A wearable display device 1 includes a display panel 11, an eyepiece 31, and an optical element 21 that is disposed between the display panel 11 and the eyepiece 31, in which the optical element 21 includes an optically-anisotropic layer 23 that is formed of a cured layer of a composition including a liquid crystal compound 24, and the optically-anisotropic layer 23 has a liquid crystal alignment pattern AP1 in which a direction of an optical axis derived from the liquid crystal compound 24 changes while continuously rotating along at least one in-plane direction of the optically-anisotropic layer 23.

Provided a light modulating device including a variable mirror including a plurality of lattice structures, the plurality of lattice structures including a material having a refractive index that changes based on a temperature of the material, a distributed Bragg mirror spaced apart from the variable mirror and provided above the variable mirror, the distributed Bragg mirror including a first material layer and a second material layer that are alternately stacked, and a refractive index of the first material layer being different from a refractive index of the second material layer, and a heating portion configured to heat the plurality of lattice structures and provided below the variable mirror opposite to the distributed Bragg mirror.

A light modulator for amplifying an intensity of incident light and modulating a phase of the incident light is provided. The light modulator includes: a first distributed Bragg reflector (DBR) layer having a first reflectivity and comprising at least two first refractive index layers that have different refractive indices from each other and are repeatedly alternately stacked; a second DBR layer having a second reflectivity and comprising at least two second refractive index layers that have different refractive indices from each other and are repeatedly alternately stacked; and an active layer disposed between the first DBR layer and the second DBR layer, and comprising a quantum well structure.

An optical modulator includes a dielectric layer and a waveguide. The waveguide is disposed on the dielectric layer. The waveguide includes an electrical coupling portion, a slab portion, and an optical coupling portion. The slab portion is sandwiched between the electrical coupling portion and the optical coupling portion. The slab portion has at least two sub-portions having different heights. A maximum height of the slab portion is smaller than a height of the electrical coupling portion.

Various embodiments of a monolithic electro-optical (E-O) modulator are described, which may be fabricated on a silicon-on-insulator substrate. The monolithic E-O modulator includes an optical waveguide that allows an optical signal to propagate therein. The monolithic E-O modulator also includes a comb-shaped transmission line for conducting an electrical modulation signal that modulates the optical signal. The comb-shaped transmission line includes electrical conductors running in parallel with the optical waveguide. At least one of the conductors includes recesses or thin slots that form the conductor into a shape having a plurality of teeth, like a comb. The comb-shaped transmission line can be engineered to realize a close matching between a propagation velocity of the optical signal along the optical waveguide and a group velocity of the electrical modulation signal along the comb-shaped transmission line, which helps to achieve a high operating speed of the monolithic E-O modulator.

An electro-optic modulator includes a doped structure disposed on a top silicon layer of a substrate. The doped structure includes an optical waveguide, and a first P-type doped region and a first N-type doped region disposed respectively on two sides of the optical waveguide. The first P-type doped region is connected to the optical waveguide by means of a plurality of P-type doped link arms, and the first N-type doped region is connected to the optical waveguide by means of a plurality of N-type doped link arms. End portions of the plurality of P-type doped link arms and end portions of the plurality of N-type doped link arms are alternately arranged along a direction of light propagation to form PN junction depletion layers. The PN junction depletion layers are periodically arranged along the direction of light propagation to form the optical waveguide.

Provided are optical modulators and devices including the optical modulators. The optical modulator may include an optical modulation layer that includes a phase change material. A first electrode may be provided on a first surface of the optical modulation layer. A second electrode may be provided on a second surface of the optical modulation layer. A first phase controlling layer may be provided, the first electrode being disposed between the first phase controlling layer and the optical modulation layer. A second phase controlling layer may be provided, the second electrode being disposed between the second phase controlling layer and the optical modulation layer. Each of the first and the second phase controlling layers may have an optical thickness corresponding to an odd multiple of /4, where is a wavelength of incident light to be modulated by the optical modulator. The optical modulator may further include at least one reflective layer. The optical modulation layer may have a thickness of about 10 nm or less. An operating voltage of the optical modulator may be about 10 V or less.

An optical phase shifter may include a waveguide core that has a top surface, and a semiconductor contact that is laterally displaced relative to the waveguide core and is electrically connected to the waveguide core. A top surface of the semiconductor contact is above the top surface of the waveguide core. The waveguide core may include a p-type core region and an n-type core region. A p-type semiconductor region may be in physical contact with the n-type core region of the waveguide core, and an n-type semiconductor region may be in physical contact with the p-type core region of the waveguide core. A phase shifter region and a light-emitting region may be disposed at different depth levels, and the light-emitting region may emit light from a phase shifter region that is in a position adjacent to the light-emitting region.

A bandpass filter may include a set of layers. The set of layers may include a first subset of layers. The first subset of layers may include hydrogenated germanium (Ge:H) with a first refractive index. The set of layers may include a second subset of layers. The second subset of layers may include a material with a second refractive index. The second refractive index may be less than the first refractive index.

An optical phase shifter may include a waveguide core that has a top surface, and a semiconductor contact that is laterally displaced relative to the waveguide core and is electrically connected to the waveguide core. A top surface of the semiconductor contact is above the top surface of the waveguide core. The waveguide core may include a p-type core region and an n-type core region. A p-type semiconductor region may be in physical contact with the n-type core region of the waveguide core, and an n-type semiconductor region may be in physical contact with the p-type core region of the waveguide core. A phase shifter region and a light-emitting region may be disposed at different depth levels, and the light-emitting region may emit light from a phase shifter region that is in a position adjacent to the light-emitting region.