A pattern formed body, including a cured resin layer 12 having a low surface free energy region a and a high surface free energy region b on a base 11, in which a difference in surface free energy between the low surface free energy region a and the high surface free energy region b is greater than 6 mJ/m.sup.2, and the low surface free energy region a and the high surface free energy region b are optically leveled surfaces. Accordingly, an ink is applied on the pattern formed body to easily color code.

A method of manufacturing a laminate, transistor, and method of manufacturing transistor using a composition that includes an organic compound having a hydroxy group; a first cross-linking agent that is at least one organic silicon compound selected from the group including an organic silicon compound including a siloxane bond in the molecule and having three or more cyclic ether groups in the molecule, a chain organic silicon compound including two or more siloxane bonds in the molecule and having two or more cyclic ether groups in the molecule, a cyclic organic silicon compound including D unit in the molecule and having four or more cyclic ether groups bonded to a silicon atom of the D unit in the molecule, and a cyclic organic silicon compound including a T unit in the molecule and having two or more cyclic ether groups in the molecule; and a photocationic polymerization initiator.

A photosensitive resin composition for forming an interlayer insulating film, which contains an alkali-soluble resin (A), a photosensitizer (B), a thermal acid generator (T) which generates an acid when heated, and a silane coupling agent (C), and wherein the alkali-soluble resin (A) has a constituent unit (A1) represented by general formula (a-1) or an alicyclic epoxy group-containing unit (A3). In general formula (a-1), R represents a hydrogen atom or a methyl group; and Ra.sup.01 represents a hydrogen atom or an organic group having a hydroxyl group.

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What is provided is a pattern forming method for forming a pattern on a surface to be processed of an object, the method including: a first layer forming step of forming a first layer containing a compound having a protective group that is decomposable by an acid and also decomposable by light, on the surface to be processed; a second layer forming step of forming a second layer containing a photoacid generator that is configured to generate an acid by exposure, on the first layer; an exposure step of exposing the first layer and the second layer to form a latent image including an exposed region and an unexposed region, on the first layer; and a disposition step of disposing a pattern forming material in the exposed region or the unexposed region.

There is provided a method of forming a patterned structure on a substrate. The method includes: forming a resist layer on the substrate, the resist layer being a negative tone resist; exposing a first portion of the resist layer to a focused electron beam to form a modified first portion, the modified first portion defining a boundary of a second portion of the resist layer; performing a plasma treatment on a surface of the resist layer, including on a surface of the second portion of the resist layer to form a modified surface portion of the second portion of the resist layer, resulting in a plasma treated resist layer; and performing development of the plasma treated resist layer to form the patterned structure on the substrate corresponding the second portion of the resist layer.

A composition for forming a metal-containing film, the composition including: a compound (A) which is at least one selected from the group consisting of: a compound (a1) containing a cationic functional group containing at least one of a primary nitrogen atom or a secondary nitrogen atom, and a compound (a2) which is a compound other than the compound (a1) and which contains a nitrogen atom; and a compound (B) which is at least one selected from the group consisting of: a compound (b1) containing a carboxy group and at least one of a germanium atom, a tin atom, a selenium atom or a zirconium atom, and an ester of the compound (b1).

Provided are photocurable resins comprising a poly(siloxane)-based copolymer together with a photoinitiator, and other optional ingredients such as a photocurable diluent, a photoabsorber, a photosensitizer, or a hydrophillic additive. Also provided are methods of stereolithographically printing a 3-D object from a disclosed resin. Also provided is an improved method for stereolithographically printing a 3-D object, the improvement comprising the use of a disclosed photocurable resin. Further provided is a 3-D microfluidic device such as an artificial lung prepared from a disclosed photocurable resin.

A photosensitive composition contains a black pigment, a resin, a polymerizable compound, and a photopolymerization initiator, in which the black pigment includes a coated particle which includes a metal-containing particle consisting of a nitride or oxynitride of one or more metals selected from the group consisting of zirconium, vanadium, and niobium, and a metal oxide coating layer consisting of a metal oxide, with which the metal-containing particle is coated.

There is provided a multi-layered coating having a plurality of cavities therein, the multi-layered coating comprises a first layer comprising an oxide-containing polymer; and a second layer disposed on said first layer, said second layer comprising an oxide. There is also provided a process for forming such multi-layered coating, an article comprising the multi-layered coating and uses thereof.

Carbon-carbon unsaturated bond containing, halogen containing, and solubility-enhancer containing coatings on semiconductor substrates for forming patterns thereon. The present coatings can be produced by coating of semiconductor substrates with carbon-carbon unsaturated bond-containing, halogen-containing, and solubility-enhancer containing polyhydrogensilsesquioxane resin solutions. Provided herein is also a method for patterning substrate coating of a polyhydrogensilsesquioxane containing a carbon-carbon unsaturated bond, halogen, and solubility-enhancer with radiation of light, the method comprising the steps of irradiating a coated substrate along a selected pattern to form an irradiated structure with a region of irradiated coating and a region with un-irradiated coating and selectively developing the irradiated structure to remove a substantial portion of the un-irradiated coating to form a patterned substrate.