G03F7/3042

PROCESSING SYSTEM AND DEVICE MANUFACTURING METHOD

A processing system and a device manufacturing method that can perform manufacturing of an electronic device without stopping the entire manufacturing system, even when the processing state actually implemented on a sheet substrate by a processing device differs from the target processing state. A processing system for sequentially conveying a long, flexible sheet substrate along a length direction to each of a first through a third processing device to form a predetermined pattern on the sheet substrate, wherein the first through the third processing devices implement a predetermined process relating to the sheet substrate according to setting conditions set to each processing device, and when at least one from among the states of the actual processing implemented on the sheet substrate by each of the first through the third processing devices exhibits a processing error relative to a target processing state, changes other setting conditions, separate from the setting conditions exhibiting the processing error, according to the processing error.

SUBSTRATE TREATING APPARATUS AND METHOD OF TREATING SUBSTRATE
20190155161 · 2019-05-23 ·

A substrate treating apparatus includes a plurality of conveying rollers arranged in a first direction which is a horizontal direction, and configured to transfer a substrate in the first direction, the substrate being disposed on a plane formed by the first direction and a second direction perpendicular to the first direction, a developer providing nozzle configured to provide a developer onto the substrate to form a developer layer on the substrate, a sensor part for recognizing a position of the substrate, and a vertical moving part configured to move each of the conveying rollers along a third direction which is downward and perpendicular to the first and second directions.

Processing system and device manufacturing method

A processing system and a device manufacturing method that can perform manufacturing of an electronic device without stopping the entire manufacturing system, even when the processing state actually implemented on a sheet substrate by a processing device differs from the target processing state. A processing system for sequentially conveying a long, flexible sheet substrate along a length direction to each of a first through a third processing device to form a predetermined pattern on the sheet substrate, wherein the first through the third processing devices implement a predetermined process relating to the sheet substrate according to setting conditions set to each processing device, and when at least one from among the states of the actual processing implemented on the sheet substrate by each of the first through the third processing devices exhibits a processing error relative to a target processing state, changes other setting conditions, separate from the setting conditions exhibiting the processing error, according to the processing error.

DEVELOPING DEVICE AND DEVELOPING METHOD

Disclosed is a developing device for developing a substrate, comprising: a developing tank, a recovery box and a conveying unit provided right above the developing tank and configured to convey the substrate; wherein the developing tank comprises a first tank, a second tank and a third tank, which are spaced and are sequentially arranged; the recovery box comprises a first box and a second box; the first tank is communicated with the first box; as the substrate is arranged in the second tank, the second tank is communicated with the first box; as the substrate is arranged in the third tank, the third tank is communicated with the second box. The developing device can solve the technical problems of separately recovering the developers doped with different photoresist concentrations during the development of the substrate to reduce the cost of diluting the developer concentration in the recovery box.

APPARATUS AND METHOD FOR TREATING A RELIEF PRECURSOR WITH LIQUID
20240310734 · 2024-09-19 · ·

An apparatus for treating a relief precursor with a liquid includes a housing, a conveying mechanism for transporting the relief precursor along a support plane in a transport direction through the housing, and a treatment section for treating the relief precursor with a liquid. The treatment section includes a plurality of brushes arranged in the housing for treating the relief precursor, the plurality of brushes including at least a first brush and a second brush downstream of the first brush and having a rotating axis with bristles. A squeeze element squeezes the bristles of the second brush and extends over a radial distance into the bristles of the second brush. The radial distance is at least 15% of the length of the bristles.

FLEXOGRAPHIC PRINTING ELEMENTS THAT CAN BE DRIED RAPIDLY
20170199462 · 2017-07-13 ·

Photopolymerizable, preferably digitally imageable photopolymerizable, flexographic printing elements having a PET support sheet of low thermal shrinkage, methods of preparing such flexographic printing elements and their use for making flexographic printing plates by imagewise exposure to light, washing out with organic solvents and drying, wherein said drying is carried out at temperatures of more than 60 C.

Lithographic printing plate precursors and processes for preparing lithographic printing plates
09690195 · 2017-06-27 · ·

Lithographic printing plates and processes for preparing the lithographic printing plates are provided. The plates have excellent printing durability, staining resistance and staining resistance over time. The lithographic printing plate precursor includes: a substrate; a photosensitive layer provided on the substrate; and an extra layer optionally provided between the substrate and the photosensitive layer. The photosensitive layer or the extra layer adjacent to the substrate contains (A) a copolymer. The copolymer (A) includes: (a1) a repeating unit of formula (a1-1) below in a side chain, and (a2) a repeating unit having at least one of the structures represented by formulae (a2-1) to (a2-6) shown in the specification in a side chain. L.sup.1, Z.sup.1, R.sup.1, and R.sup.21, R.sup.22 and R.sup.23 in formula (a1-1) and the variables in formulae (a2-1) to (a2-6) are as defined in the specification. ##STR00001##

Plate making system and plate making method

A plate making system comprises a writing device, an exposure device, a developing device, a plate cutting device, a first transfer device, a second transfer device and a third transfer device in an integrated manner. The plate making system also comprises a control device that controls a series of plate making processes for a flexographic printing original plate performed by the writing device, the exposure device, the developing device and the plate cutting device.

Reduced flow rate processing system for flexographic printing plate

A processing system for processing a flexographic printing plate can include a processing path for processing the flexographic printing plate. A hollow tube can be positioned to be extended across the processing path. A pressurized processing liquid supply system is provided. A plurality of pressure-compensating emitters are coupled to the hollow tube Each pressure-compensating emitter can include a casing having a fluidic flow path that is fluidly coupled with the hollow tube and having an outlet. Also, each emitter can include a resilient planar member in the casing and positioned to form at least one resilient surface of the fluidic flow path. Each pressure-compensating emitter is configured to control flow rate of the pressurized processing liquid to produce processing liquid drips from the outlet. The resilient planar member can be positioned to provide a variable outlet cross-sectional profile to the outlet in response to pressure inside the casing.

Apparatus and method for treating a relief plate precursor with improved liquid evacuation
12447733 · 2025-10-21 · ·

An apparatus for treating a relief plate precursor, such as a printing plate precursor, with a liquid, includes a treatment compartment for treating the relief plate precursor with a liquid, and a transport system for use with one or more transport bars. A transport bar thereof is configured to be coupled to a relief plate precursor. The transport system is configured to move the transport bar with the coupled relief plate precursor through the treatment compartment. The transport bar is provided with a coupling portion configured to couple the transport bar to the transport system. A protection system is configured to guide and evacuate liquid such that the transport system is protected against wetting with the liquid of the treatment compartment.