A mirror element, in particular for a microlithographic projection exposure apparatus. According to one aspect, the mirror element includes a substrate (111, 112, 113, 114, 115, 211, 212, 213, 311a-311m, 411, 412, 413) and a layer stack (121, 122, 123, 124, 125, 221, 222, 223, 321a-321m, 421, 422, 423) on the substrate. The layer stack has at least one reflection layer system, wherein a curvature of the mirror element is generated on the basis of a setpoint curvature for a predetermined operating temperature by a non-vanishing bending force exerted by the layer stack, wherein the generated curvature varies by no more than 10% over a temperature interval (T) of at least 10 K.

A method of determining compatibility of a patterning device with a lithographic apparatus. The method includes determining an intensity distribution of a conditioned radiation beam across a sensor plane of an illumination system of the lithographic apparatus. The method further includes using the determined intensity distribution to calculate a non-uniformity of intensity caused by contamination and/or degradation of a collector. The method further includes determining the effect of the non-uniformity on a characteristic of an image of the patterned radiation beam. The method further includes determining the compatibility of the patterning device with the lithographic apparatus based on the effect of the non-uniformity on the characteristic.

In a substrate processing apparatus, an optical sensor is provided at a hand that transports a substrate to a processing unit, and an optical fiber is provided at a fixed member that has a certain positional relationship with a spin chuck in the processing unit. When the hand has a predetermined positional relationship with the spin chuck in the processing unit, the light emitted from a first light emitter of the optical sensor is received by a second light receiver of the optical fiber and guided to a second light emitter of the optical fiber, and the light emitted from the second light emitter is received by a first light receiver. A light receiving signal corresponding to an amount of light received by the first light receiver is output from the optical sensor.

A method involving a radiation intensity distribution for a target measured using an optical component at a gap from the target, the method including: determining a value of a parameter of interest using the measured radiation intensity distribution and a mathematical model describing the target, the model including an effective medium approximation for roughness of a surface of the optical component or a part thereof.

A light source module of a photo printer includes a first micro light source, a second micro light source, a rod lens array and a microlens. The first micro light source emits a first light beam. The second micro light source emits a second light beam. The rod lens array is arranged between the first micro light source, the second micro light source and a film paper. The microlens is arranged between the first micro light source, the second micro light source and the rod lens array. The microlens is used for converging the projection angles of the first light beams and the second light beam. The microlens has an optical axis. The second micro light source is arranged along the optical axis. The first micro light source is arranged beside a first side of the optical axis.

A light source module of a photo printer includes a first micro light source, a second micro light source, a rod lens array and a microlens. The first micro light source emits a first light beam. The second micro light source emits a second light beam. The rod lens array is arranged between the first micro light source, the second micro light source and a film paper. The microlens is arranged between the first micro light source, the second micro light source and the rod lens array. The microlens is used for converging the projection angles of the first light beams and the second light beam. The microlens has an optical axis. The second micro light source is arranged along the optical axis. The first micro light source is arranged beside a first side of the optical axis.

A projection optical unit images an object field in an image field. The projection optical unit includes a plurality of mirrors guides imaging light from the object field to the image field. At least two of the mirrors are arranged directly behind one another in the beam path of the imaging light for grazing incidence with an angle of incidence of the imaging light which is greater than 60. This results in an imaging optical unit that can exhibit a well-corrected imageable field with, at the same time, a high imaging light throughput.

The present invention provides a detection apparatus for detecting a plurality of marks provided on a substrate, comprising: an optical system; an illumination unit configured to selectively illuminate the plurality of marks with a plurality of light beams via the optical system such that each of the plurality of marks is illuminated with at least one light beam; and an image capturing device configured to capture an image of the plurality of marks via the optical system, wherein the illumination unit includes a change unit configured to individually change an incident angle of each of the plurality of light beams on a pupil plane of the optical system, thereby changing an irradiated position of each of the plurality of light beams on the substrate.

An objective of the present disclosure is to obtain a light guide and an image reading apparatus capable of efficiently irradiating an object to be irradiated (1). The light guide and the image reading apparatus include a rod-shaped light guide main body (2) extending in the longitudinal direction, a first end face (3) that is an end face of the light guide main body (2) along the transverse direction, a light scattering pattern (5) that scatters light that enters from the first end face (3) and is guided inside the light guide main body (2), and a light emission surface portion (6) formed on the light guide main body along a longitudinal direction, the light emission surface portion (6) being a surface from which the light scattered at the light scattering pattern (5) is emitted to outside the light guide main body (2) after being reflected on a wall surface of the light guide main body (2). The light emission surface portion (6) includes a first light emission surface (6a) that is disposed near the first end face (3) in the longitudinal direction and a second light emission surface (6b) that is contiguous with the first light emission surface (6a) in the longitudinal direction. A width of the first light emission surface (6a) in the transverse direction is shorter than a width of the second light emission surface (6b) in the transverse direction.

An optical system, in particular for a microlithographic projection exposure apparatus, with at least one mirror (200) which has an optically effective surface and, for electromagnetic radiation of a predefined operating wavelength impinging on the optically effective surface at an angle of incidence of at least 65 relative to the respective surface normal, has a reflectivity of at least 0.5. The mirror has a reflection layer (210) and a compensation layer (220) which is arranged above this reflection layer (210) in the direction of the optically effective surface. The compensation layer (220), for an intensity distribution generated in a pupil plane or a field plane of the optical system during operation thereof, reduces the difference between the maximum and the minimum intensity value by at least 20% compared to an analogous structure without the compensation layer.