A structure and method for providing a housing which includes a high frequency (HF or RF) connection between a device under test (DUT) having a waveguide 22. The waveguide includes a wave insert 22, and a conductive compliant member 40 which maintains bias between the adapter/insert 22 and the DUT HF port 20 while also maintaining an RF shield despite the variable height of the DUT waveport. A passage 50 provides an RF connection between the RF port 62 on the DUT and a RF wave guide horn 54. A plurality of transmitting horns 54 can be arranged to transmit to a single receiving horn 154 so that fewer receivers are required to test multiple DUTs in sequence.

The invention relates to an integrated circuit with an active transistor area and a plurality of wiring layers arranged above the active transistor area. At least one optical device is integrated in the active transistor area. The optical device is electrically connected with at least one of the wiring layers. At least one optical tunnel extends from the at least one optical device through the plurality of wiring layers to a surface of an uppermost wiring layer of the plurality of wiring layers facing away from the active transistor area.

This ultrasonic inspection device, for inspecting a packaged semiconductor device, is provided with: an ultrasonic transducer which outputs ultrasonic waves to a semiconductor device; a receiver (a reflection detection unit) which detects reflected waves of the ultrasonic waves reflected on the semiconductor device; a stage which moves the positions of the semiconductor device relative to the ultrasonic transducer; a stage control unit which controls driving of the stage; and an analysis unit which analyzes the reaction of the semiconductor device to the input of the ultrasonic waves from the ultrasonic transducer. The stage control unit controls the distance between the semiconductor device and the ultrasonic transducer on the basis of a peak occurring in time waveform of the reflected wave detected by the receiver.

An IC that includes a contiguous standard cell area with a 4×3 e-beam pad that is compatible with advanced manufacturing processes and an associated e-beam testable structure.

An IC that includes a contiguous standard cell area with a 4×3 e-beam pad that is compatible with advanced manufacturing processes and an associated e-beam testable structure.

An IC that includes a contiguous standard cell area with a 4×3 e-beam pad that is compatible with advanced manufacturing processes and an associated e-beam testable structure.

An IC that includes a contiguous standard cell area with a 4×3 e-beam pad that is compatible with advanced manufacturing processes and an associated e-beam testable structure.

A test and measurement probe coupler that may include a substrate, a first signal tap conductor, a first signal contact, a first ground tap conductor, and a first ground contact. The first signal tap conductor may extends a first length along the substrate. The first signal contact may be electrically coupled to the first signal tap conductor, and the first ground tap conductor may extend a second length along the substrate. The first ground tap conductor may be substantially parallel to the first signal tap conductor. The first ground tap conductor may be disposed in a first lateral direction away from the first signal tap conductor, and the first ground contact electrically may be coupled to the first ground tap conductor.

A test and measurement probe coupler that may include a substrate, a first signal tap conductor, a first signal contact, a first ground tap conductor, and a first ground contact. The first signal tap conductor may extends a first length along the substrate. The first signal contact may be electrically coupled to the first signal tap conductor, and the first ground tap conductor may extend a second length along the substrate. The first ground tap conductor may be substantially parallel to the first signal tap conductor. The first ground tap conductor may be disposed in a first lateral direction away from the first signal tap conductor, and the first ground contact electrically may be coupled to the first ground tap conductor.

An IC that includes a contiguous standard cell area with a 4x3 e-beam pad that is compatible with advanced manufacturing processes and an associated e-beam testable structure.