Patent classifications
G02B19/0023
MULTIPLE SUNLIGHT COLLECTION STRUCTURE
The present invention relates to a method for collecting sunlight through an image method by tracking the sun using a dish-shaped light collector or a paraboloidal light collector and, and to a method and an apparatus for transmitting high-density light as the collected sunlight to a remote place, to which the light is applied, and for generating super-high-density light by combining, in a multi-stage manner, the high-density light obtained through a plurality of light collectors. A first concaveparaboloidal reflector of a paraboloidal light collection unit can collect light, transmit the collected light to the remote place, and provide an efficient and quantitative use environment to an applied device by using a paraboloidal reflector set including: a first concave-paraboloidal mirror in which a slope of a paraboloide is provided to make a narrow width so that downward reflection is greater than or equal to 90% by an angle between an incident angle at an inner point of a paraboloidal mirror and a normal surface, the angle being larger than a critical angle, and which has an opening formed at the lower side of a central axis thereof; and a second convex-paraboloidal reflector, which has a small diameter, shares a focus of the first concave-paraboloidal mirror, and has a miniaturized shape of the first concave-paraboloidal mirror at a focal portion without an opening at a central axis thereof.
DEVICE FOR SWIVELING A MIRROR ELEMENT WITH TWO DEGREES OF SWIVELING FREEDOM
A displacement device for pivoting a mirror element with two degrees of freedom of pivoting includes an electrode structure including actuator electrodes. The actuator electrodes are comb electrodes. All actuator electrodes are arranged in a single plane. The actuator electrodes form a direct drive for pivoting the mirror element.
OPTICAL APPARATUS
An apparatus according to the aspect of the embodiments includes a light source, a first surface configured to reflect light from the light source toward an object, a second surface with a shape different from a shape of the first surface in which the second surface is configured to reflect a part of the light from the object toward the object, and a third surface configured to reflect a part of the light reflected by the second surface and then reflected by the object, toward a light receiving element.
Light source apparatus
A light source apparatus includes an optical illumination unit that converts optical characteristics of primary light emitted from a light source unit and emits secondary light different from the primary light; and an adapter unit that outwardly emits illumination light generated based on the secondary light emitted from the optical illumination unit and that is attachable to/detachable from the optical illumination unit. A radiation angle control member converts a traveling direction of the secondary light so that the secondary light allowed to emit from a light conversion member toward the radiation angle control member in the secondary light allowed to emit from the light conversion member travels toward the adapter unit through the secondary light emit portion.
Illumination optical unit for EUV projection lithography
An illumination optical unit for EUV projection lithography illuminates an illumination field with illumination light from a light source. A first facet mirror of the illumination optical unit has a plurality of first facets for the reflective guidance of partial beams of a beam of the EUV illumination light. Disposed downstream of the first facet mirror is a second facet mirror with a plurality of second facets for further reflective guidance of the partial beams. As a result of this, the reflective beam guidance that the two facets predetermines object field illumination channels, by which the whole object field is illuminable by the illumination light in each case and to which exactly one first facet and exactly one second facet is assigned in each case.
Optical Device and Optical Device Manufacturing Method
An object of the present invention is to provide a technique capable of easily manufacturing a desired optical device at the inside of a transparent board. An optical device according to the present invention is manufactured by denaturing the vicinity of a hollow structure at the inside of the transparent board and deforming the shape of the hollow structure
SUNLIGHT TRANSMITTER
Disclosed is a sunlight transmitter, and more particularly to a sunlight transmitter according to an embodiment of the present invention is used as a transmission device of solar light to transmit sunlight into an indoor space by condensing and converting the sunlight into straight parallel light, and maximizes a sunlight transmission efficiency by minimizing loss in condensing the sunlight and obtaining not only the straight parallel light of high luminous flux but also diffused light through hybrid condensation.
Extreme ultraviolet (EUV) collector inspection apparatus and method
An extreme ultraviolet (EUV) collector inspection apparatus and method capable of precisely inspecting a contamination state of an EUV collector and EUV reflectance in accordance with the contamination state are provided. The EUV collector inspection apparatus includes a light source arranged in front of an EUV collector to be inspected and configured to output light in a visible light (VIS) band from UV rays, an optical device configured to output narrowband light from the light, and a camera configured to perform imaging from an UV band to a VIS band. An image by wavelength of the EUV collector is obtained by using the optical device and the camera and a contamination state of the EUV collector is inspected.
Reflective beam shaper
A reflective beam former for changing a diameter of a collimated light beam. A first mirror surface of a first curvature type, a second mirror surface and a third mirror surface are in a beam path; the shapes of the surfaces cause a collimated light beam entering the beam former via a first or third mirror surface to leave via the third or first mirror surface, respectively. The beam former includes several third, curved mirror surfaces of a second, different curvature type, one type being convex, the other concave. The second mirror surface is a plane mirror surface with an axis perpendicular to the plane mirror surface, and is in the beam path between the first and one selected from the several third mirror surfaces such that the surfaces are confocal to each other. The beam former includes a selector for selecting one of the several third curved mirror surfaces.
ILLUMINATION OPTICS FOR EUV PROJECTION LITHOGRAPHY
An illumination optical unit for EUV projection lithography includes a field facet mirror and a pupil facet mirror. A correction control device, which is used for the controlled displacement of at least some field facets that are usable as correction field facets, which are signal connected to displacement actuators, is embodied so that a correction displacement path for the correction field facets is so large that a respective correction illumination channel is cut off at the margin by the correction pupil facet so that the illumination light partial beam is not transferred in the entirety thereof from the correction pupil facet into the object field.