An ophthalmic laser system uses a non-confocal configuration to determine a laser beam focus position relative to the patient interface (PI) surface. The system includes a light intensity detector with no confocal lens or pinhole between the detector and the objective lens. When the objective focuses the light to a target focus point inside the PI lens at a particular offset from its distal surface, the light signal at the detector peaks. The offset value is determined by fixed system parameters, and can also be empirically determined by directly measuring the PI lens surface by observing the effect of plasma formation at the glass surface. During ophthalmic procedures, the laser focus is first scanned insider the PI lens, and the target focus point location is determined from the peak of the detector signal. The known offset value is then added to obtain the location of the PI lens surface.

A method and a device for measuring light field distribution are provided; including steps of utilizing the optical trap to stably levitating particles, moving the optical trap to bring the particles close to the light field to be measured, and utilizing the photodetector to collect the scattered light signals of the particles at different positions in the three-dimensional space of the light field to be measured, and calculating the light field distribution of the light field to be measured according to the scattered light intensity which is proportional to the light intensity at that position. The device for measuring the optical field distribution includes a laser, an optical trapping path, particles, a photodetector, a control system and an upper computer; the laser emits a laser, passes through the optical trapping path, and emits highly focused captured light B to form an V optical trap to capture particles.

Provided is a position detection sensor. In a first pixel part, as an incident position is closer to a first end of a first pixel pair group in a second direction, an intensity of a first electric signal decreases. In a second pixel part, as the incident position is closer to the first end, an intensity of a second electric signal increases. In a third pixel part, as the incident position is closer to a second end of a second pixel pair group in a first direction, an intensity of a third electric signal decreases. In a fourth pixel part, as the incident position is closer to the second end, an intensity of a fourth electric signal increases. A calculation unit calculates a second position on the basis of the first and second electric signals, and calculates a first position on the basis of the third and fourth electric signals.

Methods and apparatus (100) for profiling a beam of a light emitting semiconductor device. The apparatus comprises a light emitting semiconductor device (102) comprising an active region (108) formed on a substrate (104) and configured to generate light when a suitable electrical current is applied to contacts on an upper surface of the device and a light emitting surface (110) defined by a lower surface of the substrate opposite the contacts. The apparatus further comprises a transmission medium (112) comprising a first surface (114) in contact with at least part of the light emitting surface of the semiconductor device and a diffusion surface (116), opposite the first surface, and configured to diffuse light emitted from the micro-LED and transmitted through the transmission medium.

A system and a method for irradiating an object and potentially for controlling the irradiation or other conditions relating to an effect of the irradiation. A sensor is translated along a longitudinal direction of the radiation emitter and in a space between the radiation emitter and the objects irradiated to arrive at information relating to a parameter relating to the effect of the irradiation, such as the radiation, and derived in the space between the radiation emitter and the objects irradiated. Calibrating the sensor readings and adjusting the radiating emitter output, thereby controlling the irradiation.

A system and a method for irradiating an object and potentially for controlling the irradiation or other conditions relating to an effect of the irradiation. A sensor is translated along a longitudinal direction of the radiation emitter and in a space between the radiation emitter and the objects irradiated to arrive at information relating to a parameter relating to the effect of the irradiation, such as the radiation, and derived in the space between the radiation emitter and the objects irradiated. Calibrating the sensor readings and adjusting the radiating emitter output, thereby controlling the irradiation.

A laser system includes a controller comprising a processor and a non-transitory machine-readable memory, a laser head configured to output a laser beam, a work bed positioned opposite the laser head, and a power meter communicatively coupled to the electronic control unit and integrated within the work bed. The laser system further includes a knife edge plate positioned between the power meter and the laser head, and a machine-readable instruction set stored in the non-transitory machine readable memory that causes the laser system to perform at least the following when executed by the processor: position the laser head at a distance from the power meter, cause the laser head to output the laser beam, translate the laser head across the power meter, receive power signals from the power meter as the laser beam is translated across the power meter, and calculate a spot size based on the power signals.

A laser processing apparatus includes a branching unit configured to branch a laser beam to a first optical path and a second optical path, a condenser configured to condense the branched laser beams on a processing face of a workpiece, an output power measuring unit configured to measure the output power of the laser beam emitted from a laser beam generation unit and having passed through the condenser, and a blocking member positioning mechanism disposed between the condenser and the output power measuring unit and capable of positioning a blocking member between a first laser beam blocking position at which the blocking member blocks only the laser beam of the first optical path from between the branched laser beams and a retracted position at which the blocking member blocks none of the laser beams.

The invention relates to a method and an apparatus for the direct determination of spatial dimensions of a light beam with high precision and short measuring period, which are also suitable for the measuring of laser beams with high power in the range of the beam focus. For this purpose, an apparatus is proposed that includes a beam scanner, at least one light sensor, a movement device for the execution of a relative movement between the light beam and the beam scanner, and a device for the signal recording of a temporally variable signal of the light sensor. The beam scanner comprises at least one scanning body with at least three sampling areas, which extends along sampling lines. The sampling areas are configured for the extraction of linear or strip-shaped light samples from a cross-section of the light beam. Several scanning surfaces are defined by the sampling lines of the sampling areas, each spanned by a movement vector of the relative movement. At least three scanning surfaces have a non-zero distance from one another in the direction of the axis of the light beam. The light sensor is configured for the detection of at least a portion of the sampled light extracted by the sampling areas from the cross-section of the light beam.

Provided is a position detection sensor. In a first pixel part, as an incident position is closer to a first end of a first pixel pair group in a second direction, an intensity of a first electric signal decreases. In a second pixel part, as the incident position is closer to the first end, an intensity of a second electric signal increases. In a third pixel part, as the incident position is closer to a second end of a second pixel pair group in a first direction, an intensity of a third electric signal decreases. In a fourth pixel part, as the incident position is closer to the second end, an intensity of a fourth electric signal increases. A calculation unit calculates a second position on the basis of the first and second electric signals, and calculates a first position on the basis of the third and fourth electric signals.