A mask structure and a manufacturing method of the mask structure are provided. The mask structure includes a transparent substrate, a patterned metal layer, and a plurality of microlens structures. The patterned metal layer is disposed on the transparent substrate and exposing a portion of the transparent substrate. The microlens structures are disposed on the transparent substrate exposed by a portion of the patterned metal layer and being in contact with the portion of the patterned metal layer.

The disclosure discloses a method for exposing a transparent substrate, including: fixing relative positions of a first mask, a second mask and the transparent substrate; exposing various regions of the transparent substrate by light with different polarization directions generated by the first mask and the second mask respectively. By the method above, the disclosure can simplify the process, reduce the period and improve efficiency of production.

A manufacturing method of a circuit substrate is provided. A substrate is provided. A positive photoresist layer is coated on the substrate. Once exposure process is performed on the positive photoresist layer disposed on the substrate so as to simultaneously form concaves with at least two different depths.

An indexing image for craft stamps that is opaque to the eye but transparent to UV light is produced by printing a wavelength-specific solvent-based ink on the stamp substrate. This eliminates the step of printing a separate adhesive-backed indexing image sheet and applying it to the substrate.

The invention relates to an autonomous apparatus for the photo-polymerization of a flexographic printing plate, which plate comprises a main face and a base opposite to said main face. The apparatus comprises an exposure chamber in which at least first photo-polymerization means of said base of said plate are installed. An input section and an output section are defined for letting said plate into/out from the exposure chamber, respectively. The apparatus further comprises moving means configured to drag said plate along a feeding direction. According to the invention, the first photo-polymerization means comprise a row of LEDs aligned according to a direction substantially orthogonal to said feeding direction.

An exposure apparatus includes a conveying mechanism and an exposure mechanism. The conveying mechanism is configured to convey a substrate, a surface of the substrate being coated with photoresist. The exposure mechanism includes an exposure source and an exposure member. The exposure source is configured to provide light to the substrate. The exposure member includes an exposure section opposite the substrate, where the exposure section is located between the exposure source and the substrate and disposed in close proximity to the substrate, the exposure section has a light-transmitting portion that allows light to be incident on the substrate and a light-shielding portion that prevents light from being incident on the substrate, and the exposure section is configured to keep the light-transmitting portion and the light-shielding portion in synchronized movement with the substrate.

Apparatus, method, and system for exposing a photosensitive printing plate to radiation, including a plurality of LED point sources configured to emit UV light. The plurality of LED point sources in at least one of a front side set or back side set are controllable in subsets smaller than an entirety of the collective irradiation field corresponding to the respective set. A holder receives the printing plate in a stationary position to receive incident radiation and a controller is configured to control the plurality of LED source subsets. A first LED point source subset is configured to be controlled at a first intensity differing by a factor relative to a second intensity of a second LED point source subset to give the radiation emitted by the respective set an intended degree of homogeneity.

The present invention relates to a feeding assembly (1) for automatically loading a flexographic plate (5) in a treatment station (7). The assembly according to the invention comprises a punching unit of said plate (5), handling means (5) for moving the flexographic plate from a loading surface to said punching unit and from said punching unit to a housing site in which a pin bar (14) which can be connected to said plate (5) is arranged. According to the invention, the handling means are configured to connect the plate (5) to said bar automatically and to move the bar, at the end of such a connection, to a predetermined position in which it can be coupled to a treatment system (77) of said treatment station.

Provided is a method for producing a conductive member including: forming a first silver halide emulsion layer, a light absorption layer, and a second silver halide emulsion layer on a transparent support in this order; performing pattern exposure on the first silver halide emulsion layer; and the second silver halide emulsion layer and applying a development treatment thereto to obtain a conductive layer comprising a thin metal wire, in which the light absorption layer absorbs at least some of the wavelengths of light to which the first silver halide emulsion layer or the second silver halide emulsion layer is exposed.

A resist patterning method according to the present invention includes: a resist layer forming step S101 of forming a resist layer (12) on a substrate (11); an activating step S103 of activating the resist layer by irradiation with an activating energy beam; a decay inhibiting step S105 of inhibiting decay of the activity of the resist layer; a latent pattern image forming step S107 of forming a latent pattern image in the activated resist layer by irradiation with a latent image forming energy beam; and a developing step S110 of developing the resist layer.