portion of a magnetic layer of a magnetic recording disk. The methods include forming a plurality of sacrificial, discrete structures via imprint lithography. The sacrificial, discrete structures are used to form a plurality of three-dimensional segregant structures in a magnetic layer of the magnetic recording disk. The present disclosure also relates to corresponding magnetic recording disks.

A MAGNETIC LAYER OF A MAGNETIC RECORDING DISK, AND RELATED MAGNETIC RECORDING DISKS

The present disclosure relates to magnetic recording disks having a magnetic recording layer that includes a plurality of three-dimensional segregant structures. Each three-dimensional segregant structure extends from a first radius of the recording disk to a second radius of the recording disk, and each three-dimensional segregant structure is made of a first segregant material. The magnetic recording layer also includes a plurality of magnetic grains between adjacent three-dimensional segregant structures, and a second segregant material between adjacent magnetic grains. The present disclosure also relates to corresponding methods of manufacturing such a magnetic recording layer.