A self-calibrating inspection system includes an inspection device adapted to visually inspect or measure an article placed on a carrier, and a motion actuator moving the inspection device along a predetermined motion trajectory relative to the carrier and the article placed thereon. A correction member of the system is fixedly positioned with respect to the carrier. A distance sensor is fixedly positioned relative to the inspection device and adapted to sense a first spacing between the distance sensor and the correction member during the movement of the inspection device by the motion actuator. A controller communicates with the motion actuator and the distance sensor for determining a deviation between an actual motion trajectory of the inspection device moved by the motion actuator and the predetermined motion trajectory based on the first spacing, and to control the motion actuator based on the deviation to move the inspection device along a path substantially consistent with the predetermined motion trajectory.

A self-calibrating inspection system includes an inspection device adapted to visually inspect or measure an article placed on a carrier, and a motion actuator moving the inspection device along a predetermined motion trajectory relative to the carrier and the article placed thereon. A correction member of the system is fixedly positioned with respect to the carrier. A distance sensor is fixedly positioned relative to the inspection device and adapted to sense a first spacing between the distance sensor and the correction member during the movement of the inspection device by the motion actuator. A controller communicates with the motion actuator and the distance sensor for determining a deviation between an actual motion trajectory of the inspection device moved by the motion actuator and the predetermined motion trajectory based on the first spacing, and to control the motion actuator based on the deviation to move the inspection device along a path substantially consistent with the predetermined motion trajectory.

An inspection system according to the present invention includes: an abnormality detector that performs automatic inspection for detecting an abnormality on the basis of a read image obtained by causing a reader to read an image that is formed on a recording medium by executing a print job; and a hardware processor that, when the abnormality is detected in the automatic inspection, causes the reader to perform specific shading operation involving cleaning the reader after stopping the print job but before restarting the print job, wherein the specific shading operation is performed in a shorter time than normal shading operation involving cleaning the reader, the normal shading operation being performed except when the abnormality is detected in the automatic inspection.

Metrology targets and methods are provided, which comprise at least two overlapping structures configured to be measurable in a mutually exclusive manner at least at two different corresponding optical conditions. The targets may be single cell targets which are measured at different optical conditions which enable independent measurements of the different layers of the target. Accordingly, the targets may be designed to be very small, and be located in-die for providing accurate metrology measured of complex devices.

An embodiment provides an inspection apparatus for a display device, including: a light supplier that supplies light to a surface of the display device; an inspection pattern portion positioned between the display device and the light supplier; a measurement portion that measures reflected light reflected from the surface of the display device; and a processor that processes data of the reflected light measured by the measurement portion, wherein the processor includes a calibration data portion including calibration data and a calibrator calibrating the data using the calibration data of the calibration data portion.

An embodiment provides an inspection apparatus for a display device, including: a light supplier that supplies light to a surface of the display device; an inspection pattern portion positioned between the display device and the light supplier; a measurement portion that measures reflected light reflected from the surface of the display device; and a processor that processes data of the reflected light measured by the measurement portion, wherein the processor includes a calibration data portion including calibration data and a calibrator calibrating the data using the calibration data of the calibration data portion.

Method for the optical inspection of containers, where the containers are transported with a conveyor as a container mass flow, where the containers are each captured with an optical inspection unit as first image data, and where the first image data is evaluated with an image processing unit for contamination and/or defects on the respective container, where the first image data of several containers is overlaid to form an overlay image, and where the overlay image is evaluated for the presence of points of contamination in a beam path of the optical inspection unit.

A method of inspecting a wafer comprising measuring an intensity of an incident light and storing the measurement as stored incident light intensity, irradiating the incident light to the wafer, measuring an intensity of a reflected light from the wafer and storing the measurement as stored reflected light intensity, and correcting the stored reflected light intensity based on a difference between the stored incident light intensity and a reference intensity of a reference incident light.

Durable calibration standards are described herein for inspection systems for manufactured vials, such as glass pharmaceutical vials, and methods of using the same. A grayscale calibration standard is provided for calibration of camera settings of imaging components in an inspection system. The grayscale calibration standard comprises a vial having a laser etched gradient image on a portion of the vial. A region of interest (ROI) calibration standard is provided for calibration of spatial difference of imaging components and to align imaging components in an inspection system to capture desired regions of interest. The ROI calibration standard comprises a vial comprising laser etchings on one or more portions of the vial, wherein the laser etchings comprise laser markings formed in a geometric pattern. By providing laser-marked calibration standards, the calibration standards may be used in many different modes of metrology.

The disclosure provides a wafer inspection method and wafer inspection apparatus. The method includes: receive scanning information of at least one wafer, wherein the scanning information includes a plurality of haze values; the scanning information is divided into a plurality of information blocks according to the unit block, and the feature value of each the plurality of information blocks is calculated according to the plurality of haze values included in each the plurality of information blocks; and converting the feature value into a color value according to the haze upper threshold and the haze lower threshold, and generating the color value corresponding to the at least one wafer according to the converted color value according to the feature value, the color graph displays the texture content of the at least one wafer.