A method for manufacturing a female mold is provided in the embodiments of the disclosure, comprising: providing a substrate; forming a substrate layer of the female mold on the substrate; forming on the substrate layer of the female mold a mask layer which is adapted to exposure by an X-ray; and exposing the substrate layer of the female mold to the X-ray from a side of the mask layer away from the substrate. A direction in which the X-ray irradiates is inclined at a predetermined oblique angle to the substrate layer of the female mold, in the process of exposing to the X-ray. Besides, a female mold is also provided.

A resist composition including a polymer; a photoacid generator; and a material represented by Formula 1:

##STR00001##

The present invention provides a photo-substrate for printing of lenticular images that comprises a lenticular lens array, and an energy-reactive material adhered to the backside of the lenticular lens array. According to the methods of the present invention, the lenticular image is printed directly through the lenticular lens array onto the energy-reactive material, using, for example, collimated light or laser. The photo-substrate of the present invention can be adapted for large scale or industrial production to print lenticular images on a wide array of substrates, including such things as packaging and clothing.

Disclosed are resist compositions and semiconductor device fabrication methods using the same. The resist composition comprises a hypervalent iodine compound of Chemical Formula 1 below. Wherein R.sub.1 to R.sub.7 are as defined herein.

##STR00001##

The sulfonium salt has high photosensitivity to i-rays and high compatibility with cationically polymerizable compounds such as epoxy compounds, and is excellent storage stability in formulations containing such compounds. The sulfonium salt is represented by general formula (1). In formula (1), R represents an alkyl group or an aryl group; substituents, R1 to R5, each independently represent an alkyl group, a hydroxy group, an alkoxy group, an aryl group, an aryloxy group, a hydroxy(poly)alkyleneoxy group, or a halogen atom; R6 to R9 each independently represent an alkyl group, an aryl group, or a hydrogen atom; m.sup.1 to m.sup.5 each represent the number of occurrences of each of R1 to R5, m.sup.1 and m.sup.4 represent an integer of 0 to 3, m.sup.2 and m.sup.5 represent an integer of 0 to 4, m.sup.3 represents an integer of 0 to 5, and X.sup.− represents a monovalent polyatomic anion.

##STR00001##

Provided are a radiation-sensitive resin composition having good sensitivity and excellent temporal stability of the sensitivity, a cured film, a pattern forming method, a solid-state imaging device, and an image display device. The radiation-sensitive resin composition includes a resin, a polymerizable compound having an ethylenically unsaturated bond, a photopolymerization initiator, an organic solvent, and water, in which the photopolymerization initiator includes an oxime ester compound having at least one group selected from a branched alkyl group and a cyclic alkyl group, and the content of water is 0.1% to 2% by mass with respect to the mass of the radiation-sensitive resin composition.

A silsesquioxane-containing composition comprising a silsesquioxane resin and an oxaamine of formula (II) (see description), products prepared therefrom, photoresist compositions comprising the silsesquioxane-containing composition and a photoacid generator, products prepared therefrom, methods of making and using same, and manufactured articles and semiconductor devices containing same.

Methods and apparatuses for forming a patterned layer of material are disclosed. In one arrangement, a selected portion of a surface of a substrate is irradiated with electromagnetic radiation having a wavelength of less than 100 nm during a deposition process. Furthermore, an electric field controller is configured to apply an electric field that is oriented so as to force secondary electrons away from the substrate. The irradiation locally drives the deposition process in the selected portion and thereby causes the deposition process to, for example, form a layer of material in a pattern defined by the selected portion.

A chemically amplified positive-type photosensitive resin composition capable of suppressing the occurrence of footing in which the width of the bottom (the side proximal to the surface of a support) becomes narrower than the top (the side proximal to the surface of a resist layer) in the nonresist portion when a resist pattern serving as a template for a plated article is formed on a metal surface of a substrate having a metal surface using the composition. A mercapto compound having the formula (C) shown below is added to the composition and includes an acid generator which generates acid upon exposure to an irradiated active ray or radiation and a resin the solubility of which in alkali increases under the action of acid: ##STR00001##
wherein n1, n2, R.sup.c1, and R.sup.c are defined in claim 1.

A method is for producing a scattered beam collimator starting from a lower side and extending in a build-up direction as far as an upper side, and having a large number of X-ray absorbing partitions, and in which pass-through channels for unscattered X-ray radiation are embodied between the partitions. A lithographic process is used, by which the partitions of the scattered beam collimator are formed from a photoresist into which an X-ray absorbing material is mixed.