Patent classifications
G01B11/272
Recipe selection based on inter-recipe consistency
A method including: determining recipe consistencies between one substrate measurement recipe of a plurality of substrate measurement recipes and each other substrate measurement recipe of the plurality of substrate measurement recipes; calculating a function of the recipe consistencies; eliminating the one substrate measurement recipe from the plurality of substrate measurement recipes if the function meets a criterion; and reiterating the determining, calculating and eliminating until a termination condition is met. Also disclosed herein is a substrate measurement apparatus, including a storage configured to store a plurality of substrate measurement recipes, and a processor configured to select one or more substrate measurement recipes from the plurality of substrate measurement recipes based on recipe consistencies among the plurality of substrate measurement recipes.
METHOD AND DEVICE FOR ALIGNING SUBSTRATES
A device and a method for aligning substrates. The method includes the steps of detecting alignment marks and aligning substrates with respect to one another in dependence on the detection of the alignment marks. At least two alignment marks are arranged parallel to a direction of a linear movement of the substrates, wherein the alignment of the substrates takes place along a single alignment axis, the alignment axis running parallel to the loading and unloading direction of the substrates.
ACTIVE ALIGNMENT FOR ASSEMBLING OPTICAL DEVICES
Aspects for active alignment for assembling optical imaging systems are described herein. As an example, the aspects may include aligning an optical detector with an optical component. The optical component is configured to alter a direction of one or more light beams emitted from an image displayed by an optical engine. The aspects may further include detecting, by the optical detector, a virtual image generated by the one or more light beams emitted by the optical engine; and adjusting, by a multi-axis controller, an optical path of the one or more light beams based on one or more parameters of the virtual image collected by the optical detector.
LITHOGRAPHIC APPARATUS, MULTI-WAVELENGTH PHASE-MODULATED SCANNING METROLOGY SYSTEM AND METHOD
A metrology system includes a radiation source, first, second, and third optical systems, and a processor. The first optical system splits the radiation into first and second beams of radiation and impart one or more phase differences between the first and second beams. The second optical system directs the first and second beams toward a target structure to produce first and second scattered beams of radiation. The third optical system interferes the first and second scattered beams at an imaging detector. The imaging detector generates a detection signal based on the interfered first and second scattered beams. The metrology system modulates one or more phase differences of the first and second scattered beams based on the imparted one or more phase differences. The processor analyzes the detection signal to determine a property of the target structure based on at least the modulated one or more phase differences.
Dynamic amelioration of misregistration measurement
A dynamic misregistration measurement amelioration method including taking at least one misregistration measurement at multiple sites on a first semiconductor device wafer, which is selected from a batch of semiconductor device wafers intended to be identical, analyzing each of the misregistration measurements, using data from the analysis of each of the misregistration measurements to determine ameliorated misregistration measurement parameters at each one of the multiple sites, thereafter ameliorating misregistration metrology tool setup for ameliorated misregistration measurement at the each one of the multiple sites, thereby generating an ameliorated misregistration metrology tool setup and thereafter measuring misregistration at multiple sites on a second semiconductor device wafer, which is selected from the batch of semiconductor device wafers intended to be identical, using the ameliorated misregistration metrology tool setup.
Vehicle wheel alignment measurement system camera and ADAS calibration support structure
A support structure having a vertical element supporting a set of cameras associated with a vehicle measurement or inspection system together with at least one target structure required for realignment or recalibration of onboard vehicle safety system sensors. A camera crossbeam carried by the support structure locates the set of cameras as required to view a vehicle undergoing measurement or inspection. The target structure is affixed to the vertical element of the support structure, at an elevation suitable for observation by at least one vehicle onboard sensors during a realignment or recalibration procedure. A set of rollers facilitates positioning of the target structure on a supporting floor surface during a realignment or recalibration procedure.
Alignment of rotational shafts
For alignment of rotational shafts, two devices for attachment to circular faces of two shaft segments. Each of the two devices has a laser photoelectric device for ascertaining a dimension of displacement of the two shafts from a desired axis of rotation relative to each other. Each of the two devices having a base surface with two linear contact edges designed to engage with a circumferential surface of a shaft and to ensure alignment between the device and an axis of rotation of the shaft to within a tolerance compatible with alignment tolerances of the shaft. Each of the two linear contact edges includes at least two terminal end regions and a center region together defining a line contact at linear intersection of two surfaces meeting at a non-zero angle linear contact edges designed to affix and release from the shaft surface, and to ensure parallel alignment between the device and an axis of rotation of the shaft to a precision allowing measurements to within tolerances required by machinery driven by the shaft. The base surface of at least one of the devices has been modified from its commercially-delivered condition to provide raised rails designed to improve tactile feedback of to a user of the alignment between the base and an axis of rotation of the shaft, and has affixed thereto two rails designed to improve tactile feedback of to a user of the alignment between the base and an axis of rotation of the shaft. Each base has a magnet and a switch to vary magnetic flux for affixation and release from the shaft surface. Each device has brackets designed to securely and reproducibly position laser photoelectric devices relative to the base and axis of rotation of the shaft. The attaching includes a human placing at least one of the devices slightly askew relative to the axis of rotation of the shaft, and the human gently twisting the device to allow the liner contact edges to seat on the circumferential surface of the shaft, to provide tactile feedback to the human to confirm parallel alignment between the at least one device's laser photoelectronic device and the axis of rotation of the shaft.
Vehicles With Automatic Headlight Alignment
A vehicle may have lights such as headlights. The lights may be moved using a positioner. Control circuitry in the vehicle may use sensor circuitry to monitor the environment surrounding the vehicle. The sensor circuitry may include one or more sensors such as a lidar sensor, radar sensor, image sensor, and/or other sensors to measure the shape of a surface in front of the vehicle and the location of the surface relative to the vehicle. These sensors and/or other sensors in the sensor circuitry also measure headlight illumination on the surface. Based on the known shape of the surface in front of the vehicle and the distance of the surface from the vehicle, the control circuitry can predict where a headlight should be aimed on the surface. By comparing predictions of headlight illumination on the surface to measurements of headlight illumination on the surface, the vehicle can determine how to move the headlight with the positioner to align the headlight.
METHOD AND APPARATUS FOR DETERMINING A POSITION OF A RING WITHIN A PROCESS KIT
Examples disclosed herein are directed to a method and apparatus for determining a position of a ring within a process kit. In one example, a sensor assembly for a substrate processing chamber is provided. The sensor assembly includes a housing having a top surface, a bottom surface opposite the top surface, and a plurality of sidewalls connecting the top surface to the bottom surface. The housing also has a recess in the top surface, the recess forming an interior volume within the housing. The sensory assembly includes a bias member, and a contact member disposed on the bias member. The bias member and contact member are disposed within the recess. A sensor is configured to detect a displacement of the contact member. The displacement of the contact member corresponds to a relative position of an edge ring.
Parallel scatterometry overlay metrology
An overlay metrology tool may include an illumination source to generate a first illumination beam distribution with a first linear polarization and a second illumination beam distribution with a second linear polarization orthogonal to the first linear polarization, an illumination sub-system to sequentially illuminate two or more cell pairs of an overlay target on a sample having orthogonally oriented grating-over-grating structures, a collection sub-system with two collection channels to capture collected light from an illuminated cell pair and filtering optics to direct light from different cells in an illuminated cell pair to different collection channels for detection. The tool may further include a controller to generate separate overlay measurements for orthogonally-oriented grating-over-grating structures in the two or more cell pairs.