Patent classifications
G03F7/0754
Photosensitive resin composition and application thereof
A photosensitive resin composition includes an alkali-soluble resin (A), a compound having an unsaturated vinyl group (B), a photo initiator (C), solvent (D) and a silane compound (E) having a structure shown as formula (I): ##STR00001## in the formula (I), A individually and independently represents a single bond, an alkylene group, or an arylene group, B individually and independently represents an organic group having diphenyl phosphine, hydrogen atom, an alkyl group, an aryl group, or OR, in which R is a C1-C6 alkyl group or a phenyl group, at least one B is the organic group having diphenyl phosphine and at least one B is OR. When B is OR, A connected to B is the single bond. A film formed by the photosensitive resin composition has good refractivity and adhesivity to molybdenum.
PHOTOSENSITIVE RESIN COMPOSITION AND APPLICATION THEREOF
A photosensitive resin composition includes an alkali-soluble resin (A), a compound having an unsaturated vinyl group (B), a photo initiator (C), solvent (D) and a silane compound (E) having a structure shown as formula (I):
##STR00001## in the formula (I), A individually and independently represents a single bond, an alkylene group, or an arylene group, B individually and independently represents an organic group having diphenyl phosphine, hydrogen atom, an alkyl group, an aryl group, or OR, in which R is a C1-C6 alkyl group or a phenyl group, at least one B is the organic group having diphenyl phosphine and at least one B is OR. When B is OR, A connected to B is the single bond. A film formed by the photosensitive resin composition has good refractivity and adhesivity to molybdenum.
PHOTOSENSITIVE SURFACE TREATING AGENT, PATTERN FORMATION SUBSTRATE, LAMINATE, TRANSISTOR, PATTERN FORMING METHOD AND METHOD OF PRODUCING TRANSISTOR
A photosensitive surface treating agent containing a compound represented by the following Formula (M1). (In Formula (M1), R.sup.1 is a hydrogen atom, a tert-butoxycarbonyl group or an ester-based protecting group, R.sup.2 is a hydrogen atom or an alkyl group having 1 to 6 carbon atoms, m is an integer of 1 or more, and X is a halogen atom or an alkoxy group.
##STR00001##