Patent classifications
G01B9/02085
Frequency-domain interferometric based imaging systems and methods
Systems and methods for improved interferometric imaging are presented. One embodiment is a partial field frequency-domain interferometric imaging system in which a light beam is scanned in two directions across a sample and the light scattered from the object is collected using a spatially resolved detector. The light beam could illuminate a spot, a line or a two-dimensional area on the sample. Additional embodiments with applicability to partial field as well as other types of interferometric systems are also presented.
Method and system for quantitatively evaluating surface roughness of organic pore of kerogen in shale
The present invention relates to a method and system for quantitatively evaluating surface roughness of an organic pore of kerogen in shale. The method includes: making a shale sample; applying a circle of silver-painted conductive tape on the edge of the shale sample to obtain a processed sample; conducting image scanning on the processed sample to obtain a scanned image; determining a kerogen area according to the scanned image; determining an organic pore area according to the kerogen area; carrying out gridding treatment on the organic pore area to obtain multiple grid cells; adopting double integral calculation on each of the grid cells to obtain the areas of the multiple grid cells; summing each of the areas to obtain the surface area of the organic pore; and evaluating surface roughness of the organic pore according to the surface area of the pore.
FREQUENCY-DOMAIN INTERFEROMETRIC BASED IMAGING SYSTEMS AND METHODS
Systems and methods for improved interferometric imaging are presented. One embodiment is a partial field frequency-domain interferometric imaging system in which a light beam is scanned in two directions across a sample and the light scattered from the object is collected using a spatially resolved detector. The light beam could illuminate a spot, a line or a two-dimensional area on the sample. Additional embodiments with applicability to partial field as well as other types of interferometric systems are also presented.
Test device and method for testing a mirror
A test appliance and a method for testing a mirror, e.g., a mirror of a microlithographic projection exposure apparatus. The test appliance has a computer-generated hologram (CGH), and a test can be carried out on at least a portion of the mirror by way of an interferometric superposition of a test wave that is directed onto the mirror by this computer-generated hologram and a reference wave. Here, the computer-generated hologram (CGH) (120, 320) is designed in such a way that, during operation of the appliance, it provides a first test wave for testing a first portion of the mirror (101, 301) by interferometric superposition with a reference wave in a first position of the mirror (101, 301) and at least a second test wave for testing a second portion of the mirror (101, 301) by interferometric superposition with a reference wave in a second position of the mirror (101, 301).
METHOD FOR MEASURING A SPHERICAL-ASTIGMATIC OPTICAL SURFACE
Method for measuring a spherical-astigmatic optical surface (40), includes: a) generating a spherical-astigmatic wavefront as a test wavefront with a wavefront generating apparatus (10); b) interferometrically measuring wavefront aberrations between the wavefront generating apparatus and the surface which is adjusted to the wavefront generating apparatus such that the test wavefront impinges each point on the surface substantially perpendicularly, plural measurements being taken in which the surface is measured at a number of positions, spherized about the two centers of the radii of the astigmatism and/or rotated by 180 about a surface normal to the surface, such that corresponding interferogram phases are determined; and c) determining the wavefront of the wavefront generation device and a shape of the surface using a mathematical reconstruction method. The spherical-astigmatic surface is then corrected using a suitable processing method, a) to c) being repeated until the wavefront aberrations are smaller than a given value.
MEASUREMENT APPARATUS
A measurement apparatus includes a filter changing a light amount of an irradiation light, a lens irradiating a surface of a material with the irradiation light, a stage changing a focus position of the irradiation light in a depth direction of the material, an interfering light extractor causing the irradiation light to interfere with reflected light from the material, a detector detecting an intensity of interfering light obtained by interference between the irradiation light and the reflected light, and a controller calculating a height of the surface of the material based on the detected intensity of interfering light while changing a relative focus position of the irradiation light with respect to the material at a given measurement point of the surface of the material. The controller controls the filter or light source based on the detected intensity of interfering light to change the light amount of the irradiation light.
SYSTEM AND METHOD FOR A DISPLACEMENT MEASUREMENT
System and method for profiling of a surface with lateral scanning interferometer the optical axis of which is perpendicular to the surface. In-plane scanning of the surface is carried out with increments that correspond to integer number of pixels of an employed optical detector. Determination of height profile of a region-of-interest that is incomparably larger than a FOV of the interferometer objective is performed in time reduced by at least an order of magnitude as compared to time required for the same determination by a vertical scanning interferometer.
METHOD AND SYSTEM FOR MEASURING A HEIGHT MAP OF A SURFACE OF AN OBJECT, AND COMPUTER PROGRAM THEREFOR
In a method and system for measuring a height map of a surface of an object, the following steps are carried out. Height maps of different sections of the surface of the object are measured, using an optical profilometer having a field of view covering an individual section, wherein each height map comprises height data. The measured height maps are grouped into different sets of height maps, wherein within each set each one of the height maps of the set has a valid overlap to at least one other height map of the set, and wherein each height map belongs to one set and does not have a valid overlap with any height map of another set. Within each set, the measured height maps are stitched to a sub-composite stitched height map. The sub-composite stitched height maps are combined to a composite height map.
Method for calculating a height map of a body of transparent material having an inclined or curved surface
Provided is a method for calculating a height map of a sample comprising a body of a transparent material having a refractive index with an inclined or curved surface, the body being provided on an underlying surface extending laterally from underneath the body. The method may include positioning a first area of a body of a transparent material with an inclined or curved surface and a second area of the underlying surface extending laterally from underneath the body under an optical profiler, measuring a height map of the first area and the second area with the optical profiler; and calculating a height map of the inclined or curved surface by using the refractive index, the measured height map of the first area and the second area.
System and method for a displacement measurement
System and method for profiling of a surface with lateral scanning interferometer the optical axis of which is perpendicular to the surface. In-plane scanning of the surface is carried out with increments that correspond to integer number of pixels of an employed optical detector. Determination of height profile of a region-of-interest that is incomparably larger than a FOV of the interferometer objective is performed in time reduced by at least an order of magnitude as compared to time required for the same determination by a vertical scanning interferometer.