A fluid flow system may comprise an input line connected to a drilling system, one or more fluid flow lines connected to the input line, and an output line connected to the one or more fluid flow lines. The system may further include one or more valves disposed in each of the one or more fluid flow lines and one or more pressure sensors disposed in each of the one or more fluid flow lines. A method for controlling a fluid flow system may comprise moving a drilling fluid from a borehole into an input line of the fluid flow system, directing the drilling fluid through the input line into a fluid flow line, measuring a first pressure at a first pressure sensor in the fluid flow line, and measuring a second pressure at a second pressure sensor in the fluid flow line.

A fluid flow system may comprise an input line connected to a drilling system, one or more fluid flow lines connected to the input line, and an output line connected to the one or more fluid flow lines. The system may further include one or more valves disposed in each of the one or more fluid flow lines and one or more pressure sensors disposed in each of the one or more fluid flow lines. A method for controlling a fluid flow system may comprise moving a drilling fluid from a borehole into an input line of the fluid flow system, directing the drilling fluid through the input line into a fluid flow line, measuring a first pressure at a first pressure sensor in the fluid flow line, and measuring a second pressure at a second pressure sensor in the fluid flow line.

The abnormality detection method of the flow rate control device 10 is performed in the gas supply system 100 including the flow rate control device 10 having the restriction part 12, the control valve 14, the flow rate control pressure sensor 16 for measuring the upstream pressure P1, and the control circuit 19, the inflow pressure sensor 20 for measuring the supply pressure P0, and the upstream on-off valve 2 provided upstream of the inflow pressure sensor, and includes a step of closing the upstream on-off valve in a state in which the gas flows at the controlled flow rate at the downstream of the restriction part by controlling the opening degree of the control valve based on the output of the flow rate control pressure sensor, a step of measuring the drop in the supply pressure P0 on the upstream side of the control valve after closing the upstream on-off valve while keeping the control valve open, and a step of detecting the presence or absence of abnormality in the flow rate control device based on the measured supply pressure drop.

The abnormality detection method of the flow rate control device 10 is performed in the gas supply system 100 including the flow rate control device 10 having the restriction part 12, the control valve 14, the flow rate control pressure sensor 16 for measuring the upstream pressure P1, and the control circuit 19, the inflow pressure sensor 20 for measuring the supply pressure P0, and the upstream on-off valve 2 provided upstream of the inflow pressure sensor, and includes a step of closing the upstream on-off valve in a state in which the gas flows at the controlled flow rate at the downstream of the restriction part by controlling the opening degree of the control valve based on the output of the flow rate control pressure sensor, a step of measuring the drop in the supply pressure P0 on the upstream side of the control valve after closing the upstream on-off valve while keeping the control valve open, and a step of detecting the presence or absence of abnormality in the flow rate control device based on the measured supply pressure drop.

A fluid control system and associated method for pulse delivery of a fluid includes a shutoff valve and a mass flow controller (MFC) upstream of the shutoff valve. The MFC includes a flow channel, a control valve to control flow of fluid in the flow channel, a flow sensor to measure flow rate in the flow channel, and a controller having a valve input from the shutoff valve indicating opening of the shutoff valve. The controller is configured to respond to the valve input to control flow of fluid through the control valve to initiate and terminate a pulse of fluid from the flow channel to the shutoff valve to control a mass of fluid delivered during the pulse of fluid. The valve input can be a pressure signal, and the MFC can include a pressure sensor to sense the pressure signal.

A fluid control system and associated method for pulse delivery of a fluid includes a shutoff valve and a mass flow controller (MFC) upstream of the shutoff valve. The MFC includes a flow channel, a control valve to control flow of fluid in the flow channel, a flow sensor to measure flow rate in the flow channel, and a controller having a valve input from the shutoff valve indicating opening of the shutoff valve. The controller is configured to respond to the valve input to control flow of fluid through the control valve to initiate and terminate a pulse of fluid from the flow channel to the shutoff valve to control a mass of fluid delivered during the pulse of fluid. The valve input can be a pressure signal, and the MFC can include a pressure sensor to sense the pressure signal.

The present invention relates to a device for a respiration arrangement. The device comprises a conduit having a first opening connectable to an air/gas source such as a resuscitation bag, and a second opening connectable to a face mask, such that a fluid pathway along a longitudinal direction of the conduit is established from the first opening to the second opening. The device further comprises a flow constriction, arranged in the conduit which upon fluid flow through the conduit results in a pressure difference over the flow constriction, the flow constriction at least partly comprising a laminar flow section, wherein the device further comprises at least one pressure connecting port arranged in pressurized communication with fluid between the flow constriction and the first opening, and wherein the pressure connecting port is arranged in the longitudinal direction of the conduit.

An air flow rate measuring device is configured to measure a flow rate of air flowing through a main flow path. The air flow rate measuring device includes a housing, a board, a land portion, and an insulating portion. The housing is provided in the main flow path. The board is provided in the housing. The land portion includes multiple lands via which the board is configured to be mounted with a physical quantity sensor that is configured to detect a physical quantity of air. The insulating portion electrically insulates between the multiple lands against foreign matter or water flowing with the air.

An air flow rate measuring device is configured to measure a flow rate of air flowing through a main flow path. The air flow rate measuring device includes a housing, a board, a land portion, and an insulating portion. The housing is provided in the main flow path. The board is provided in the housing. The land portion includes multiple lands via which the board is configured to be mounted with a physical quantity sensor that is configured to detect a physical quantity of air. The insulating portion electrically insulates between the multiple lands against foreign matter or water flowing with the air.

An electronic device manufacturing system includes: a gas supply; a mass flow controller (MFC) coupled to the gas supply; an inlet coupled to the MFC; an outlet; a control volume serially coupled to the inlet to receive a gas flow; and a flow restrictor serially coupled to the control volume and the outlet. A controller is adapted to allow the gas supply to flow gas through the control volume and the flow restrictor to achieve a stable pressure in the control volume, terminate the gas flow from the gas supply, and measure a rate of pressure decay in the control volume over time. A process chamber is coupled to a flow path, which is coupled to the mass flow controller, the process chamber to receive one or more process chemistries via the mass flow controller.