A sample analysis system including: a droplet device that intermittently introduces a sample to a measurement region set in plasma; a light emission detection device that detects light emission in the measurement region at a detection timing, the detection timing being set at a predetermined cycle in advance; and an analysis device that analyzes the sample based on the detected light emission, the analysis device being provided with: a distribution computing unit that computes a time-spatial light intensity distribution based on the detected light emission, the time-spatial light intensity distribution being a distribution of a light intensity according to the detection timing, a position in the measurement region, and an wavelength component of the light emission; and a characteristic specifying unit that computes a feature amount that correlates with a sample characteristic indicating a property of the sample and specifies the sample characteristic based on the feature amount.

A measurement system including an imaging device and a plasma processing device having a plasma generator configured to generate plasma from a gas supplied into a processing chamber and a controller. The imaging device is configured to generate optical information of the plasma from image data of imaged plasma in the processing chamber, and the controller is configured to convert the generated optical information of the plasma into a plasma parameter that determines physical characteristics of the plasma with reference to a storage that stores correlation information between the optical information of the plasma and measurement results of the plasma parameter.

The present disclosure is for a tool and a method using or making the tool for detection of production or formation water in drilling fluid. The tool includes a sampling chamber to receive a bypass line from a flow line at a well site. The tool further includes spectroscopy components to perform spectroscopy of the drilling fluid bypassed from a flow line into the bypass line. Processing components are provided in the tool to process spectra from the spectroscopy of the drilling fluid and to generate data associated with at least identification formation or production water in the drilling fluid. The tool includes a communication module to transmit the data externally from the tool.

The present disclosure is for a tool and a method using or making the tool for detection of production or formation water in drilling fluid. The tool includes a sampling chamber to receive a bypass line from a flow line at a well site. The tool further includes spectroscopy components to perform spectroscopy of the drilling fluid bypassed from a flow line into the bypass line. Processing components are provided in the tool to process spectra from the spectroscopy of the drilling fluid and to generate data associated with at least identification formation or production water in the drilling fluid. The tool includes a communication module to transmit the data externally from the tool.

A device for mass spectroscopy comprising a chamber configured to provide an atomization source, a boost device configured to provide radio frequency energy to the chamber, and a mass analyzer in fluid communication with the chamber and configured to separate species based on mass-to-charge ratios is disclosed. In certain examples, a boost device may be used with a flame or plasma to provide additional energy to a flame or plasma to enhance desolvation, atomization, and/or ionization.

A device for mass spectroscopy comprising a chamber configured to provide an atomization source, a boost device configured to provide radio frequency energy to the chamber, and a mass analyzer in fluid communication with the chamber and configured to separate species based on mass-to-charge ratios is disclosed. In certain examples, a boost device may be used with a flame or plasma to provide additional energy to a flame or plasma to enhance desolvation, atomization, and/or ionization.

An optical emission spectrometry instrument may comprise an inductively coupled plasma generator (ICP) with an electromagnetic coil having input and ground connectors. The electromagnetic coil may be mounted to a mounting disk, and the input connector may be coupled to a power output of a radio frequency power source, and the ground connector may be connected to the mounting disk. A spectro-chemical source may be used for sample excitation. The spectro-chemical source and the ICP may have a longitudinal axis. An optical system may be included for viewing the spectro-chemical source with a fixed view axis. The electromagnetic coil may be mounted pivotably around one of its connectors so that the orientation of the ICP can be altered from a first orientation of its longitudinal axis to a second orientation of its longitudinal axis, and vice versa.

An optical emission spectrometry instrument may comprise an inductively coupled plasma generator (ICP) with an electromagnetic coil having input and ground connectors. The electromagnetic coil may be mounted to a mounting disk, and the input connector may be coupled to a power output of a radio frequency power source, and the ground connector may be connected to the mounting disk. A spectro-chemical source may be used for sample excitation. The spectro-chemical source and the ICP may have a longitudinal axis. An optical system may be included for viewing the spectro-chemical source with a fixed view axis. The electromagnetic coil may be mounted pivotably around one of its connectors so that the orientation of the ICP can be altered from a first orientation of its longitudinal axis to a second orientation of its longitudinal axis, and vice versa.

A method is disclosed of measuring the thickness of a thin coating on a substrate comprising dissolving the coating and substrate in a reagent and using the post-dissolution concentration of the coating in the reagent to calculate an effective thickness of the coating. The preferred method includes measuring non-conducting films on flexible and rough substrates, but other kinds of thin films can be measure by matching a reliable film-substrate dissolution technique. One preferred method includes determining the thickness of Boron Carbide films deposited on copper foil. The preferred method uses a standard technique known as inductively coupled plasma optical emission spectroscopy (ICPOES) to measure boron concentration in a liquid sample prepared by dissolving boron carbide films and the Copper substrates, preferably using a chemical etch known as ceric ammonium nitrate (CAN). Measured boron concentration values can then be calculated.

A method is disclosed of measuring the thickness of a thin coating on a substrate comprising dissolving the coating and substrate in a reagent and using the post-dissolution concentration of the coating in the reagent to calculate an effective thickness of the coating. The preferred method includes measuring non-conducting films on flexible and rough substrates, but other kinds of thin films can be measure by matching a reliable film-substrate dissolution technique. One preferred method includes determining the thickness of Boron Carbide films deposited on copper foil. The preferred method uses a standard technique known as inductively coupled plasma optical emission spectroscopy (ICPOES) to measure boron concentration in a liquid sample prepared by dissolving boron carbide films and the Copper substrates, preferably using a chemical etch known as ceric ammonium nitrate (CAN). Measured boron concentration values can then be calculated.