A direct imaging system includes an optical modulator having multiple elements arranged corresponding to a sub scanning direction and for modulating light from a light source, and an exposure head for exposing the substrate with the light modulated by the optical modulator. A control part relatively moves the exposure head in a main scanning direction to expose the sub exposure area with the light modulated using a selection element, and after the sub exposure area is exposed, relatively moves the exposure head an amount corresponding to a sub exposure width in the sub scanning direction. Accordingly, exposure can be continued even if there is a defect in the optical modulator.

Embodiments of the present disclosure relate to projection stabilization systems and maskless lithography systems having projection stabilization systems. The projection stabilization system compensates for propagating vibrations that move image projection systems (IPS's). The IPS's are in a processing position prior to operation of the maskless lithography process. One or more stiffeners are coupled to the IPS. The one or more stiffeners apply pressure to flexures coupled to each stiffener. The flexures are coupled to the IPS to provide stabilization to the IPS during the operations of the maskless lithography process. For example, the one or more of stiffeners protect the IPS from vibrations that propagate through the system during operation.

Embodiments of the present disclosure include a lithography apparatus, patterning system, and method of patterning a layered structure. The patterning system includes an image formation device and a reactive layer. The patterning system allows for creating lithography patterns in a single operation. The lithography apparatus includes the patterning system and an optical system. The lithography apparatus uses a plurality of wavelengths of light, along with the image formation device, to create a plurality of color patterns on the reactive layer. The method of patterning includes exposing the reactive layer to a plurality of wavelengths of light. The light reacts differently with different regions of the reactive layer, depending on the wavelength of light emitted onto the different regions. The method and apparatuses disclosed herein require only one image formation device and one lithography operation.