Electrochromic devices and methods may employ the addition of a defect-mitigating insulating layer which prevents electronically conducting layers and/or electrochromically active layers from contacting layers of the opposite polarity and creating a short circuit in regions where defects form. In some embodiments, an encapsulating layer is provided to encapsulate particles and prevent them from ejecting from the device stack and risking a short circuit when subsequent layers are deposited. The insulating layer may have an electronic resistivity of between about 1 and 10.sup.8 Ohm-cm. In some embodiments, the insulating layer contains one or more of the following metal oxides: aluminum oxide, zinc oxide, tin oxide, silicon aluminum oxide, cerium oxide, tungsten oxide, nickel tungsten oxide, and oxidized indium tin oxide. Carbides, nitrides, oxynitrides, and oxycarbides may also be used.

A semiconductor device include: a first bus waveguide; a first silicon ring optically coupled to the first bus waveguide; a backup silicon ring optically coupled to the first bus waveguide; a first heater and a second heater configured to heat the first silicon ring and the backup silicon ring, respectively; and a first switch, where the first switch is configured to electrically couple the first silicon ring to a first radio frequency (RF) circuit when the first switch is at a first switching position, and is configured to electrically couple the backup silicon ring to the first RF circuit when the first switch is at a second switching position.

Methods are provided for fabricating electrochromic devices that mitigate formation of short circuits under a top bus bar without predetermining where top bus bars will be applied on the device. Devices fabricated using such methods may be deactivated under the top bus bar, or may include active material under the top bus bar. Methods of fabricating devices with active material under a top bus bar include depositing a modified top bus bar, fabricating self-healing layers in the electrochromic device, and modifying a top transparent conductive layer of the device prior to applying bus bars.

A method of manufacturing a stretched display panel includes: cutting the TFT substrate to a desired size; cutting the color filter substrate; forming an open-circuit line for open-circuiting a portion defined between a horizontal pixel line that is located at an end of the TFT substrate and another horizontal pixel line adjacent thereto in order to prevent electrical noise due to the horizontal pixel lines being introduced into the end of the TFT substrate exposed from the pixel exposure portion; and forming a reinforcement seal for covering the pixel exposure portion using a reinforcement material in order to prevent occurrence of short circuit due to introduction of foreign matter into a gap defined between the horizontal pixel line and the other horizontal pixel line and at the same time to increase rigidity of the pixel exposure portion.

A method of manufacturing a stretched display panel includes: cutting the TFT substrate to a desired size; cutting the color filter substrate; forming an open-circuit line for open-circuiting a portion defined between a horizontal pixel line that is located at an end of the TFT substrate and another horizontal pixel line adjacent thereto in order to prevent electrical noise due to the horizontal pixel lines being introduced into the end of the TFT substrate exposed from the pixel exposure portion; and forming a reinforcement seal for covering the pixel exposure portion using a reinforcement material in order to prevent occurrence of short circuit due to introduction of foreign matter into a gap defined between the horizontal pixel line and the other horizontal pixel line and at the same time to increase rigidity of the pixel exposure portion.

A method for manufacturing a display panel is disclosed. The method includes: forming a color filter and a transparent conductive film on a surface of a first substrate, the color filter being interposed between the first substrate and the transparent conductive film; forming an electrostatic protective layer on the other surface of the first substrate; forming another transparent conductive film on a second substrate; forming a light-valve molecular layer between the first substrate and the second substrate; performing a defect inspection in the display panel; and irradiating a laser onto the electrostatic protective layer when a defect is found in the display panel, such that a carbonization structure is formed in the electrostatic protective layer at a position corresponding to the defect.

An array substrate includes gate lines made of a first metal film, source lines made of a second metal film disposed such that a gate insulating film is interposed between the second metal film and the first metal film, the source lines extending to intersect the gate lines, auxiliary lines made of the first metal film, the auxiliary lines being arranged such that a pair of auxiliary lines sandwich the gate line therebetween and extending in parallel with the source lines to at least partly overlap the source lines, respectively, and bridge lines made of a third metal film disposed such that a first inter-layer film located opposite to the gate insulating film is interposed between the third metal film and the second metal film, the bridge lines being arranged to lie astride the gate lines, respectively, to electrically connect the source lines to pairs of the auxiliary lines.

A display device may include the following elements: a first substrate; a first polarizer; a second substrate overlapping the first substrate and overlapping the first polarizer; and a polarization structure positioned inside the second substrate, comprising a first polarization layer, and comprising a second polarization layer. The first polarization layer may be narrower than the second substrate in a first direction and may be positioned farther from or closer to the first polarizer than the second polarization layer. The second polarization layer may be narrower than the second substrate in the first direction.

Methods are provided for fabricating electrochromic devices that mitigate formation of short circuits under a top bus bar without predetermining where top bus bars will be applied on the device. Devices fabricated using such methods may be deactivated under the top bus bar, or may include active material under the top bus bar. Methods of fabricating devices with active material under a top bus bar include depositing a modified top bus bar, fabricating self-healing layers in the electrochromic device, and modifying a top transparent conductive layer of the device prior to applying bus bars.

The present application discloses a repairing method for abnormal pixel spots of a display panel and display apparatus, including steps: installing a polarizing plate between a display panel and a screen of a display apparatus, finding and marking abnormal pixel spots on the polarizing plate, and changing optical polarization structures at the abnormal pixel spots by using specific light rays.