A memory device includes first to nth decks respectively coupled to first to nth row lines which are stacked over a substrate in a vertical direction perpendicular to a surface of the substrate, n being a positive integer, a first connection structure extending from the substrate in the vertical direction to be coupled to the first row line, even-numbered connection structures extending from the substrate in the vertical direction and respectively coupled to ends of even-numbered row lines among the second to nth row lines, and odd-numbered connection structures extending from the substrate in the vertical direction and respectively coupled to ends of odd-numbered row lines among the second to nth row lines. The even-numbered connection structures are spaced apart from the odd-numbered connection structures with the first row line and the first connection structure that are interposed between the even-numbered connection structures and the odd-numbered connection structures.

A non-volatile memory includes a first semiconductor layer vertically stacked on a second semiconductor layer and including a first memory group, a second memory group, a third memory group and a fourth memory group. The second semiconductor layer includes a first region, a second region, a third region and a fourth region respectively underlying the first memory group, second memory group, third memory group and fourth memory group. The first region includes one driving circuit connected to memory cells of one of the second memory group, third memory group and fourth memory group through a first word line, and another driving circuit connected to memory cells of the first memory group through a first bit line, wherein the first word line and first bit line extend in the same horizontal direction.

An electronic device may include a semiconductor memory structured to include a plurality of memory cells, wherein each of the plurality of memory cells may comprise: a first electrode layer; a second electrode layer; and a selection element layer disposed between the first electrode layer and the second electrode layer to electrically couple or decouple an electrical connection between the first electrode layer and the second electrode layer based on a magnitude of an applied voltage or an applied current with respect to a threshold magnitude, wherein the selection element layer has a dopant concentration profile which decreases from an interface between the selection element layer and the first electrode layer toward an interface between the selection element layer and the second electrode layer.

Methods, systems, and devices related to counter-based sense amplifier method for memory cells are described. The counter-based read algorithm may comprise the following phases: storing in a counter associated to an array of memory cells the value of the number of bits having a predetermined logic value of the data bits stored in the memory array; reading from said counter the value corresponding to the number of bits having the predetermined logic value; reading the data stored in the array of memory cells by applying a ramp of biasing voltages; counting the number of bits having the predetermined logic value during the data reading phase; stopping the data reading phase when the number of bits having the predetermined logic value is equal to the value stored in said counter.

A semiconductor memory device including a device isolation layer in a substrate to define first and second active portions, a first contact on the substrate, first and second memory cells spaced apart from the first contact in a first direction by first and second distances, respectively, first and second conductive lines connected to the first and second memory cells, respectively, and extending in a second direction, and first and second selection transistors respectively connected to the first and second conductive lines. A length of a bottom surface of a first gate electrode of the first selection transistor overlapping the first active portion in a third direction may be different from a length of a bottom surface of a second gate electrode of the second selection transistor overlapping the second active portion in the third direction.

A memory cell includes a first resistive memory element, a second resistive memory element electrically coupled with the first resistive memory element at a common node, and a switching element comprising an input terminal electrically coupled with the common node, the switching element comprising a driver configured to float during one or more operations.

A memory device includes a plurality of memory cells, each including a switching device and an information storage device connected to the switching device and having a phase change material, the plurality of memory cells connected to a plurality of word lines and a plurality of bit lines, a decoder circuit determining at least one of the plurality of memory cells to be a selected memory cell, and a program circuit configured to input a programming current to the selected memory cell to perform a programming operation and configured to detect a resistance of the selected memory cell to adjust a magnitude of the programming current.

A method of sensing a resistance change memory device includes preparing a memory cell including a variable resistance element storing different data on the basis of a variable resistance, and a switching element connected to the variable resistance element and performing a threshold switching operation, measuring a first cell current by applying a first read voltage to the memory cell, the first read voltage being selected in a threshold-sensing range of a current-voltage characteristic curve of the memory cell, measuring a second cell current by applying a second read voltage to the memory cell, the second read voltage being selected in a resistance-sensing range of the current-voltage characteristic curve, and when at least one of the first cell current and the second cell current is greater than a corresponding reference current, outputting a data signal having a first logic value as data stored in the memory cell.

An integrated circuit which enables lower cost yet provides superior performance compared to standard silicon integrated circuits by utilizing thin film transistors (TFTs) fabricated in BEOL. Improved memory circuits are enabled by utilizing TFTs to improve density and access in a three dimensional circuit design which minimizes die area. Improved I/O is enabled by eliminating the area on the surface of the semiconductor dedicated to I/O and allowing many times the number of I/O available. Improved speed and lower power are also enabled by the shortened metal routing lines and reducing leakage.

A phase change memory (PCM) cell comprises a first electrode comprised of a first electrically conductive material, a second electrode comprised of a second electrically conductive material, a first phase change layer positioned between the first electrode and the second electrode and being comprised of a first phase change material, and a second phase change layer positioned between the first electrode and the second electrode and being comprised of a second phase change material. The first phase change material has a first resistivity, the second phase change material has a second resistivity, and wherein the first resistivity is at least two times the second resistivity.