A method of manufacturing a semiconductor device includes: providing a first photoresist pattern on a wafer; measuring an overlay of the first photoresist pattern; generating a first overlay model function by a first overlay regression analysis of the measured overlay; and generating a second overlay model function by a second overlay regression analysis of a difference between the measured overlay and the first overlay model function.

A light guide includes an incident surface provided at an end portion of the light guide in the longitudinal direction and upon which light emitted by a light source incidents; an emission surface being flat-shaped, the emission surface emitting the light that enters the light guide through the incident surface to an illumination target; a reflective surface having a parabolic shape to generate collimated light directed toward the emission surface by reflecting light from a focal point of the parabolic shape or light from a predetermined area including the focal point, and a light scatterer having a predetermined scattering area to scatter light that entered the light guide through the incident surface and reflect light that entered the light guide through the incident surface in a direction of the reflective surface. The emission surface includes a first emission surface that has a predetermined length from an end portion of the light guide facing the light source along the longitudinal direction, the emission surface being set to an angle at which, among the light scattered by the light scatterer, the collimated light generated by the reflective surface is totally reflected.

An optical system is described, in particular for a LIDAR device, which includes a lens array having a multitude of microlenses and a lens system for deflecting beams out of a scanning area or into the scanning area, the lens system being situated in the beam path between the scanning area and the lens array, the system including at least one wedge array having a multitude of wedge elements situated upstream or downstream from the lens array in the radiation direction, a number of wedge elements equaling a number of microlenses. A LIDAR device is also described.

An optical system is described, in particular for a LIDAR device, which includes a lens array having a multitude of microlenses and a lens system for deflecting beams out of a scanning area or into the scanning area, the lens system being situated in the beam path between the scanning area and the lens array, the system including at least one wedge array having a multitude of wedge elements situated upstream or downstream from the lens array in the radiation direction, a number of wedge elements equaling a number of microlenses. A LIDAR device is also described.

A droplet catcher includes a tube main body and baffles arranged along a length direction of the tube main body.

A light guide includes an incident surface provided at an end portion of the light guide in the longitudinal direction and upon which light emitted by a light source incidents; an emission surface being flat-shaped, the emission surface emitting the light that enters the light guide through the incident surface to an illumination target; a reflective surface having a parabolic shape to generate collimated light directed toward the emission surface by reflecting light from a focal point of the parabolic shape or light from a predetermined area including the focal point, and a light scatterer having a predetermined scattering area to scatter light that entered the light guide through the incident surface and reflect light that entered the light guide through the incident surface in a direction of the reflective surface. The emission surface includes a first emission surface that has a predetermined length from an end portion of the light guide facing the light source along the longitudinal direction, the emission surface being set to an angle at which, among the light scattered by the light scatterer, the collimated light generated by the reflective surface is totally reflected.

Overlay error of a lithographic process is measured using a plurality of target structures, each target structure having a known overlay bias. A detection system captures a plurality of images (740) representing selected portions of radiation diffracted by the target structures under a plurality of different capture conditions (1, 2). Pixel values of the captured images are combined (748) to obtain one or more synthesized images (750). A plurality of synthesized diffraction signals are extracted (744) from the synthesized image or images, and used to calculate a measurement of overlay. The computational burden is reduced compared with extracting diffraction signals from the captured images individually. The captured images may be dark-field images or pupil images, obtained using a scatterometer.

An image reading device includes light guides (5, 6) that emit light to an object to be read, a lens body (8) that condenses reflected light, a light receiver (13) that receives the reflected light, a sensor board (24) on which is mounted the light receiver (13), a lens holder (11), and a housing (9) that houses or holds these components. The lens holder (11) includes a holder bottom (11g), light guide positioners (11a, 11b) and lens body holders (11e, 11f). In the lens holder (11), the lens body (8) is attached between the lens body holders (11e, 11f), the sensor board (24) is attached to the holder bottom (11g) such that the light receiver (13) aligns with an optical axis of the lens body (8), and the light guides (5, 6) are attached to the light guide positioners (11a, 11b). A surface of each light guide positioner (11a, 11b) that faces the corresponding light guide (5, 6) to be attached has at least a portion having a same shape a s a shape of a surface of the light guide.

An optical system is described, in particular for a LIDAR device, which includes a lens array having a multitude of microlenses and a lens system for deflecting beams out of a scanning area or into the scanning area, the lens system being situated in the beam path between the scanning area and the lens array, the system including at least one wedge array having a multitude of wedge elements situated upstream or downstream from the lens array in the radiation direction, a number of wedge elements equaling a number of microlenses. A LIDAR device is also described.

An optical apparatus, which illuminates a first area with light from a light source while the first area is longer in a second direction intersecting a first direction than in the first direction, includes a collector optical member which is arranged in an optical path between the light source and the first area, and condenses the light from the light source to form a second area in a predetermined plane, the second area being longer in a fourth direction intersecting a third direction than in the third direction; and a first fly's eye optical member which is provided within the predetermined plane including the second area, and has a plurality of first optical elements guiding the light of the collector optical member to the first area.