In an exposure apparatus, on a substrate holder (34), a plurality of grating areas (RG) is arranged mutually apart in the X-axis direction, and a plurality of heads (66a to 66d) that irradiates a measurement beam with respect to the grating area and can move in the Y-axis direction is arranged outside of the substrate holder. A control system controls movement of the substrate holder in at least directions of three degrees of freedom within an XY plane, based on measurement information of at least three heads of the plurality of heads facing the grating area and measurement information of a measurement device that measures position information of the plurality of heads. The measurement beam of each of the plurality of heads, during the movement of substrate holder in the X-axis direction, moves off of one of the plurality of grating areas and switches to another adjacent grating area.

This invention describes a method for making a three dimensional (3D) image by additive manufacturing using, as a light source, an off-the-shelf visual display screen. The invention also relates to apparatus for carrying out said methods.

The present invention discloses an apparatus for making direct writing screen plate and a using method thereof. The present invention provides a direct writing screen plate making apparatus and a focal plane control method. A Z-axis controller is used to pre-establish a mapping relation between the focal plane position of the scanning band to be scanned in the next step and the scanning platform position signal. During the next step of scanning, the position of the optical lens is adjusted according to the mapping relation, thus avoiding the problem of inconsistency between the calculated focal plane and the actual focal plane caused by the position deviation between the assembled displacement sensor and the optical lens. The present invention also provides a method for exposing a region of interest and a method for compensating the on-line real-time light uniformity.

Embodiments described herein provide a system, a software application, and a method of a lithography process, to write full tone portions and grey tone portions in a single pass. One embodiment includes a controller configured to provide mask pattern data to a lithography system. The controller is configured to divide a plurality of spatial light modulator pixels spatially by at least a grey tone group and a full tone group of spatial light modulator pixels. When divided by the controller, the grey tone group of spatial light modulator pixels is operable to project a first number of the multiplicity of shots to the plurality of full tone exposure polygons and the plurality of grey tone exposure polygons, and the full tone group of spatial light modulator pixels is operable to project a second number of the multiplicity of shots to the plurality of full tone exposure polygons.

Apparatus and method for directly curing photopolymer printing plates, such as with UV radiation. Printing plates are cured directly by radiation, such as emitted from a high power UV laser beam. No LAMS layer or film bearing the image information is required on top of the polymer plate. The laser beam may be split into several individually-modulated beams by means of an Acousto Optical Deflector. Each individual beam is capable of curing pixels of the image that are to be transferred to the printing plate. Support shoulders for the printing details, formed by the pixels are determined by the caustic of the UV beam propagation.

A system for preparing a photopolymer printing plate includes an imager, a plate unloader configured to automatically unload the plate from the imager and deliver the plate to an exposure unit comprising a plurality of UV LEDs, and a controller configured to operate the imager, the plate unloader, and the exposure unit. The imager has a rotatable drum configured to rotate while laser beams ablate portions of an ablatable layer of the printing plate in accordance with imaging data. The UV LEDs include a back array and a front array configured to expose the front of the UV-curable plate, at least one of which is configured to emit UV radiation toward the plate during relative motion between the plate and the array.

A method for exposing a light-sensitive layer to light using an optical system, wherein at least one light beam is generated by respectively at least one light source and pixels of an exposure pattern grid are illuminated by at least one micro-mirror device with a plurality of micro-mirrors. An affine distortion takes place, in particular a shearing, of the exposure pattern grid.

A control system controls a drive system of a substrate holder, based on correction information to compensate for measurement error of a measurement system including an encoder system that occurs due to movement of at least one of a plurality of grating areas (scale), a plurality of heads and a substrate holder, and position information measured by the measurement system, and a measurement beam from a head of each of the plurality of heads moves off from one of the plurality of grating areas and switches to another adjacent grating area, during the movement of the substrate holder in the X-axis direction.

Apparatus and method for directly curing photopolymer printing plates, such as with UV radiation. Printing plates are cured directly by radiation, such as emitted from a high power UV laser beam. No LAMS layer or film bearing the image information is required on top of the polymer plate. The laser beam may be split into several individually-modulated beams by means of an Acousto Optical Deflector. Each individual beam is capable of curing pixels of the image that are to be transferred to the printing plate. Support shoulders for the printing details, formed by the pixels are determined by the caustic of the UV beam propagation.

In an exposure apparatus, on a substrate holder (34), a plurality of grating areas (RG) is arranged mutually apart in the X-axis direction, and a plurality of heads (66a to 66d) that irradiates a measurement beam with respect to the grating area and can move in the Y-axis direction is arranged outside of the substrate holder. A control system controls movement of the substrate holder in at least directions of three degrees of freedom within an XY plane, based on measurement information of at least three heads of the plurality of heads facing the grating area and measurement information of a measurement device that measures position information of the plurality of heads. The measurement beam of each of the plurality of heads, during the movement of substrate holder in the X-axis direction, moves off of one of the plurality of grating areas and switches to another adjacent grating area.