There is a method for forming a three dimensional or porous graphene electrode pattern on a substrate, the method including providing a substrate; coating the substrate with a lignin-polymer composite film; exposing a first part of the coated lignin-polymer composite film to a laser beam for transforming the first part into the graphene pattern; and removing a second part of the coated lignin-polymer composite film, which was not exposed to the laser beam, by placing the second part in water. The lignin-polymer composite film includes (1) a water-soluble alkaline lignin, (2) a polymer having bonding properties, and (3) a solvent, and an amount of the water-soluble alkaline lignin in the lignin-polymer composite film is between 5 and 60% by weight.

A resist composition comprising a base polymer and an onium salt of N-carbonylsulfonamide having iodized benzene ring offers a high sensitivity, minimal LWR and improved CDU, independent of whether it is of positive or negative tone.

Disclosed herein are methods for patterning two-dimensional atomic layer materials, the methods comprising: illuminating a first location of an optothermal substrate with electromagnetic radiation, wherein the optothermal substrate converts at least a portion of the electromagnetic radiation into thermal energy, and wherein the optothermal substrate is in thermal contact with a two-dimensional atomic layer material; thereby: generating an ablation region at a location of the two-dimensional atomic layer material proximate to the first location of the optothermal substrate, wherein at least a portion of the ablation region has a temperature sufficient to ablate at least a portion of the two-dimensional atomic layer material within the ablation region, thereby patterning the two-dimensional atomic layer material. Also disclosed herein are systems for performing the methods described herein, patterned two-dimensional atomic layer materials made by the methods described herein and methods of use thereof.

A dynamic interference lithography (DIL) device is provided. The device includes a laser source configured for providing a laser beam, a substrate stage configured for mounting a substrate, an at least partially convex curved mirror, and a spatial filter configured to divide the laser beam into a first beam portion directed towards the at least partially convex curved mirror and a second beam portion directed towards the substrate. The first beam portion is reflected by the at least partially convex curved mirror towards the substrate to form an interference pattern on the substrate.

A method for writing an imageable material using multiple beams includes preparing subsequent patterns each having Y rows of N pixel locations, said subsequent patterns including first and second patterns; where the first and the second pattern overlap with each other in an overlap area consisting of O columns and Y rows of pixel locations; selecting for each row i of said first pattern Mi1 pixel locations; selecting for each row i of said second pattern Mi2 pixel locations; writing simultaneously, for each row i, said Mi1 selected pixel locations by moving the N beams in a fast scan direction relative to said imageable material; and moving said N beams relative to said imageable material in a slow scan direction over (N-O) pixel locations; writing simultaneously, for each row i, said Mi2 selected pixel locations by moving the N beams in a fast scan direction relative to said imageable material.

A maskless exposure apparatus includes a light source, an optical head including a light modulator and an optical system, and reflecting light from the light source to radiate the light to a substrate to be exposed, a stage supporting the substrate and moving the substrate in a scanning direction, where the substrate is rotated such that a reference line of the substrate is at a first angle with respect to the scanning direction, and an optical head rotating unit rotating the optical head. When patterns are formed on the substrate in a direction of a first row and an nth row that is substantially perpendicular to the reference line, the first angle is set such that illuminations accumulated, by a beam spot array, in first portions and second portions on the substrate respectively corresponding to the patterns of the first row and the patterns of the nth row vary.

A calibration system includes: an optical system that is provided insertably into and removably from an optical path of the beam that is emitted from the exposure head and enters the exposure surface, the optical system guiding the beam in a direction different from that of the optical path when the optical system is inserted into the optical path; a movement mechanism that inserts and removes the optical system into and from the optical path; and an optical sensor having a light-receiving surface for receiving the beam that is guided by the optical system when the optical system is inserted into the optical path, the optical sensor outputting a detection signal by detecting an irradiation position and an irradiation intensity at the light-receiving surface of the beam that has entered the light-receiving surface.

A metalens array is disclosed for controllably modifying a phase of a wavefront of an optical beam. The metalens array may have a substrate having at least first and second metalens unit cells, and forming a single integrated structure with no stitching being required of the first and second metalens unit cells. The first metalens unit cell has a first plurality of nanoscale features and is configured to modify a phase of a first portion of a wavefront of an optical signal incident thereon in accordance with a first predetermined phase pattern to create at least one first focal voxel within an image plane. The second metalens unit cell has a second plurality of nanoscale features configured to modify the phase of a second portion of the wavefront of the optical signal incident thereon, in accordance with a second predetermined phase pattern, to simultaneously create at least one second focal voxel within the image plane. Each metalens unit cell also has an overall diameter of no more than about 200 microns.

A two-photon-polymerization laser direct writing system based on an acousto-optic deflector is provided, which includes an ultrafast laser device, a beam expander, a scanning field center angular dispersion compensator, a two-dimensional acousto-optic deflector, a scanning field edge angular dispersion compensator, an astigmatism compensator and a focusing objective lens, the ultrafast laser device is configured to emit an ultrafast laser; the scanning field center angular dispersion compensator is configured to conduct precompensation on an angular dispersion at a center of a scanning field; the two-dimensional acousto-optic deflector is configured to deflect the ultrafast laser on the angular dispersion at the center of the scanning field; the scanning field edge angular dispersion compensator is configured to compensate for an angular dispersion at an edge of the scanning field; the astigmatism compensator is configured to compensate for astigmatism; the focusing objective lens is configured to conduct tight-focusing on the ultrafast laser.

A method of producing a test body for diffusion tensor imaging, which comprises a plurality of channels in a structuring material, the channels preferably having a maximum cross-section of 625 μm.sup.2, wherein a virtual model of the test body is created and the virtual model is fed to a structuring device which produces the test body by means of a 3D printing-based, in particular lithography-based, structuring process, the structuring process being designed as a multiphoton lithography process, in particular as a multiphoton absorption process, in which the structuring material containing a photosensitizer or photoinitiator is irradiated in a location-selective manner, wherein the radiation is successively focused on focal points lying within the structuring material, resulting in that in each case a volume element of the material located in the focal point is subjected to a change in state by means of a photochemical reaction as a result of multiphoton absorption.