The invention relates to the field of photonic integrated circuits and provides an optical modulator and a photonic integrated system, which can suppress phase deviation caused by carrier diffusion. The optical modulator includes at least one phase shifter including a waveguide channel for transmitting optical signal, and a P-type doped region and a N-type doped region located on opposite sides of the waveguide channel. In the waveguide channel, an undoped intrinsic region is located between the P-type doped region and the N-type doped region. At least one end of the intrinsic region or close to the at least one end is provided with a blocking structure for blocking the diffusion of carriers from the intrinsic region along the waveguide propagation direction, so that the phase deviation caused by the diffusion of carriers can be suppressed, and the electrical crosstalk between adjacent phase shifters can be suppressed, thereby avoiding modulation signal distortion caused by the electrical crosstalk. As a result, the reliability and precision of the photonic integrated system can be improved.

A display apparatus includes a light unit to emit blue light, a first base substrate disposed on the light unit, a gate pattern disposed on the first base substrate and including a gate electrode, a first inorganic insulation layer disposed on the gate pattern, a data pattern disposed on the first inorganic insulation layer and including a drain electrode, a light blocking pattern disposed on the first inorganic insulation layer, a second inorganic insulation layer disposed on the data pattern and the first inorganic insulation layer, a pixel electrode disposed on the second inorganic insulation layer, and electrically connected to the drain electrode, a color conversion pattern overlapping the pixel electrode and including a quantum dot or phosphor, and a thin film transistor disposed on the first base substrate, wherein the light blocking pattern overlaps the thin film transistor, and the light blocking pattern is disposed on the first base substrate.

The present disclosure provides a quantum dot film including a plurality of quantum dot material layers arranged in stack, the plurality of quantum dot material layers having refractive indices gradually ascending along a thickness direction of the quantum dot film. The present disclosure further provides a color filter layer and a display device.

The present disclosure provides a quantum dot film including a plurality of quantum dot material layers arranged in stack, the plurality of quantum dot material layers having refractive indices gradually ascending along a thickness direction of the quantum dot film. The present disclosure further provides a color filter layer and a display device.

A method is provided for operating one or more one solid-state electro-optic device to provide an electrically switching shutter. The method includes forming an alternating stack of first semiconductor layers having a first dopant and second semiconductor layers having a second dopant to form at least one superlattice semiconductor device. The method further includes applying to the at least one superlattice semiconductor device a first voltage to induce a transparent state of the alternating stack such that light is transmitted through the alternating stack, and applying to the at least one superlattice semiconductor device a second voltage different from the first voltage to induce an opaque state of the alternating stack such that light is inhibited from passing through the alternating stack.

A method is provided for operating one or more one solid-state electro-optic device to provide an electrically switching shutter. The method includes forming an alternating stack of first semiconductor layers having a first dopant and second semiconductor layers having a second dopant to form at least one superlattice semiconductor device. The method further includes applying to the at least one superlattice semiconductor device a first voltage to induce a transparent state of the alternating stack such that light is transmitted through the alternating stack, and applying to the at least one superlattice semiconductor device a second voltage different from the first voltage to induce an opaque state of the alternating stack such that light is inhibited from passing through the alternating stack.

A method for on-silicon integration of a III-V-based material component includes providing a first substrate having a silicon-based optical layer including a waveguide, transferring a second substrate of III-V-based material on the optical layer, and forming the III-V component from the second substrate, so as to enable a coupling between the waveguide and the III-V component, by preserving a III-V-based material layer extending laterally. The method also includes forming by epitaxy from the III-V layer, an InP:Fe-based structure laterally bordering the III-V component, forming a layer including contacts configured to contact the III-V component, and transferring a third silicon-based substrate onto the layer including the contacts.

An optical device includes an active layer that includes at least two outer barriers and at least one coupled quantum well that is inserted between the at least two outer barriers. Each coupled quantum well includes at least three quantum well layers and at least two coupling barriers that are respectively provided between the at least three quantum well layers. Thicknesses of two quantum well layers disposed at opposite end portions of the at least three quantum well layers are less than a thickness of the other quantum well layer disposed between the two quantum well layers disposed at the opposite end portions. A bandgap of the two quantum well layers disposed at the opposite end portions may be higher than a bandgap of the other quantum well layer disposed between the two quantum well layers.

A photonic chip. In some embodiments, the photonic chip includes a waveguide; and an optically active device comprising a portion of the waveguide. The waveguide may have a first end at a first edge of the photonic chip; and a second end, and the waveguide may have, everywhere between the first end and the second end, a rate of change of curvature having a magnitude not exceeding 2,000/mm.sup.2.

A device, such as an electroabsorption modulator, can modulate a light intensity by controllably absorbing a selectable fraction of the light. The device can include a substrate. A waveguide positioned on the substrate can guide light. An active region positioned on the waveguide can receive guided light from the waveguide, absorb a fraction of the received light, and return a complementary fraction of the received light to the waveguide. Such absorption produces heat, mostly at an input portion of the active region. The input portion of the active region can be thermally coupled to the substrate, which can dissipate heat from the input portion, and can help avoid thermal runaway of the device. The active region can be thermally isolated from the substrate away from the input portion, which can maintain a relatively low thermal mass for the active region, and can increase efficiency when heating the active region.