An image reading apparatus includes a platen, a copyholder pressed against a reading surface of a document placed on the platen, and a placing part movably provided, on which a non-pressed portion of the document that is not pressed by the copyholder is placed.

An image reading apparatus includes a platen, a copyholder pressed against a reading surface of a document placed on the platen, and a placing part movably provided, on which a non-pressed portion of the document that is not pressed by the copyholder is placed.

The invention relates to a method for correcting at least one error on wafers processed by at least one photolithographic mask, the method comprises: (a) measuring the at least one error on a wafer at a wafer processing site, and (b) modifying the at least one photolithographic mask by introducing at least one arrangement of local persistent modifications in the at least one photolithographic mask.

A supporting member on which a wafer table is mounted is substantially kinematically supported, via six rod members placed on a slider. Further, coupling members are placed facing in a non-contact manner via a predetermined gap, thin plate-shaped edges provided at both ends in the Y-axis direction of the supporting member. By this arrangement, vibration-damping is performed by the coupling members (squeeze dampers) facing the edges, on vibration of the supporting member mounted on the wafer table. Further, because the supporting member is kinematically supported via the plurality of rod members, it becomes possible to reduce deformation of the wafer table that accompanies deformation of the slider.

An image reading device includes: a platen on which a document is placed; a platen cover openable and closable with respect to the platen; a cover-open sensor which detects a fact that the open/close angle of the platen cover has passed a predetermined angle from a close state; a CCD line sensor including charge coupled devices (CCD) arranged for recording a variation in distribution for a fixed period of time of incident light when detecting passing of the platen cover; a variation amount calculator which calculates a variation amount of incident light at each distribution point on the basis of a variation in distribution recorded by the CCD line sensor; and a variation amount determination unit which determines whether or not a variation amount calculated by the variation amount calculator exceeds a predetermined threshold.

An image reading device includes: a platen on which a document is placed; a platen cover openable and closable with respect to the platen; a cover-open sensor which detects a fact that the open/close angle of the platen cover has passed a predetermined angle from a close state; a CCD line sensor including charge coupled devices (CCD) arranged for recording a variation in distribution for a fixed period of time of incident light when detecting passing of the platen cover; a variation amount calculator which calculates a variation amount of incident light at each distribution point on the basis of a variation in distribution recorded by the CCD line sensor; and a variation amount determination unit which determines whether or not a variation amount calculated by the variation amount calculator exceeds a predetermined threshold.

A method for fabricating a pellicle assembly for a lithography process includes fabricating a pellicle frame including a sidewall having a porous material. In some embodiments, the pellicle frame is subjected to an anodization process to form the porous material. The porous material includes a plurality of pore channels extending, in a direction perpendicular to an exterior surface of the sidewall, from the exterior surface to an interior surface of the sidewall. In various embodiments, a pellicle membrane is formed, and the pellicle membrane is attached to the pellicle frame such that the pellicle membrane is suspended by the pellicle frame. Some embodiments disclosed herein further provide a system including a membrane and a pellicle frame that secures the membrane across the pellicle frame. In some examples, a portion of the pellicle frame includes a porous material, where the porous material includes the plurality of pore channels.

A portable image-forming device includes a housing, an exposure member for exposing an instant film disposed inside of the housing by means of a light radiating from the screen of a portable display device, a shading member linked in movement with the exposure member so as to shade the instant film, a traction member connected to the exposure member so as to move the exposure member to a pre-exposure position, and a developing-agent-spreading member for spreading a developing agent, which is provided on the instant film, over the entire instant film. The traction member and the developing-agent-spreading member are manually operated by a user.

An image scanning device includes a placement-area image data capturing unit that captures placement-area image data corresponding to an area where documents are placed on a platen, a document image data capturing unit that captures pieces of document image data, each of which corresponds to one of the documents, and acquires positions of the pieces of document image data, in accordance with the placement-area image data captured by the placement-area image data capturing unit, a placement order acquiring unit that acquires an order in which the documents, each of which corresponds to one of the pieces of document image data, have been placed in accordance with at least the positions of the pieces of document image data, each of which corresponds to one of the documents, and a sequencing unit that assigns to the pieces of document image data the order acquired by the placement order acquiring unit.

An extreme ultraviolet lithography (EUVL) system is disclosed. The system includes an extreme ultraviolet (EUV) mask with three states having respective reflection coefficient is r.sub.1, r.sub.2 and r.sub.3, wherein r.sub.3 is a pre-specified value that is a function of r1 and r2. The system also includes a nearly on-axis illumination (ONI) with partial coherence less than 0.3 to expose the EUV mask to produce diffracted light and non-diffracted light. The system further includes a projection optics box (PUB) to remove a portion of the non-diffracted light and to collect and direct the diffracted light and the remaining non-diffracted light to expose a target.