A memory cell includes a single bi-directional resistive memory element (BRME) having a first terminal directly connected to a first power rail and a second terminal coupled to an internal node; and a first transistor having a control electrode coupled to the internal node, and a first current electrode coupled to a first bitline, and a second current electrode coupled to one of a group consisting of: a read wordline and the first power rail.

A memory device includes a first line coupled to a first terminal of a first memory cell, a second bit line coupled to a first terminal of a second memory cell, a sense amplifier coupled to a second end of the first bit line and a second end of the second bit line, a capacitor including a first terminal coupled to a first input of the sense amplifier and a second terminal coupled to a switch. The switch couples the second terminal of the capacitor to the second bit line during a calibration phase of a read operation and to the first bit line during a sense phase of the read operation. A current/voltage source drives current on the first bit line while the second line is floating during the calibration phase, and drives current on the second bit line while the first bit line is floating during the sense phase.

An example device in accordance with an aspect of the present disclosure includes a plurality of bit-cells coupled as an array. A bit-cell includes a first switch element, a second switch element, and a memory element coupled at a node. The plurality of bit-cells are coupled as the array based on a first bit-cell's memory element being coupled to a second bit-cell's node.

A circuit comprising an input, a ground, a first switch, a second switch and a bi-polar memristor, wherein the first switch is a first transistor and a gate of the first transistor is connected to a line to instruct setting of the bi-polar memristor, and the second switch is a second transistor and a gate of the second transistor is connected to a line to instruct re-setting of the bi-polar memristor.

A semiconductor device with a large storage capacity per unit area is provided.

A semiconductor device includes a memory cell. The memory cell includes a first conductor; a first insulator over the first conductor; a first oxide over the first insulator and including a first region, a second region, and a third region positioned between the first region and the second region; a second insulator over the first oxide; a second conductor over the second insulator; a third insulator positioned in contact with a side surface of the first region; and a second oxide positioned on the side surface of the first region, with the third insulator therebetween. The first region includes a region overlapping the first conductor. The third region includes a region overlapped by the second conductor. The first region and the second region have a lower resistance than the third region.

A memory device includes a memory array having a plurality of memory cells. Each memory cell of the plurality of memory cells is connected to a word line to apply a first signal to select the memory cell to read data from or write the data to the memory cell and a bit line to read the data from the memory cell or provide the data to write to the memory cell upon selecting the memory cell by the word line. A first bit line portion of the bit line connected to a first memory cell of the plurality of memory cells abuts a second bit line portion of the bit line connected to a second memory cell of the plurality of memory cells. The first memory cell is adjacent to the second memory cell.

A memory device includes a memory array having a plurality of memory cells. Each of the plurality of memory cells includes a first word line to apply a first signal to select the each of the plurality of memory cells to read data from or write the data to the each of the plurality of memory cells, a second word line to apply a second signal to select the each of the plurality of memory cells to read the data from or write the data to the each of the plurality of memory cells, and a bit line to read the data from the each of the plurality of memory cells or provide the data to write to the each of the plurality of memory cells upon selecting the each of the plurality of memory cells by at least one of the first word line or the second word line.

In the present disclosure, a non-volatile memory cell comprises a data storage unit, a selection unit and a switching unit. The data storage unit is configured to store an information bit and has a first end and a second end. The first end is coupled to a bit line. The selection unit is configured to access the data storage unit, and the selection unit has a first end coupled to a select line, a second end coupled to the second end of the data storage unit, and a third end coupled to a source line. The switching unit is configured to perform a formation operation and has a first end coupled to a forming line and a second end coupled to the second end of the data storage unit.

A resistive memory structure, for example, phase change memory structure, includes one access device and two or more resistive memory cells. Each memory cell is coupled to a rectifying device to prevent parallel leak current from flowing through non-selected memory cells. In an array of resistive memory bit structures, resistive memory cells from different memory bit structures are stacked and share rectifying devices.

In an example, a memristor apparatus with variable transmission delay may include a first memristor programmable to have one of a plurality of distinct resistance levels, a second memristor, a transistor connected between the first memristor and the second memristor, and a capacitor having a capacitance, in which the capacitor is connected between the first memristor and the transistor. In addition, application of a reading voltage across the second memristor is delayed by a time period equivalent to the programmed resistance level of the first memristor and the capacitance of the capacitor.