Methods, systems, and devices for techniques for parallel memory cell access are described. A memory device may include multiple tiers of memory cells. During a first duration, a first voltage may be applied to a set of word lines coupled with a tier of memory cells to threshold one or more memory cells included in a first subset of memory cells of the tier. During a second duration, a second voltage may be applied to the set of word lines to write a first logic state to the one or more memory cells of the first subset and to threshold one or more memory cells included in a second subset of memory cells of the tier. During a third duration, a third voltage may be applied to the set of word lines to write a second logic state to the one or more memory cells of the second subset.

Methods, systems, and devices for a capacitive pillar architecture for a memory array are described. An access line within a memory array may be, include, or be coupled with a pillar. The pillar may include an exterior electrode, such as a hollow exterior electrode, surrounding an inner dielectric material that may further surround an interior, core electrode. The interior electrode may be maintained at a voltage level during at least a portion of an access operation for a memory cell coupled with the pillar. Such a pillar structure may increase a capacitance of the pillar, for example, based on a capacitive coupling between the interior and exterior electrodes. The increased capacitance may provide benefits associated with operating the memory array, such as increased memory cell programming speed, programming reliability, and read disturb immunity.

A memory cell includes a first resistive memory element, a second resistive memory element electrically coupled with the first resistive memory element at a common node, and a switching element comprising an input terminal electrically coupled with the common node, the switching element comprising a driver configured to float during one or more operations.

A semiconductor resistive random-access memory (ReRAM) device of an array including at least one ReRAM cell is provided. The ReRAM cell includes a word line; a select line; a first bit line; a second bit line having a polarity opposite of that of the first bit line; a first resistor having a first terminal and a second terminal, wherein the second terminal of the first resistor is connected to the first bit line; a second resistor having a first terminal and a second terminal, the second terminal of the second resistor is connected to the second bit line; and a transistor having a gate terminal, a source terminal and a drain terminal; the word line is connected to the gate terminal, the select line connected to the source terminal, and the drain terminal connected to the first terminal of the first resistor and the first terminal of the second resistor.

The disclosure provides a resistance variable memory that can realize high integration. The resistance variable memory of the disclosure includes a plurality of transistors formed on a surface of a substrate, and a plurality of variable resistance elements stacked on the surface of the substrate in a vertical direction. One electrode of each of the variable resistance elements is commonly electrically connected to one electrode of one transistor, and another electrode of each of the variable resistance elements is respectively electrically connected to a bit line, and another electrode of each of the transistors is electrically connected to a source line, and each gate of transistors in a row direction is commonly connected to a word line.

A memory device includes transistors and a memory cell array disposed over and electrically coupled to the transistors. The memory cell array includes word lines, bit line columns, and data storage layers interposed between the word lines and the bit line columns. A first portion of the word lines on odd-numbered tiers of the memory cell array is oriented in a first direction, and a second portion of the word lines on even-numbered tiers of the memory cell array is oriented in a second direction that is angularly offset from the first direction. The bit line columns pass through the odd-numbered tiers and the even-numbered tiers, and each of the bit line columns is encircled by one of the data storage layers. A semiconductor die and a manufacturing method of a semiconductor structure are also provided.

According to an embodiment, a memory device includes a first conductive layer extending in a first direction, a second conductive layer extending in the first direction, a third conductive layer extending in a second direction intersecting with the first direction, an insulating layer provided between the first conductive layer and the second conductive layer, and a dielectric layer provided between the first conductive layer and the third conductive layer, and between the insulating layer and the third conductive layer, the dielectric layer having a first thickness thinner than a second thickness, the first thickness being a thickness between the first conductive layer and the third conductive layer, the second thickness being a thickness between the insulating layer and the third conductive layer, and the dielectric layer including an oxide including at least one of hafnium oxide and zirconium oxide.

A semiconductor device of the present disclosure includes: a first gate electrode that includes a first main line section and one or a plurality of first sub line sections, in which the first main line section extends in a first direction in a first active region of a semiconductor substrate, and segments the first active region into a first region and a second region, and the one or the plurality of first sub line sections extends from the first main line section in a second direction intersecting the first direction in the first region, and segments the first region into a plurality of sub regions including a first sub region and a second sub region; a first memory element that includes a first terminal, and a second terminal coupled to the first sub region of the semiconductor substrate, and is configured to be set in a first resistive state or a second resistive state; and a second memory element that includes a first terminal, and a second terminal coupled to the second sub region of the semiconductor substrate, and is configured to be set in the first resistive state or the second resistive state.

A high efficiency embedded-artificial synaptic element includes a semiconductor substrate, a select transistor, a metal layer, a first memory transistor and a second memory transistor. The select transistor is disposed on the semiconductor substrate and includes a select gate structure, a drain region and a source region. The metal layer is connected to the drain region. The first memory transistor includes a first gate structure, a first electrode region and a first memristor. The second memory transistor includes a second gate structure, a second electrode region and a second memristor. The second electrode region and the first electrode region are connected to each other and form a connection region, which is connected to the metal layer. The first memristor is formed between the first gate structure and the connection region, and the second memristor is formed between the second gate structure and the connection region.

A semiconductor memory includes first variable resistance layers and insulating layers alternately stacked; conductive pillars passing through the first variable resistance layers and the insulating layers; a slit insulating layer vertically passing through the insulating layers, extending in a first direction, and being disposed in a second direction of the insulating layers, the second direction intersecting with the first direction; conductive layers disposed between the slit insulating layer and the first variable resistance layers; and electrode layers disposed between the conductive layers and the first variable resistance layers. The first variable resistance layers remain in an amorphous state during a program operation.