G01N2021/8438

METHOD OF INSPECTING JOINT PORTION OF FLUORORESIN MEMBER AND FLUORORESIN MEMBER INSPECTION METHOD
20220244191 · 2022-08-04 · ·

A method for inspecting a joint portion between fluororesin members, including: a step (A1) of inspecting an internal condition of a joint portion between a fluororesin member (A1) and a fluororesin member (A2) based on image data obtained by imaging the joint portion by optical coherence tomography. Also disclosed is a method for inspecting a fluororesin member, including: a step (B1) of inspecting a defect inside a fluororesin member (B1) based on image data obtained by imaging the fluororesin member (B1) by optical coherence tomography.

Method and system for layered wood product production
11453211 · 2022-09-27 · ·

A method and system for production of layered wood products employs local and independently operating robotic panel assembly cells including one or more veneer handling robots, one or more core handling robots, and one or more glue application robots to produce stacks of layered wood product panels locally near the pressing stations. Consequently, the stacks of layered wood product panels are independently built at, or near, the location of the pressing stations. This eliminates the need for traditional panel conveyors, traditional layered wood product panel assembly layup lines, and stack press delivery lines. This, in turn, eliminates thousands of moving parts and dozens of people from the layered wood product production process.

Methods and systems for measurement of thick films and high aspect ratio structures

Methods and systems for performing spectroscopic measurements of semiconductor structures including ultraviolet, visible, and infrared wavelengths greater than two micrometers are presented herein. A spectroscopic measurement system includes a combined illumination source including a first illumination source that generates ultraviolet, visible, and near infrared wavelengths (wavelengths less than two micrometers) and a second illumination source that generates mid infrared and long infrared wavelengths (wavelengths of two micrometers and greater). Furthermore, the spectroscopic measurement system includes one or more measurement channels spanning the range of illumination wavelengths employed to perform measurements of semiconductor structures. In some embodiments, the one or more measurement channels simultaneously measure the sample throughout the wavelength range. In some other embodiments, the one or more measurement channels sequentially measure the sample throughout the wavelength range.

Manufacturing process for integrated computational elements

Disclosed are methods of fabricating an integrated computational element for use in an optical computing device. One method includes providing a substrate that has a first surface and a second surface substantially opposite the first surface, depositing multiple optical thin films on the first and second surfaces of the substrate via a thin film deposition process, and thereby generating a multilayer film stack device, cleaving the substrate to produce at least two optical thin film stacks, and securing one or more of the at least two optical thin film stacks to a secondary optical element for use as an integrated computational element (ICE).

Systems, methods, and media for artificial intelligence feedback control in additive manufacturing

Additive manufacturing systems using artificial intelligence can identify an anomaly in a printed layer of an object from a generated topographical image of the printed layer. The additive manufacturing systems can also use artificial intelligence to determine a correlation between the identified anomaly and one or more print parameters, and adaptively adjust one or more print parameters. The additive manufacturing systems can also use artificial intelligence to optimize one or more printing parameters to achieve desired mechanical, optical and/or electrical properties.

Silicone detectability under UV light

A method of detecting a presence, location, quality, thickness or cure extent of an organopolysiloxane includes applying an organopolysiloxane on a component, which includes a hydrochromic pigment. The method includes exciting the hydrochromic pigment with a light source and measuring the emissions of the hydrochromic pigment.

MANUFACTURING DEVICE OF PACKAGE AND MANUFACTURING METHOD OF PACKAGE
20210154946 · 2021-05-27 · ·

A manufacturing device is used for manufacturing a package including a resin sheet and a predetermined work wrapped with the resin sheet. The manufacturing device includes: a sealing unit that thermally welds overlapping parts of the sheet; and an inspection device that inspects a sealing quality of the sealed portion thermally welded by the sealing unit. The sealing unit makes, by the thermal welding, a thickness of the sealed portion after the thermal welding smaller than a total thickness of the overlapping parts prior to the thermal welding. The inspection device obtains thickness information on the thickness of the sealed portion and determines the sealing quality of the sealed portion based on the thickness information.

DEVICE AND A METHOD FOR ANALYZING A MULTILAYER FILM
20210131787 · 2021-05-06 ·

A device for determining a layer thickness in a multilayer film includes a radiation source configured to generate an electromagnetic primary radiation, a detector configured to detect an electromagnetic secondary radiation emitted by the multilayer film, the secondary radiation being induced by an interaction of the primary radiation with the multilayer film, and a first contact block transparent to the electromagnetic primary radiation and having a first contact surface for creating contact with the multilayer film. The radiation source is arranged on the first contact block in such a way that the electromagnetic primary radiation is guided from the first contact block onto the multilayer film.

MEASURING DEFLECTION TO DETERMINE A CHARACTERISTIC OF A CANTILEVER
20210096084 · 2021-04-01 ·

Disclosed are methods that, by not physically touching a material being measured, can measure the material's differential response quite accurately. A collimated light shines on the material under test, is reflected off it, and is then captured by a device that records the position where the reflected light is captured. This process is done both before and after the material is processed in some way (e.g., by applying a coat of paint). The change in position where the reflected light is captured is used in calculating the deflection of the material as induced by the process. This measured induced deflection is then used to accurately determinate the stress introduced into the material by the process. Other characteristics of the material under test, such as aspects of the material composition of a bi-metallic strip, for example, may also be determined from a deflection measurement.

METHODS AND SYSTEMS FOR IDENTIFYING FEATURES

Aspects of the present disclosure include methods, apparatuses, and computer readable media for transmitting a light such that it is incident on a multi-layer stack, wherein the multi-layer stack includes the feature and a region without the feature, detecting a narrow-band light from the feature and the region without the feature, wherein the feature has a first optical response in response to a wavelength of the narrow-band light and the region without the feature has a second optical response in response to the wavelength of the narrow-band light, and generating, based on the narrow-band light, an image indicative of where the first optical response and the second optical response occur on the multi-layer stack.