An RF sensing apparatus configured for use with a plasma processing chamber includes a penetration unit opened in an up/down direction, a main return path unit surrounding all or a portion of the penetration unit, and a secondary return path unit located between the penetration unit and the main return path unit, spaced apart from the main return path unit, and surrounding all or a portion of the penetration unit. The main return path unit and the secondary return path unit include a path through which a current flows in one of the up/down directions.

A capacitor has a variable capacitance settable by a bias voltage. A method for setting the bias voltage including the steps of: (a) injecting a constant current to bias the capacitor; (b) measuring the capacitor voltage at the end of a time interval; (c) calculating the capacitance value obtained at the end of the time interval; (d) comparing this value with a desired value; and (e) repeating steps (a) to (d) so as long as the calculated value is different from the set point value. When calculated value matches the set point value; the measured capacitor voltage is stored as a bias voltage to be applied to the capacitor for setting the variable capacitance.

A capacitor has a variable capacitance settable by a bias voltage. A method for setting the bias voltage including the steps of: (a) injecting a constant current to bias the capacitor; (b) measuring the capacitor voltage at the end of a time interval; (c) calculating the capacitance value obtained at the end of the time interval; (d) comparing this value with a desired value; and (e) repeating steps (a) to (d) so as long as the calculated value is different from the set point value. When calculated value matches the set point value; the measured capacitor voltage is stored as a bias voltage to be applied to the capacitor for setting the variable capacitance.

For an electrical unbalanced load of a vehicle having an at least partially electrified drive train with at least one high-voltage system, information about a value characterizing an energy quantity of a Y capacitor of the high-voltage system is determined. The information about the electrical unbalanced load is finally determined by comparing the determined characterizing value with a threshold value.

A capacitive voltage sensor assembly includes a first electrode extending along a longitudinal axis, a tubular section surrounding a portion of the first electrode and positioned radially outward from the longitudinal axis and the first electrode, the tubular section including an insulating layer, an inner conductive layer, and an outer conductive layer, and a mass of dielectric insulating material at least partially enclosing the first electrode and the tubular section. The mass of dielectric insulating material fills through openings formed in the tubular section.

A monitoring system for sensing electrical parameters including current and voltage can comprise a current transformer and an antenna. The current transformer can be configured to sense current passing through a conductor. The antenna can be configured to sense electrical potential of the conductor by sensing an electric field generated by the conductor. The antenna can sense the electrical potential independent of whether current is present in the conductor. The monitoring system can further comprise a temperature sensor configured to sense a temperature of the conductor. A sensing module can include a housing supporting the current transformer, the antenna, and the temperature sensor for monitoring an electrical power circuit.

An electrostatic detecting device, which is configured to detect an electrostatically sensitive area of an electronic device causing a specific event to happen to an electronic device, includes an electrostatic metal plate, a detector, and a controller. The electrostatic metal plate is configured to generate an electrical field and includes a first surface which is parallel to the electronic device. When the specific event is detected, the detector generates a detection signal. The controller moves the first surface relative to the electronic device and receives the detection signal. When the detection signal is received, the controller determines that the electrostatically sensitive area is a first area of the electronic device overlapped with the first surface.

Systems and methods for calibrating a conducted electrical weapon (CEW) to provide a predetermined amount of current for each pulse of the stimulus signal. Providing the predetermined amount of current, close thereto, increases the effectiveness of the stimulus signal in impeding locomotion of a human or animal target. The calibration process enables a CEW to calibrate the amount of charge in a pulse of the stimulus signal in the environmental conditions where the tester operates and also in the field where the environmental conditions may be different from the environmental conditions during calibration.

Systems and methods for calibrating a conducted electrical weapon (CEW) to provide a predetermined amount of current for each pulse of the stimulus signal. Providing the predetermined amount of current, close thereto, increases the effectiveness of the stimulus signal in impeding locomotion of a human or animal target. The calibration process enables a CEW to calibrate the amount of charge in a pulse of the stimulus signal in the environmental conditions where the tester operates and also in the field where the environmental conditions may be different from the environmental conditions during calibration.

The disclosure relates to a method for detecting surface electric field distribution of nanostructures. The method includes the following steps of: providing a sample located on an insulated surface of a substrate; spraying first charged nanoparticles to the insulated surface; and blowing vapor to the insulated surface to observe a distribution of the first charged nanoparticles via an optical microscope.