Patent classifications
G11C2213/75
SEMICONDUCTOR STORAGE DEVICE, AND STORAGE DEVICE USING SAME
In a semiconductor recording device, a writing time as long as in the case where the number of bits to be subjected to ‘0’ writing is large even in the case where the number of bits to be subjected to ‘0’ writing in page writing is small. A population counter that controls the number of ‘0’ bits is provided. In addition, a writing driver is divided into a plurality of sub-writing drivers. In this configuration, as many sub-writing drivers as possible are driven as long as the number of ‘0’ writing bits is equal to or smaller than the maximum number of bits that can be simultaneously written.
3D MEMORY DEVICE and STRUCTURE
A semiconductor device including: a first memory cell including a first transistor; and a second memory cell including a second transistor, where the second transistor overlays the first transistor and the second transistor is self-aligned to the first transistor, where access to the first memory cell is controlled by at least one junction-less transistor, and where the junction-less transistor is not part of the first memory cell and the second memory cell.
Two-terminal memory compatibility with NAND flash memory set features type mechanisms
Operating characteristics associated with NAND flash memory can be modified and/or emulated to support corresponding operating characteristics for two-terminal memory. As a result, NAND flash memory modules included in conventional NAND flash memory devices (e.g., memory cards, solid-state drives, etc.) can be replaced with two-terminal memory without substantial changes to manufacturing infrastructure associated with the manufacture of these NAND flash memory devices.
MEMRISTOR APPARATUS WITH VARIABLE TRANSMISSION DELAY
In an example, a memristor apparatus with variable transmission delay may include a first memristor programmable to have one of a plurality of distinct resistance levels, a second memristor, a transistor connected between the first memristor and the second memristor, and a capacitor having a capacitance, in which the capacitor is connected between the first memristor and the transistor. In addition, application of a reading voltage across the second memristor is delayed by a time period equivalent to the programmed resistance level of the first memristor and the capacitance of the capacitor.
Semiconductor devices including auxiliary bit lines
Semiconductor devices are provided. A semiconductor device includes a stack of alternating gates and insulating layers. The semiconductor device includes a dummy cell region. The semiconductor device includes a plurality of bit lines and a plurality of auxiliary bit lines. Some of the plurality of auxiliary bit lines have different respective lengths. Related methods of forming semiconductor devices are also provided.
Non-volatile composite nanoscopic fabric NAND memory arrays and methods of making same
A non-volatile nanotube switch and memory arrays constructed from these switches are disclosed. A non-volatile nanotube switch includes a conductive terminal and a nanoscopic element stack having a plurality of nanoscopic elements arranged in direct electrical contact, a first comprising a nanotube fabric and a second comprising a carbon material, a portion of the nanoscopic element stack in electrical contact with the conductive terminal. Control circuitry is provided in electrical communication with and for applying electrical stimulus to the conductive terminal and to at least a portion of the nanoscopic element stack. At least one of the nanoscopic elements is capable of switching among a plurality of electronic states in response to a corresponding electrical stimuli applied by the control circuitry to the conductive terminal and the portion of the nanoscopic element stack. For each electronic state, the nanoscopic element stack provides an electrical pathway of corresponding resistance.
MEMORY DEVICE AND METHOD OF MANUFACTURING MEMORY DEVICE
A memory device includes: a first interconnect; a second interconnect; a first string and a second string whose first ends are coupled to the first interconnect; a third string and a fourth string whose second ends are coupled to the second interconnect; a third interconnect; and driver. The third interconnect is coupled to second ends of the first and second strings and to first ends of the third and fourth strings. Each of the first, second, third, and fourth strings includes a first switch element and a memory cell coupled in series. The memory cell includes a second switch element and a resistance change element coupled in parallel. The third interconnect is coupled to the driver via the first interconnect or the second interconnect.
Semiconductor storage device
During a writing operation to change a resistance of a part of a variable resistance material film facing a first word line, the semiconductor storage device applies a first voltage to the first word line, applies a second voltage to a second word line, and applies a third voltage to a third word line. The first, second, and third word lines are stacked above a substrate. The second word line is adjacent to the first word line in the stacking direction. The third word line is not adjacent to the first word line in the stacking direction.
MEMORY DEVICES INCLUDING HEATERS
Memory devices might include an array of memory cells, a plurality of access lines, and a heater. The array of memory cells might include a plurality of strings of series-connected memory cells. Each access line of the plurality of access lines might be connected to a control gate of a respective memory cell of each string of series-connected memory cells of the plurality of strings of series-connected memory cells. The heater might be adjacent to an end of each access line of the plurality of access lines.
Capacitive pillar architecture for a memory array
Methods, systems, and devices for a capacitive pillar architecture for a memory array are described. An access line within a memory array may be, include, or be coupled with a pillar. The pillar may include an exterior electrode, such as a hollow exterior electrode, surrounding an inner dielectric material that may further surround an interior, core electrode. The interior electrode may be maintained at a voltage level during at least a portion of an access operation for a memory cell coupled with the pillar. Such a pillar structure may increase a capacitance of the pillar, for example, based on a capacitive coupling between the interior and exterior electrodes. The increased capacitance may provide benefits associated with operating the memory array, such as increased memory cell programming speed, programming reliability, and read disturb immunity.