A quantitative phase analysis device for analyzing non-crystalline phases comprising at least one microprocessor configured to: acquire the powder diffraction pattern of the sample; acquire information on one non-crystalline phase and one or more crystalline phases contained in the sample; acquire a fitting function; execute whole-powder pattern fitting, acquire a fitting result; and calculate a weight ratio of the one non-crystalline phase and the one or more crystalline phases. The fitting function for each of the one or more crystalline phases is one fitting function selected from the group consisting of a first fitting function that uses an integrated intensity obtained by whole-powder pattern decomposition, a second fitting function that uses an integrated intensity obtained by observation or calculation, and a third fitting function that uses a profile intensity obtained by observation or calculation. The fitting function for the one non-crystalline phase is the third fitting function.

Methods for using electron diffraction holography to investigate a sample, according to the present disclosure include the initial steps of emitting a plurality of electrons toward the sample, forming the plurality of electrons into a first electron beam and a second electron beam, and modifying the focal properties of at least one of the two beams such that the two beams have different focal planes. Once the two beams have different focal planes, the methods include focusing the first electron beam such that it has a focal plane at or near the sample, and focusing the second electron beam so that it is incident on the sample, and has a focal plane in the diffraction plane. An interference pattern of the first electron beam and the diffracted second electron beam is then detected in the diffraction plane, and then used to generate a diffraction holograph.

A method for X-Ray Scattering material analysis, in particular Small Angle X-ray Scattering material analysis for generating and directing an incident X-ray beam along a propagation direction to a sample held in a sample environment executing a sample measurement process. An apparatus adapted to carry out such a method is also disclosed.

The present invention refers to a method for improving a Transmission Kikuchi Diffraction, TKD pattern, wherein the method comprises the steps of: Detecting a TKD pattern (20b) of a sample (12) in an electron microscope (60) comprising at least one active electron lens (61) focusing an electron beam (80) in z-direction on a sample (12) positioned in distance D below the electron lens (61), the detected TKD (20b) pattern comprising a plurality of image points x.sub.D, y.sub.D and mapping each of the detected image points x.sub.D, y.sub.D to an image point of an improved TKD pattern (20a) with the coordinates x.sub.0, y.sub.0 by using and inverting generalized terms of the form x.sub.D=γ*A+(1−γ)*B and y.sub.D=γ*C+(1−γ)*D wherein $\gamma =\frac{Z}{D}$
with Z being an extension in the z-direction of a cylindrically symmetric magnetic field B.sub.Z of the electron lens (61), and wherein A, B, C, D are trigonometric expressions depending on the coordinates x.sub.0, y.sub.0, with B and D defining a rotation around a symmetry axis of the magnetic field B.sub.Z, and with A and C defining a combined rotation and contraction operation with respect to the symmetry axis of the magnetic field B.sub.Z. The invention further relates to a measurement system, computer program and computer-readable medium for carrying out the method of the invention.

A system and a method of measuring grain orientations of a metal component. The method includes defining a series of measurement locations on the metal component at which to take a series of measurements indicative of grain orientations at corresponding measurement locations. The method further includes defining a nominal grain orientation at each measurement location. The method further includes loading the measurement locations into a computer-controllable fixture suitable for positioning the metal component. The method further includes locating the metal component in the computer-controllable fixture. The method further includes taking the series of measurements at the series of measurement locations. The method further includes analysing the measurement at each measurement location relative to the nominal grain orientation at the corresponding measurement location.

An apparatus for inspecting a semiconductor device according to an embodiment includes an X-ray irradiation unit configured to make monochromatic X-rays obliquely incident on the semiconductor device, which is an object at a predetermined angle of incidence, a detection unit configured to detect observed X-rays observed from the object using a plurality of two-dimensionally disposed photodetection elements, an analysis apparatus configured to generate X-ray diffraction images obtained by photoelectrically converting the observed X-rays, and a control unit configured to change an angle of incidence and a detection angle of the X-rays, in which the analysis apparatus acquires an X-ray diffraction image every time the angle of incidence is changed, extracts a peak X-ray diffraction image, X-ray intensity of which becomes maximum for each of pixels and compares the peak X-ray diffraction image among the pixels to thereby estimate a stress distribution of the object.

An animal-tissue analysis and communication system produces a quantitative-diagnostic indicator for animal-tissue analyzed by the system. The system includes an animal-tissue-analyzer subsystem with at least one animal-tissue analyzer constructed to analyze animal tissue and to produce an quantitative-diagnostic indicator. The system also includes a two-way communication subsystem constructed to allow the animal-tissue-analyzer subsystem to send and receive information relevant to the quantitative-diagnostic indicator. The animal-tissue-analyzer subsystem includes at least one tissue diffractometer operatively coupled to a computer database over a network, and is configured for acquisition and transfer of animal-tissue data, and transfer to the computer database over the network. A computer processor is operatively coupled to the tissue diffractometer, and configured to receive, transmit and process the animal-tissue data from the diffractometer to the computer database, using a data analytics algorithm that provides a computer-aided quantitative-diagnostic indicator for a given animal-tissue sample.

A method and apparatus for rapid measurement and analysis of structure and composition of poly-crystal materials by X-ray diffraction and X-ray spectroscopy, which uses a two-dimensional energy dispersive area detector having an array of pixels, and a white spectrum X-ray beam source. A related data processing method includes separating X-ray diffraction and spectroscopy signals in the energy dispersive X-ray spectrum detected by each pixel of the two-dimensional energy dispersive detector; correcting the detected X-ray diffraction signals by a correction function; summing the corrected X-ray diffraction signals and X-ray spectroscopy signals, respectively, over all pixels to obtain an enhanced diffraction spectrum and an enhanced spectroscopy spectrum; using the enhanced diffraction and spectroscopy spectrum respectively to determine the structure and composition of the sample. The summing step includes using Bragg's equation to convert the intensity-energy diffraction spectrum for each pixel into an intensity-lattice spacing spectrum before summing them.

A method of detecting an anomaly in a crystallographic structure, the method comprising: illuminating the structure with x-ray radiation in a known direction relative to the crystallographic orientation; positioning the structure such that its crystallographic orientation is known; detecting a pattern of the diffracted x-ray radiation transmitted through the structure; generating the simulated pattern based on the known direction relative to the crystallographic orientation; comparing the detected pattern to a simulated pattern for x-ray radiation illuminating in the known direction; and, detecting the anomaly in the crystallographic structure based on the comparison.

A crosslinked fluoropolymer resin is configured to include a measuring step of irradiating a surface of the crosslinked fluoropolymer resin with a laser to measure a Raman spectrum, and an acceptance or rejection decision step of determining an acceptance or a rejection of a quality of a measurement region irradiated with the laser, on the basis of an intensity of a fluorescence spectrum relative to an intensity of a Raman scattering peak, which is ascribed to a CF.sub.2 stretching vibration, in the measured Raman spectrum.