Provided are a resin composition including a coloring material, a resin, and a solvent, in which the resin includes a resin having a structure represented by Formula (1); a film formed of the resin composition; an optical filter; a solid-state imaging element; and an image display device. In Formula (1), Z.sup.1 represents an (m+n)-valent linking group, Y.sup.1 and Y.sup.2 each independently represent a single bond or a divalent linking group, A.sup.1 represents a group including a coloring material adsorption portion, P.sup.1 represents a polymer chain, n represents 1 to 20, m represents 1 to 20, and m+n represents 2 to 21, and in a case where m is 1, the polymer chain represented by P.sup.1 includes a repeating unit having an oxetane group, and in a case where m is 2 or more, at least one polymer chain of m pieces of polymer chains represented by P.sup.1 includes a repeating unit having an oxetane group.

[A.sup.1-Y.sup.1.sub.nZ.sup.1Y.sup.2-P.sup.1].sub.m  (1)

A single layer process is utilized to reduce swing effect interference and reflection during imaging of a photoresist. An anti-reflective additive is added to a photoresist, wherein the anti-reflective additive has a dye portion and a reactive portion. Upon dispensing the reactive portion will react with underlying structures to form an anti-reflective coating between the underlying structure and a remainder of the photoresist. During imaging, the anti-reflective coating will either absorb the energy, preventing it from being reflected, or else modify the optical path of reflection, thereby helping to reduce interference caused by the reflected energy.

The present application relates to a binder resin including a compound represented by Formula 1-1 and a compound represented by the following Formula 1-2, a negative-type photosensitive resin composition, and a display device including a black bank formed by using the same.

Provided is a pattern-forming composition, including: an infrared absorbing colorant; and at least one compound selected from the group consisting of a resin having a glass transition temperature of 150° C. to 300° C. and a precursor of a resin having a glass transition temperature of 150° C. to 300° C.

Provided are a photosensitive resin composition including: a binder; a polymerizable monomer; a polymerization initiator; a pigment; and a solvent, in which the polymerizable monomer includes a difunctional polymerizable monomer having a molecular weight equal to or smaller than 500, and a content of the difunctional polymerizable monomer having a molecular weight equal to or smaller than 500 is equal to or greater than 50% by mass with respect to a total mass of the polymerizable monomer, a transfer film, a decorative pattern, and a touch panel.

Provided are a photosensitive resin composition including: a binder; a polymerizable monomer; a polymerization initiator; a pigment; and a solvent, in which the polymerizable monomer includes a difunctional polymerizable monomer having a molecular weight equal to or smaller than 500, and a content of the difunctional polymerizable monomer having a molecular weight equal to or smaller than 500 is equal to or greater than 50% by mass with respect to a total mass of the polymerizable monomer, a transfer film, a decorative pattern, and a touch panel.

[Problem] To provide a negative type photosensitive composition which can be developed with a low-concentration developer. [Means for Solution] A negative type photosensitive composition comprising (I) an alkali-soluble resin having a carboxyl group, (II) a polymerization initiator, (III) a compound containing two or more (meth)acryloyloxy groups, and (IV) a solvent, wherein the content of the compound containing two or more (meth)acryloyloxy groups is 40 to 300 mass % based on the total mass of the alkali-soluble resin.

[Problem] To provide a negative type photosensitive composition which can be developed with a low-concentration developer. [Means for Solution] A negative type photosensitive composition comprising (I) an alkali-soluble resin having a carboxyl group, (II) a polymerization initiator, (III) a compound containing two or more (meth)acryloyloxy groups, and (IV) a solvent, wherein the content of the compound containing two or more (meth)acryloyloxy groups is 40 to 300 mass % based on the total mass of the alkali-soluble resin.

The present invention relates to a structure for a quantum dot barrier rib and a process for preparing the same. The structure for a quantum dot barrier rib of the present invention comprises a cured film having a uniform film thickness and an appropriate range of film thickness. Here, the reflectance R.sub.SCI measured by the SCI (specular component included) method and the reflectance R.sub.SCE measured by the SCE (specular component excluded) method are reduced, and the ratio between them (R.sub.SCE/R.sub.SCI) is appropriately adjusted, so that it is possible to satisfy such characteristics as high light-shielding property and low reflectance at the same time while the resolution and pattern characteristics are maintained to be excellent. In addition, when the structure for a quantum dot barrier rib is prepared, it is possible to form a multilayer pattern having a uniform film thickness suitable for the quantum dot barrier ribs in a single development process. Thus, it can be advantageously used for a quantum dot display.

Provided are a photosensitive composition including a colorant A, a photopolymerization initiator B, a polymerizable compound C, and a compound D which is a salt of an anion and a di- or higher valent cation having a formula weight or molecular weight of 1000 or less and has a specific absorbance of 5 or less, the specific absorbance being at a maximum absorption wavelength in a wavelength range of 400 to 700 nm; a film formed of the photosensitive composition; and a color filter, a solid-state imaging element, and an image display device, which includes the film.