The present invention addresses the problem of providing a transparent article in which sparkling on an anti-glare surface or other roughened relief surface is suppressed. The transparent article is provided with a transparent substrate, and a roughened relief surface provided to at least one surface of the transparent substrate. The relief surface has a surface roughness Sq of 50 nm or less measured in a spatial period of 20 μm or greater in the transverse direction.

The invention provides an anti-glare coating of wide bandgap nanostructured oxide material so as to reduce the dazzling reflections of sunlight and avoid light pollution generated by spacecraft. The coating provides selective electrodeposition of a nanostructured wide bandgap oxide material on the metal contact grid on the surface of a solar panel of a spacecraft or a satellite in which the metal contact grid constitutes the cathode, and the resulting nanostructures have a width and spacing less than the wavelength ‘λ’ of the incident light or equal to ‘λ/n’ with λ located between 180 nm and 8μm, and ‘n’ being the refractive index of the nanostructured material so that for angles of incidence between 0.01 and 90 degrees less than 0.5% of light is reflected.

The present invention provides: a lightweight optical member which can be produced at relatively low cost and which provides low reflectance, stability upon exposure to light, and abrasion resistance; and an efficient method for producing such an optical member. An optical member according to the present invention is characterized by comprising: a metallic base material; a low-reflective treatment layer formed on the surface of the metallic base material; and a silica layer formed on the surface of the low-reflective treatment layer. It is preferable for the silica layer to have a layer thickness of 0.1-10 μM.

To provide an imaging device that suppresses reflection of incident light still more effectively and has excellent sensitivity characteristics. This imaging device includes a semiconductor substrate and a photoelectric conversion section. The semiconductor substrate includes a multi-stepped recess in which a plurality of respective holes defined by first outlines having substantially polygonal shapes is continuous in a thickness direction. The substantially polygonal shapes extend along a first surface orthogonal to the thickness direction and are different from each other in size in a plan view taken along the thickness direction. The photoelectric conversion section generates electric charge through photoelectric conversion. The photoelectric conversion section is defined by a second outline including a portion inclined with respect to the first outlines of the holes in a plan view. The electric charge corresponds to an amount of incident light passing through the multi-stepped recess.

An array substrate and a manufacturing method thereof, and a display device are provided. The array substrate includes a substrate; a thin film transistor layer including a gate electrode, a source electrode, and a drain electrode; and a first anti-reflective layer disposed between the substrate and the thin film transistor layer and disposed corresponding to at least one of the gate electrode, the source electrode, or the drain electrode. Wherein, the first anti-reflective layer includes a peeling prevention layer and an anti-reflective functional layer. The anti-reflective functional layer is disposed on a side of the peeling prevention layer away from the substrate.

The present disclosure provides a polarizing device and a method for preparing the same, a display substrate, and a display device. The polarizing device includes: a base substrate, a metal wire grid, and an anti-reflection layer, in which the metal wire grid is arranged on the base substrate, the anti-reflection layer is arranged on the surface of the metal wire grid away from the base substrate, and the anti-reflection layer is a carbon film layer.

The present disclosure provides a polarizing device and a method for preparing the same, a display substrate, and a display device. The polarizing device includes: a base substrate, a metal wire grid, and an anti-reflection layer, in which the metal wire grid is arranged on the base substrate, the anti-reflection layer is arranged on the surface of the metal wire grid away from the base substrate, and the anti-reflection layer is a carbon film layer.

Provided is an optical filter capable of reducing the dependency on the angle of light incidence. An optical filter 1 includes a hydrogenated silicon-containing film 4, wherein in a Raman spectrum of the hydrogenated silicon-containing film 4 measured by Raman spectroscopy a ratio (SiH/SiH.sub.2) obtained from a ratio between an area of a peak derived from SiH and an area of a peak derived from SiH.sub.2 is 0.7 or more.

Provided is an optical filter capable of reducing the dependency on the angle of light incidence. An optical filter 1 includes a hydrogenated silicon-containing film 4, wherein in a Raman spectrum of the hydrogenated silicon-containing film 4 measured by Raman spectroscopy a ratio (SiH/SiH.sub.2) obtained from a ratio between an area of a peak derived from SiH and an area of a peak derived from SiH.sub.2 is 0.7 or more.

A film comprises an amorphous transition metal oxide as a main component, and 1.0 at % or more of hydrogen.