A control system controls a drive system of a substrate holder, based on correction information to compensate for measurement error of a measurement system including an encoder system that occurs due to movement of at least one of a plurality of grating areas (scale), a plurality of heads and a substrate holder, and position information measured by the measurement system, and a measurement beam from a head of each of the plurality of heads moves off from one of the plurality of grating areas and switches to another adjacent grating area, during the movement of the substrate holder in the X-axis direction.

In an exposure apparatus, on a substrate holder, a plurality of grating areas is arranged mutually apart in the X-axis direction, and a plurality of heads that irradiates a measurement beam with respect to the grating area and can move in the Y-axis direction is arranged outside of the substrate holder. A control system controls movement of the substrate holder in at least directions of three degrees of freedom within an XY plane, based on measurement information of at least three heads of the plurality of heads facing the grating area and measurement information of a measurement device that measures position information of the plurality of heads. The measurement beam of each of the plurality of heads, during the movement of substrate holder in the X-axis direction, moves off of one of the plurality of grating areas and switches to another adjacent grating area.

Examples described herein provide a system, a software application, and a method of a lithography process to write multiple tones in a single pass. A system includes a stage and a lithography system. The lithography system includes image projection systems, a controller, and memory. The controller is coupled to the memory, which stores instruction code. Execution of the instruction code by the controller causes the controller to control the stage and the image projection systems to iteratively expose a photoresist supported by the stage and to move the stage relative to the image projection systems a step distance between sequential pairs of the exposures. Each exposure includes using write beam(s) projected from the image projection systems. Each exposure is at a respective one of different dosage amounts. An accumulation of the different dosage amounts is a full tone dosage amount for the photoresist.

Patterns from a phase array are transferred to a substrate such as a series of overlapping patterns and non-overlapping patterns. The overlapping patterns are associated with phase array pixel offsets so as to overlap at the substrate and the necessary overlap is based on substrate scan speed. Non-overlapping or offset patterns are obtained by varying optical pulse timing as the substrate is scanned, or by including a corresponding offset to pattern definition at the phase array.

There are provided a developer spreading device, a printer, and a digital camera with a printer which are capable of equally spreading a developer in a width direction of a film unit. The developer spreading device includes a transport roller pair, a spreading roller pair, and a spreading control member. The spreading roller pair transports a film unit transported by the transport roller pair while pinching the film unit over the entire width. The spreading control member is provided between the transport roller pair and the spreading roller pair. A distal end of the spreading control member is formed in a convex shape of which a center portion protrudes toward the film unit on a cross-section of the film unit in a width direction. Thus, it is possible to press the film unit with an equal pressing force in the width direction of the film unit.

The invention is directed to a tuneable flat panel UV exposure system for screen printing. The panel includes a plurality of UV LED chips where each chip is connected to multiple, independently controllable power sources and pulse width modulation circuits.

A maskless photolithoghrapic system includes a laser point-by-point scanning exposure unit, a plane-projection exposure unit, a mobile station and a calculation control unit that decomposes a pattern to be exposed, so that a pattern portion with a precision requirement below a pre-determined threshold is exposed by the laser point-by-point scanning exposure unit, and a pattern portion with a precision requirement greater than the pre-determined threshold is exposed by the plane-projection exposure unit; when conducting laser point-by-point scanning exposure on a sample on the mobile station, the light emitted by the laser point-by-point scanning exposure unit moves relative to the sample according to the pattern portion with a precision requirement below the pre-determined threshold; and when conducting plane-projection exposure on the sample, the plane-projection exposure unit emits light with a corresponding pattern shape onto the sample according to the graph with a precision requirement greater than the pre-determined threshold.

Systems and methods for patterning nail polish are disclosed. In one embodiment, the system includes a source of light, and a programmable mask that can selectively transmit light to a photoresist nail polish. In some embodiments, the programmable mask is a liquid crystal display (LCD) or a digital light processing screen (DLP). The system may also include a controller configured for controlling the light transmission properties of the programmable mask.

A position adjusting unit according to some example embodiments includes a base; a mounting part, a driving unit, and a locking part on the base. The mounting part may be movably installed on the base and configured to have an optical element mounted thereto. The driving unit may include a plurality of actuators connected between the base and the mounting part. The driving unit may be configured to move the mounting part with respect to the base. The locking part may be configured to provide a fixing force for fixing a position of the mounting part. The locking part may be configured to release the fixing force when electricity is supplied to the locking part.

This invention describes a method for making a three dimensional (3D) image by additive manufacturing using, as a light source, an off-the-shelf visual display screen. The invention also relates to apparatus for carrying out said methods.