Provided is a photosensitive coloring composition comprising a pigment, an amine compound having two or more cyclic amino groups in a molecule, a resin, and a photopolymerization initiator, in which a content of the pigment is 40% by mass or more with respect to a total solid content of the photosensitive coloring composition; a cured substance of the photosensitive coloring composition; a color filter including the cured substance; a solid-state imaging element; or an image display device.

A method of manufacturing a semiconductor device includes forming a first layer including an organic material over a substrate. A second layer including a reaction product of a silicon-containing material and a photoacid generator is formed over the first layer. A photosensitive layer is formed over the second layer, and the second layer is patterned.

A method of manufacturing a semiconductor device includes forming a first layer including an organic material over a substrate. A second layer including a reaction product of a silicon-containing material and a photoacid generator is formed over the first layer. A photosensitive layer is formed over the second layer, and the second layer is patterned.

A device having color resists pattern and method for manufacturing are disclosed. The device includes a substrate, at least two color resist layers. The at least color resist layers are formed on the curved and construct a visible pattern, wherein at a boundary of the color resist pattern, the at least two color resist layers form a ramp structure and each of the at least two color resist layers contacts the substrate; and the ramp structure is formed in sequential order by one exposure process, one removal process and one baking process of the at least two color resist layers.

A device having color resists pattern and method for manufacturing are disclosed. The device includes a substrate, at least two color resist layers. The at least color resist layers are formed on the curved and construct a visible pattern, wherein at a boundary of the color resist pattern, the at least two color resist layers form a ramp structure and each of the at least two color resist layers contacts the substrate; and the ramp structure is formed in sequential order by one exposure process, one removal process and one baking process of the at least two color resist layers.

A compound, a photosensitive resin composition including the same, a color filter manufactured using the photosensitive resin composition, and a CMOS image sensor including the color filter, the compound being represented by Chemical Formula 1:

A-L-B.  [Chemical Formula 1]

Provided is a composition with which a pattern having excellent adhesiveness can be formed. In addition, provided are a film, an infrared transmitting filter, a solid image pickup element, an image display device, and an infrared sensor. This composition includes a coloring material, a resin, a polymerizable compound, and a photopolymerization initiator. The polymerizable compound includes a compound A having an alkyleneoxy group and three ethylenically unsaturated groups, and a ratio A/B of a minimum value A of an absorbance of the composition in a wavelength range of 400 to 750 nm to a maximum value B of an absorbance of the composition in a wavelength range of 1100 to 1300 nm is 4.5 or higher.

Provided are a near-infrared absorbing photosensitive composition including at least one oxocarbon compound selected from a compound represented by Formula (SQ1) or a compound represented by Formula (CR1), a polymerizable compound, a photopolymerization initiator, and a solvent; a cured film formed of the near-infrared absorbing photosensitive composition; an optical filter; a method for forming a pattern; a laminate; a solid-state imaging element; an image display device; and an infrared sensor. In Formula (SQ1), Rs.sup.1 and Rs.sup.2 each independently represent a monovalent organic group. In Formula (CR1), Rc.sup.1 and Rc.sup.2 each independently represent a monovalent organic group. ##STR00001##

An object of the present invention is to provide a colored curable resin composition for forming an optical filter in which the occurrence of foreign matter is reduced. The present invention relates to a colored curable resin composition containing a colorant, a resin, a polymerizable compound, and a polymerization initiator, wherein the colorant is a colorant containing a compound represented by formula (I) or formula (II).

##STR00001##

A black material of the present invention consists of a zirconium nitride powder containing yttrium. The amount of the yttrium is 1.0% by mass to 12.0% by mass with respect to a total 100% by mass of the zirconium nitride powder and the yttrium. In a transmission spectrum obtained from a dispersion in which the concentration of the zirconium nitride powder containing yttrium is 50 ppm, assuming that the light transmittance at a wavelength of 550 nm is denoted by X.sub.1, and the light transmittance at a wavelength of 365 nm is denoted by X.sub.2, X.sub.1 is 7.5% or less, X.sub.2 is 25% or more, and X.sub.2/X.sub.1 is 3.5 or more.