A polarizing plate includes a polarizing film, a first adhesive layer or a bonding layer, a retardation layer, and a third adhesive layer, and includes: a UV absorber comprising an indole UV absorber, a phenylbenzotriazole UV absorber, and/or a triazine UV absorber, wherein the UV absorber has a maximum absorption wavelength of 370 nm or higher, the polarizing plate has a light transmittance of 5% or less in a wavelength range of about 400 nm to about 405 nm and a light transmittance of 35% or higher in a wavelength range of about 440 nm to about 450 nm, the first adhesive layer has a modulus of 1×105 Pa or higher at 80° C. and a modulus of 1×105 Pa or higher at 30° C., and the third adhesive layer has a modulus of 5×104 Pa to 1×106 Pa at 80° C. and a modulus of 1×105 Pa to 3×106 Pa at 30° C.

The invention relates to an optical system of a microlithographic projection exposure apparatus, in particular for operation in the EUV, comprising a mirror arrangement composed of a plurality of mutually independently adjustable mirror elements, and at least one polarization-influencing arrangement arranged upstream of the mirror arrangement relative to the light propagation direction, wherein the polarization-influencing arrangement has a group of first reflection surfaces and a group of second reflection surfaces, wherein the first reflection surfaces are tiltable independently of one another, and wherein, during the operation of the optical system, light reflected at respectively one of the first reflection surfaces can be directed onto the mirror arrangement via respectively a different one of the second reflection surfaces depending on the tilting of the first reflection surface.

The invention relates to an optical system of a microlithographic projection exposure apparatus, in particular for operation in the EUV, comprising at least one polarization-influencing arrangement having a first reflection surface and a second reflection surface, wherein the first reflection surface and the second reflection surface are arranged at an angle of 0°±10° or at an angle of 90°±10° relative to one another, wherein light incident on the first reflection surface during the operation of the optical system forms an angle of 45°±5° with the first reflection surface, and wherein the polarization-influencing arrangement is rotatable about a rotation axis running parallel to the light propagation direction of light incident on the first reflection surface during the operation of the optical system.

It would be advantageous to improve polarizer high temperature resistance, corrosion resistance, oxidation resistance, optical properties, and etchability. Composite polarizer materials can be used to achieve this. A polarizer can comprise polarization structures configured for polarization of light. The polarization structures can include a reflective rib, the reflective rib being a composite of two different elements. The polarization structures can include an absorptive rib, the absorptive rib being a composite of two different elements. The polarizer can include a transparent layer, the transparent layer being a composite of two different elements.

Disclosed herein an exposure apparatus capable of implementing a microfabrication onto a work with a higher throughput and a lower cost. The exposure apparatus generates interfering light by crossing two or more branched light beams branched from output light from a coherent light source at a predetermined interfering angle, and exposes the substrate by repeating an irradiation onto the substrate with the interfering light and a conveyance of the substrate. At this moment, the exposure apparatus shapes in interfering light irradiation region on the substrate onto which the interfering light is irradiated into a predetermined shape. Then, the exposure apparatus disposes a plurality of the interfering light irradiation regions in successive shots to be located adjacent to each other on the substrate in a direction of conveying the substrate without the interfering light irradiation regions being overlapped when exposing the substrate while conveying the substrate in a stepwise manner.

Provided is an optical film that, when being incorporated into an image display device, can suppress the image display device from appearing pale. An optical film including a UV-absorbing layer containing a UV-absorbing agent B on a plastic film containing a UV-absorbing agent A, wherein fluorescence emission when the plastic film side is irradiated with excitation light having a wavelength of 365 nm and fluorescence emission when the UV-absorbing layer side is irradiated with excitation light having a wavelength of 365 nm satisfy a specific condition.

Provided is a method for manufacturing a polarizing plate, comprising a step of irradiating an optical laminate with ultraviolet rays having an emission wavelength band of 380 nm to 410 nm. The optical laminate sequentially comprises a first base film, a first adhesive layer, a linear polarizer, a second adhesive layer, a second base film and a reverse dispersion liquid crystal layer. The first adhesive layer and the second adhesive layer each comprise a photosensitizer for initiating a curing reaction in a wavelength band of 350 nm to 410 nm, and the ultraviolet rays are irradiated on the first base film side of the optical laminate.

An optical film includes a plurality of alternating first and second layers. The first layers have a first in-plane birefringence, the second layers have a second in-plane birefringence, and the second in-plane birefringence is less than the first in-plane birefringence and greater than 0.03. The first layers may include polyethylene terephthalate homopolymer and the second layers may include glycol-modified co(polyethylene terephthalate). The optical film has a shrinkage along a first direction of greater than 4% and a shrinkage along an orthogonal second direction of greater than 3% when heated at 150° C. for 15 minutes. A glass laminate is prepared by disposing the optical film between glass layers and laminating the optical film to the glass layers.

It would be advantageous to improve polarizer high temperature resistance, corrosion resistance, oxidation resistance, optical properties, and etchability. Composite polarizer materials can be used to achieve this. A polarizer can comprise polarization structures configured for polarization of light. The polarization structures can include a reflective rib, the reflective rib being a composite of two different elements. The polarization structures can include an absorptive rib, the absorptive rib being a composite of two different elements. The polarizer can include a transparent layer, the transparent layer being a composite of two different elements.

According to one aspect of the present invention, a base material-less protective film used in a polarizing plate is provided, wherein the protective film comprises a core layer containing a resin made of a cured product, and an adhesion-improving layer provided on one surface of the core layer, and wherein a surface of the adhesion-improving layer forms one surface of the protective film, and the thickness of the protective film is less than 40 μm, and the tensile break strength of the protective film is 30 N/mm.sup.2 or more.