A light irradiation apparatus that splits white light into light rays of a plurality of wavelengths to apply the light ray includes a white light source, a diffraction grating that splits white light emitted by the white light source into light rays of a plurality of wavelengths, and a light selector that selects a light ray of a specified wavelength from the light rays of the plurality of wavelengths split by the diffraction grating.

A low cost, low power, passive optical methane monitoring system for fixed-position installation at oil and gas production well pads and gathering centers is disclosed. The optical methane monitoring system disclosed can be a scannable field of view Near Infrared (NIR) filter photometer to detect and quantify methane concentration in a two dimensional or a three dimensional grid above and around a facility. A randomized fiber optic bundle is disclosed that can be used to direct the total optical power from a collection lens to two or more isolated optical channels. Band pass filters isolate a desired wavelength range for transmission measurements for the two or more channels. Also disclosed is an absorption algorithm which accounts for variable background spectral intensity as well as correcting for water vapor and overall scattering effects to measure methane concentration for a given field of view.

A reflectometry instrument includes a light source for emitting an illumination beam that illuminates the macula. A portion of the illumination beam is reflected from the macula and forms a detection beam. The detection beam is indicative of macular pigment in the macula. The instrument also includes a first mirror for reflecting the illumination beam toward the macula and for reflecting the detection beam from the macula. The instrument is configured so that the illumination beam and the detection beam remain separated between the macula and the first mirror.

A spectroscopic module includes a support body having a bottom wall portion and a side wall portion surrounding a space on one side of the bottom wall portion, a spectroscopic portion provided on the one side of the bottom wall portion and having a plurality of grating grooves, a photodetector attached to the side wall portion so as to face the spectroscopic portion via the space and having a plurality of photodetection channels, a plurality of first terminals provided on a surface of the support body on a side opposite to the space so as to be disposed along the surface of the support body and electrically connected to the photodetector, and a wiring unit having a plurality of second terminals respectively facing the plurality of first terminals and respectively joined to the plurality of first terminals and a plurality of third terminals respectively and electrically connected to the plurality of second terminals.

Systems and methods disclosed herein provide for detecting gas by: illuminating, with a controllable illuminator system, a scene with light including radiation within the infrared (IR) wavelength range; controlling the illuminator system to emit light at a first wavelength corresponding to a first absorption level of a gas and at a second wavelength corresponding to a second absorption level of a gas, such that an equal amount of radiant energy over a time period is emitted onto the scene for each of said first and second wavelengths; and capturing a first IR image of the scene being illuminated with light at said first wavelength and a second IR image of the scene illuminated with light at said second wavelength, and comparing said first and second IR images to determine whether a characteristic for at least one specific gas is represented in said first and/or second IR images.

Disclosed are embodiments of an improved apparatus and system, and associated methods for optically diagnosing a semiconductor manufacturing process. A hyperspectral imaging system is used to acquire spectrally-resolved images of emissions from the plasma, in a plasma processing system. Acquired hyperspectral images may be used to determine the chemical composition of the plasma and the plasma process endpoint. Alternatively, a hyperspectral imaging system is used to acquire spectrally-resolved images of a substrate before, during, or after processing, to determine properties of the substrate or layers and features formed on the substrate, including whether a process endpoint has been reached; or before or after processing, for inspecting the substrate condition.

An endoscopic imaging system for use in a light deficient environment includes an imaging device having a tube, one or more image sensors, and a lens assembly including at least one optical elements that corresponds to the one or more image sensors. The endoscopic system includes a display for a user to visualize a scene and an image signal processing controller. The endoscopic system includes a light engine having an illumination source generating one or more pulses of electromagnetic radiation and a lumen transmitting one or more pulses of electromagnetic radiation to a distal tip of an endoscope.

Optical spectrometers may be used to determine the spectral components of electromagnetic waves. Spectrometers may be large, bulky devices and may require waves to enter at a nearly direct angle of incidence in order to record a measurement. What is disclosed is an ultra-compact spectrometer with nanophotonic components as light dispersion technology. Nanophotonic components may contain metasurfaces and Bragg filters. Each metasurface may contain light scattering nanostructures that may be randomized to create a large input angle, and the Bragg filter may result in the light dispersion independent of the input angle. The spectrometer may be capable of handling about 200 nm bandwidth. The ultra-compact spectrometer may be able to read image data in the visible (400-600 nm) and to read spectral data in the near-infrared (700-900 nm) wavelength range. The surface area of the spectrometer may be about 1 mm.sup.2, allowing it to fit on mobile devices.

Embodiments of the systems can be configured to receive electromagnetic emissions of a substrate (e.g., a build material of a part being made via additive manufacturing) by a detector (e.g., a multi-spectral sensor) and generate a ratio of the electromagnetic emissions to perform spectral analysis with a reduced dependence on location and orientation of a surface of the substrate relative to the multi-spectral sensor. The additive manufacturing process can involve use of a laser to generate a laser beam for fusion of the build material into the part. The system can be configured to set the multi-spectral sensor off-axis with respect to the laser (e.g., an optical path of the multi-spectral sensor is at an angle that is different than the angle of incidence of the laser beam). This can allow the multi-spectral sensor to collect spectral data simultaneously as the laser is used to build the part.

Provided are a spectral filter, and an image sensor and an electronic device including the spectral filter. The spectral filter includes: a first metal reflective layer; a second metal reflective layer provided above the first metal reflective layer; a plurality of cavities provided between the first and second metal reflective layers, the plurality of cavities including first patterns corresponding to different center wavelengths; and a plurality of lower pattern films provided below the first metal reflective layers, the plurality of lower pattern films including second patterns corresponding to the different center wavelengths.