In at least one embodiment of a method for forming a pattern having a hollow structure, a light-absorbing layer capable of absorbing light is formed on a surface of a photosensitive resin film. Subsequently, a substrate having a protrusion and the photosensitive resin film are bonded together so that the protrusion and the light-absorbing layer come into contact with each other. Then, the photosensitive resin film and the light-absorbing layer are patterned at one time by photolithography.

In at least one embodiment of a method for forming a pattern having a hollow structure, a light-absorbing layer capable of absorbing light is formed on a surface of a photosensitive resin film. Subsequently, a substrate having a protrusion and the photosensitive resin film are bonded together so that the protrusion and the light-absorbing layer come into contact with each other. Then, the photosensitive resin film and the light-absorbing layer are patterned at one time by photolithography.

A printed wiring board includes a laminated base material including an insulating layer and a conductor layer formed on the insulating layer, and a solder resist layer laminated on the laminated material and including photosensitive resin. The resist layer has surface portion and portion in contact with the laminated material, the conductor layer has pattern including conductor pads in contact with the resist layer such that the pads are positioned in openings in the resist layer, and the resist layer satisfies a first condition that a chemical species derived from a photopolymerization initiator has concentration higher in the portion in contact with the laminated material than concentration in the surface portion and/or a second condition that the chemical species derived from the initiator in the portion in contact with the laminated material has photopolymerization initiating ability higher than a chemical species derived from a photopolymerization initiator in the surface portion.

To provide a photosensitive resin composition which is capable of forming a pattern with high resolution and obtaining a cured film having excellent heat resistance and cracking resistance, and is also alkali developable; and a method capable of shortening the step required to remove a cured film of the composition after formation of an impurity region on a semiconductor substrate; and a method for manufacturing a semiconductor device using the same. Disclosed is a photosensitive resin composition including a polysiloxane (A), wherein the polysiloxane (A) is a polysiloxane represented by the general formula (1), and wherein (X) and (Y) are represented by the general formulas (4) to (6).

7.5≦(X)≦75  (4)

2.5≦(Y)≦40  (5)

1.5×(Y)≦(X)≦3×(Y)  (6)

##STR00001##

To provide a photosensitive resin composition which is capable of forming a pattern with high resolution and obtaining a cured film having excellent heat resistance and cracking resistance, and is also alkali developable; and a method capable of shortening the step required to remove a cured film of the composition after formation of an impurity region on a semiconductor substrate; and a method for manufacturing a semiconductor device using the same. Disclosed is a photosensitive resin composition including a polysiloxane (A), wherein the polysiloxane (A) is a polysiloxane represented by the general formula (1), and wherein (X) and (Y) are represented by the general formulas (4) to (6).

7.5≦(X)≦75  (4)

2.5≦(Y)≦40  (5)

1.5×(Y)≦(X)≦3×(Y)  (6)

##STR00001##

The composition contains a compound represented by Formula 1, a binder polymer, a photopolymerization initiator, and a monomer having a carboxy group, in which the content of the compound represented by Formula 1 is 5% by mass or more and less than 50% by mass with respect to the total mass of monomer components, and in Formula 1, Q.sup.1 and Q.sup.2 each represent a (meth)acryloyloxy group, and R.sup.1 represents a divalent linking group having a chain-like structure.

Q.sup.2-R.sup.1-Q.sup.1  (1)

The composition contains a compound represented by Formula 1, a binder polymer, a photopolymerization initiator, and a monomer having a carboxy group, in which the content of the compound represented by Formula 1 is 5% by mass or more and less than 50% by mass with respect to the total mass of monomer components, and in Formula 1, Q.sup.1 and Q.sup.2 each represent a (meth)acryloyloxy group, and R.sup.1 represents a divalent linking group having a chain-like structure.

Q.sup.2-R.sup.1-Q.sup.1  (1)

A nanoimprint lithography method includes disposing a pretreatment composition on a nanoimprint lithography substrate to form a pretreatment coating, and disposing discrete portions of imprint resist on the pretreatment coating, each discrete portion of the imprint resist covering a target area of the nanoimprint lithography substrate. The imprint resist is a polymerizable composition and includes a polymerization initiator. A composite polymerizable coating is formed on the nanoimprint lithography substrate as each discrete portion of the imprint resist spreads beyond its target area. The composite polymerizable coating is contacted with a nanoimprint lithography template. The polymerization initiator is activated, and the composite polymerizable coating is polymerized to yield a composite polymeric layer and an uncured portion of the pretreatment coating on the nanoimprint lithography substrate. After polymerizing the composite polymerizable coating to yield the composite polymeric layer, the uncured portion of the pretreatment coating is polymerized.

The present invention aims to provide a flexographic printing original plate which exhibits improved sustainability of the ability of preventing the plate surface from staining. According to the present invention, there is provided a water-developable flexographic printing original plate including at least a support and a photosensitive resin layer provided on the support, in which the photosensitive resin layer contains a water-dispersible latex, a photopolymerizable unsaturated compound, a photopolymerization initiator, and a silicone compound. When the water-dispersible latex is one or more latex rubbers selected from the group consisting of polybutadiene rubber and poly(nitrile-butadiene) rubber, the silicone compound is a silicone compound having an amino group in the molecule and has a refractive index of 1.44 to 1.60. When the water-dispersible latex is poly(styrene-butadiene) rubber, the silicone compound is a silicone compound having an amino group in the molecule and has a refractive index of 1.47 to 1.63.

The present invention aims to provide a flexographic printing original plate which exhibits improved sustainability of the ability of preventing the plate surface from staining. According to the present invention, there is provided a water-developable flexographic printing original plate including at least a support and a photosensitive resin layer provided on the support, in which the photosensitive resin layer contains a water-dispersible latex, a photopolymerizable unsaturated compound, a photopolymerization initiator, and a silicone compound. When the water-dispersible latex is one or more latex rubbers selected from the group consisting of polybutadiene rubber and poly(nitrile-butadiene) rubber, the silicone compound is a silicone compound having an amino group in the molecule and has a refractive index of 1.44 to 1.60. When the water-dispersible latex is poly(styrene-butadiene) rubber, the silicone compound is a silicone compound having an amino group in the molecule and has a refractive index of 1.47 to 1.63.