The present specification describes a cliché, a method of manufacturing the cliché, and a printing method using the cliché.

Disclosed herein an exposure apparatus capable of implementing a microfabrication onto a work with a higher throughput and a lower cost. The exposure apparatus generates interfering light by crossing two or more branched light beams branched from output light from a coherent light source at a predetermined interfering angle, and exposes the substrate by repeating an irradiation onto the substrate with the interfering light and a conveyance of the substrate. At this moment, the exposure apparatus shapes in interfering light irradiation region on the substrate onto which the interfering light is irradiated into a predetermined shape. Then, the exposure apparatus disposes a plurality of the interfering light irradiation regions in successive shots to be located adjacent to each other on the substrate in a direction of conveying the substrate without the interfering light irradiation regions being overlapped when exposing the substrate while conveying the substrate in a stepwise manner.

Disclosed is a method for lithography patterning. The method includes providing a substrate, forming a deposition enhancement layer (DEL) over the substrate, and flowing an organic gas near a surface of the DEL. During the flowing of the organic gas, the method further includes irradiating the DEL and the organic gas with a patterned radiation. Elements of the organic gas polymerize upon the patterned radiation, thereby forming a resist pattern over the DEL. The method further includes etching the DEL with the resist pattern as an etch mask, thereby forming a patterned DEL.

Systems and methods described herein relate to the manufacture of optical elements and optical systems. An example system may include an optical component configured to direct light from a light source to illuminate a photoresist material at a desired angle and to expose at least a portion of an angled structure in the photoresist material, where the photoresist material overlays at least a portion of a top surface of a substrate. The optical component includes a container containing an light-coupling material that is selected based in part on the desired angle. The optical component also includes a mirror arranged to reflect at least a portion of the light to illuminate the photoresist material at the desired angle.

Disclosed is a method of preparing a thin film transistor substrate, a thin film transistor substrate, and a display apparatus. The method includes forming a conductive material layer, forming a hydrophobic insulation layer on the conductive material layer, forming a photoresist layer on the hydrophobic insulation layer, patterning the photoresist layer to form a photoresist pattern, removing a segment in the hydrophobic insulation layer that is not covered by the photoresist pattern to form a hydrophobic insulation pattern, and removing a segment in the conductive material layer that is not covered by the hydrophobic insulation pattern to form a conductive pattern.

A stretchable transparency-adjusting film includes an inner elastic part having a three-dimensional network shape and including a first elastomer, an inorganic thin film surrounding the inner elastic part, and an outer elastic part surrounding the inorganic thin film and including a second elastomer. A scattering unit defined by the inner elastic part, the inorganic thin film and the outer elastic part in a cross-section is orientated in an inclined direction to a vertical direction and a horizontal direction.

A combined radiation and functional layer application system includes one or more radiation sources and a commonly located functional layer application unit configured to dispose a functional layer over the surface of a fixed target ahead of the radiation sources during relative motion between the target and the radiation sources/application unit. System and method embodiments include those in which the target is stationary or moving, and embodiments in which the functional layer is applied as a liquid or as a solid laminate. Embodiments relate to application of an oxygen-blocking layer of a printing plate prior to exposure to actinic radiation. Certain solid laminate embodiments include a two-roll system for positioning the laminate for cutting adjacent a trailing edge of the plate.

The overall mechanism for creating the exposure may comprise a table having an outer frame 1110 that holds a transparent (e.g. glass) inner portion 1112. The upper 1120 and lower 1122 linear radiation sources (e.g. banks of LED point sources, optionally mounted inside a reflective housing) are mounted on a gantry system or carriage 1130. The radiation sources are connected to a power source, such as an electrical power cord having sufficient slack to extend the full range of motion of the carriage. Tracks (not shown) disposed on the outer frame portion provide a defined path for the gantry system or carriage to traverse. The carriage may be moved on the tracks by any drive mechanism known in the art (also coupled to the power supply and the controller), including a chain drive, a spindle drive, gear drive, or the like. The drive mechanism for the carriage may comprise one or more components mounted within the carriage, one or more components fixed to the table, or a combination thereof. A position sensor (not shown) is preferably coupled to the carriage to provide feedback to the controller regarding the precise location of the carriage at any given time. The control signal output from the controller for operating the radiation sources and for controlling motion of the carriage may be supplied via a wired or wireless connection. The controller may be mounted in a fixed location, such as connected to the table with a control signal cable attached to the sources similar to the power cable, or may be mounted in or on the carriage. The control system and drive mechanism cooperate to cause back/forth relative motion in a transverse direction between the light from the radiation sources and the plate. It should be understood that other embodiments may be devised in which the drive mechanism is configured to move the portion of the table containing the plate past stationary upper and lower linear radiation sources, as well as embodiments in which the radiation sources cover less than the full width of the plate and are movable in both the transverse and longitudinal direction to provide total plate coverage (or the plate is movable in both directions, or the plate is movable in one of the two directions and the sources are movable in the other direction to provides the full range of motion required to cover the entire plate).

The present invention is directed to adjusting a light intensity distribution on an irradiation target surface into a desired distribution with use of a light source apparatus including a light emitting diode (LED) array. A light source apparatus includes an LED array including a plurality of LED chips, and a controller configured to control the plurality of LED chips. A light intensity distribution acquired from each of the plurality of LED chips is superimposed on a light intensity distribution oriented in a different direction from each other on a predetermined surface. The controller controls an output of at least one of the plurality of LED chips, thereby changing the light intensity distribution that the plurality of LED chips forms on the predetermined surface.

A method of forming patterned features on a substrate is provided. The method includes positioning a plurality of masks arranged in a mask layout over a substrate. The substrate is positioned in a first plane and the plurality of masks are positioned in a second plane, the plurality of masks in the mask layout have edges that each extend parallel to the first plane and parallel or perpendicular to an alignment feature on the substrate, the substrate includes a plurality of areas configured to be patterned by energy directed through the masks arranged in the mask layout. The method further includes directing energy towards the plurality of areas through the plurality of masks arranged in the mask layout over the substrate to form a plurality of patterned features in each of the plurality of areas.