G02B5/3058

POLARIZING FILM and DISPLAY DEVICE HAVING the POLARIZING FILM

The present application discloses a polarizing film and a display device including the polarizing film. The polarizer includes a transparent substrate; a linear polarizer disposed on the transparent substrate; an optical retardation film disposed on the transparent substrate; the linear polarizer including a first dielectric layer covered on the transparent substrate and a metal layer disposed on the first dielectric layer; and the optical retardation film including a second dielectric layer disposed on the transparent substrate to solve the mechanical, optical and lifetime issues faced to the conventional organic polarizing film, while solving the problem of the increased thickness of optical films owing to the manufacture and adhesion of polarizer and retardation film separately.

Reflective wire grid polarizer with transparent cap

A reflective wire grid polarizer (WGP) can include an array of wires 12 on a face of a substrate 11, with channels 15 between adjacent wires 12. The wires 12 can have certain characteristics for WGP performance, such as index of refraction, alternating high/low index continuous thin films, thickness of layer(s), duty cycle, reflective rib shape, a curved side of transparent ribs 21 or 32, aspect ratio, or combinations thereof.

METHOD FOR FORMING FINE PATTERNS
20170348729 · 2017-12-07 ·

A method of forming fine patterns includes the steps of forming a conductive layer on a base part, forming a sacrificial layer including an adhesive material on the conductive layer, the adhesive material including a catechol group, forming resist patterns on the sacrificial layer, and forming fine patterns by patterning the conductive layer using the resist patterns as a mask.

Light-Guide Optical Element Employing Polarized Internal Reflectors
20220373810 · 2022-11-24 ·

A light-guide optical element (LOE) includes a transparent substrate having two parallel major external surfaces for guiding light within the substrate by total internal reflection (TIR). Mutually parallel internal surfaces within the LOE are provided with a structural polarizer which is transparent to light polarized parallel to a primary polarization transmission axis, and is partially or fully reflective to light polarized perpendicular to the primary polarization transmission axis. By suitable orientation of the polarization axis of successive internal surfaces together with the polarization mixing properties of TIR and/or use of birefringent materials, it is possible to achieve the desired proportion of coupling-out of the image illumination from each successive facet.

OPTICAL FILTER, AND IMAGE SENSOR AND ELECTRONIC DEVICE INCLUDING OPTICAL FILTER

An optical filter includes an active filter region including at least one of a spectral filter and a polarizing filter; and a reference filter region configured to sense an amount of light passing through the active filter region, wherein the reference filter region includes a gray filter and at least one of a black filter and a transparent filter, wherein the gray filter has a transmittance that is higher than a transmittance of the black filter and lower than a transmittance of the transparent filter.

Wire grid polarizer and method of fabricating the same
09835781 · 2017-12-05 · ·

Provided is a wire grid polarizer comprising a substrate, a plurality of conductive wire patterns formed in parallel to protrude from a top surface of the substrate and first hard mask patterns disposed on the conductive wire patterns and second hard mask patterns disposed on the first hard mask patterns, wherein a ratio of a taper angle of the second hard mask patterns to a taper angle of the first hard mask pattern is 1 or greater.

Polarizer, manufacturing method thereof, and display panel
11506927 · 2022-11-22 ·

The present invention provides a polarizer, a manufacturing method of the polarizer, and a display panel. The polarizer includes a transparent base substrate and a metal wire grid layer arranged on the transparent base substrate. The metal wire grid layer includes at least two wire grid units spaced apart from each other, and each of the wire grid units includes a plurality of metal wires parallel to each other. The transparent base substrate has a light transmissive region and a light emitting region, and the wire grid units are arranged corresponding to the light emitting region.

Long wave infrared imaging polarimeter, and method of assembly

A long wave infrared imaging polarimeter (LWIP) is disclosed including a pixilated polarizing array (PPA) in close proximity to a microbolometer focal plane array (MFPA), along with an alignment engine for aligning and bonding the PPA and MFPA and method for assembly.

Wire grid polarizer and liquid crystal display device having the same

A liquid crystal display device includes a wire grid polarizer, in which the wire grid polarizer is directly formed on a lower substrate, thereby decreasing the thickness of the liquid crystal display. In the wire grid polarizer formed on the lower substrate, a plurality of protective layers are formed on polarizing patterns that perform a polarizing function, so that it is possible to reduce or minimize the deterioration of characteristics of thin film transistors of the liquid crystal display, which are formed on the protective layers.

IMPRINT LITHOGRAPHY METHOD, MASTER TEMPLATE FOR IMPRINT, WIRE GRID POLARIZER MANUFACTURED USING THE MASTER TEMPLATE AND DISPLAY SUBSTRATE HAVING THE SAME

An imprint lithography method includes forming a first imprint pattern on a substrate in a first area and a third area, wherein the third area is spaced apart from the first area, forming a first resist pattern on the substrate on a second area, wherein the second area is adjacent the first and third areas, forming a first pattern in the first and third areas by etching an element under the first imprint pattern using the first imprint pattern and the first resist pattern as an etch barrier, forming a second imprint pattern on the substrate in a second area, forming a second resist pattern on the substrate on the first area and the third area, and forming a second pattern in the second area by etching an element under the second imprint pattern using the second imprint pattern and the second resist pattern as an etch barrier.