Provided is an adhesive composition that enables, in assembling a camera module, sufficient curing of a site where ultraviolet rays do not reach, while the adhesive is being cured; and that can reduce or prevent a change in the distance between a lens and an image sensor in a heating step, when a lens holder is adhered to a substrate having the image sensor fixed thereon. A thermal- and UV-curing adhesive composition contains (a) an epoxy (meth)acrylate resin; (b) a (meth)acrylic acid ester; (c) a heat-curing agent; and (d) a photopolymerization initiator, wherein the epoxy (meth)acrylate resin (a) contains 20% by weight or more of a (meth)acryloyl group based on the total weight of the resin, and the weight ratio of the epoxy (meth)acrylate resin (a) to the (meth)acrylic acid ester (b) (a)/(b) is from 30/70 to 70/30.

A photoresist composition is provided, which comprises a cationic polymerization resin, a resin A, a photoacid generator, and a solvent, wherein the resin A comprises at least one resin selected from the group consisting of polyester resins and polyether resins and is soluble in a ketone-based organic solvent.

The present invention is a negative-acting photosensitive resin composition including (A) a compound having a triazine ring and represented by formula (1) (in formula (1), each R.sub.1 independently represents an organic group, wherein at least one R.sub.1 represents an organic group having a glycidyl group or an organic group having an oxetanyl group), (B) an epoxy resin having in each molecule a benzene backbone and at least two epoxy groups and having an epoxy equivalent weight of not more than 500 g/eq., and (C) a cationic photopolymerization initiator. The content of the (A) compound represented by formula (1) with reference to the (B) epoxy resin is 1 to 50 mass %. The (B) epoxy resin satisfies at least one of the following conditions (i) and (ii): condition (i) a weight-average molecular weight of at least 500, and condition (ii) a softening point of at least 40° C.

##STR00001##

The present invention provides a negative type photosensitive resin composition having high sensitivity, excellent halftone characteristics, capability to form a small tapered pattern shape, and alkali-developability. The negative type photosensitive resin composition includes, as an alkali-soluble resin (A), at least a weakly acidic group-containing resin (A1) and an unsaturated group-containing resin (A2), the weakly acidic group-containing resin (A1) containing an acidic group having an acid dissociation constant in the range of 13.0 to 23.0 in dimethyl sulfoxide, and the unsaturated group-containing resin (A2) containing an ethylenically unsaturated double bond group.

Disclosed is a photosensitive resin composition for an optical waveguide containing a resin component and a photoacid generator. In the photosensitive resin composition, the resin component is constituted of an epoxy resin component containing both an aromatic epoxy resin and an aliphatic epoxy resin, and the content of the aromatic epoxy resin is 55 wt. % or more and less than 80 wt. % of the entirety of the epoxy resin component and the content of the aliphatic epoxy resin is more than 20 wt. % and 45 wt. % or less of the entirety of the epoxy resin component. Accordingly, for example, when a core layer of an optical waveguide is formed using the disclosed photosensitive resin composition for an optical waveguide, a core layer of an optical waveguide having satisfactorily low tackiness and high transparency while maintaining satisfactory roll-to-roll compatibility and a high resolution patterning property can be formed.

Provided is an adhesive composition that enables, in assembling a camera module, sufficient curing of a site where ultraviolet rays do not reach, while the adhesive is being cured; and that can reduce or prevent a change in the distance between a lens and an image sensor in a heating step, when a lens holder is adhered to a substrate having the image sensor fixed thereon. A thermal- and UV-curing adhesive composition contains (a) an epoxy (meth)acrylate resin; (b) a (meth)acrylic acid ester; (c) a heat-curing agent; and (d) a photopolymerization initiator, wherein the epoxy (meth)acrylate resin (a) contains 20% by weight or more of a (meth)acryloyl group based on the total weight of the resin, and the weight ratio of the epoxy (meth)acrylate resin (a) to the (meth)acrylic acid ester (b) (a)/(b) is from 30/70 to 70/30.

A purpose of the present invention is to provide a photosensitive resin composition which retains satisfactory image resolution and gives cured objects reduced in wet-heat dissolution or contamination and having satisfactory wet-heat adhesiveness. The photosensitive resin composition of the present invention comprises: (A) a cationic photopolymerization initiator which comprises a salt of a cation with an anion represented by formula (1) (wherein R.sub.1 to R.sub.4 each independently represent a C1.sub.-18 alkyl or C.sub.6-14 aryl group, provided that at least one of R.sub.1 to R.sub.4 represents a C.sub.6-14 aryl group); and (B) an epoxy compound. R.sub.1 to R.sub.4 may be each independently either a phenyl group having one or more perfluoroalkyl groups as substituents or a phenyl group having one or more fluorine atoms as substituents. R.sub.1 to R.sub.4 may be each independently a pentafluorophenyl or bis(trifluoromethyl)phenyl group.

##STR00001##

Methods and systems for creating photosensitive dry film sheets are disclosed. The systems and methods described herein may include exposing a resin comprising a photoacid generator to at least one of 325-425 nm ultraviolet radiation and X-ray radiation, generating, with the photoacid generator, an acid upon exposure to the at least one of the X-ray radiation and the 325-425 nm ultraviolet radiation. The systems and methods described herein may then include heating the exposed resin and cross-linking the exposed resin with the acid.

The present invention relates to a method for manufacturing a clich for offset printing and a clich for offset printing.

A three-dimensional (3D) structure for handling fluids, a fluid handling device containing the 3D structure, and a method of making the 3D structure. The method includes providing a composite photoresist material that includes: (a) a first layer devoid of a hydrophobicity agent and (b) at least a second layer comprising the hydrophobicity agent. The composite photoresist material is devoid of an adhesion promotion layer between layers of the composite photoresist material.